公开(公告)号：US20230257877A1

公开(公告)日：2023-08-17

申请号：US18163949

申请日：2023-02-03

Applicant: Tokyo Electron Limited

Inventor： Ibuki HAYASHI ,  Yasushi TAKEUCHI ,  Manabu HONMA ,  Junnosuke TAGUCHI

IPC: C23C16/44 ,  C23C16/458

CPC classification number: C23C16/4412 ,  C23C16/4584

Abstract: A substrate processing apparatus includes: a processing chamber; a rotary table rotatably provided inside the processing chamber; a stage that is rotatable relative to the rotary table at a position spaced apart from a rotation center of the rotary table; a process gas supplier provided above the rotary table; a separation gas supplier to supply a separation gas to separation regions, each of the separation regions being adjacent to a processing region; and a gas exhauster including exhaust ports communicating with an inside of the processing chamber, wherein the exhaust ports are provided in the processing region between the separation regions and are provided above the rotary table.

公开(公告)号：US20230260760A1

公开(公告)日：2023-08-17

申请号：US18106036

申请日：2023-02-06

Applicant: Tokyo Electron Limited

Inventor： Ibuki HAYASHI

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/455 ,  C23C16/50

CPC classification number: H01J37/32449 ,  H01J37/32513 ,  C23C16/4584 ,  C23C16/45565 ,  C23C16/50 ,  H01J2237/201 ,  H01J2237/20214 ,  H01J2237/24578 ,  H01J2237/332

Abstract: A substrate processing apparatus includes a vacuum container, a placing part provided inside the vacuum container and having a placing surface on which a substrate is placed, and a ceiling member provided above the placing part. The ceiling member includes a fixed member fixed to the vacuum container, a movable member attached to the fixed member and having a first facing surface facing the placing surface, a spacer sandwiched between the fixed member and the movable member, a first seal member provided between the fixed member and the spacer, a second seal member provided between the movable member and the spacer, and a plurality of adjustment bolts screwed into the fixed member through the movable member.

公开(公告)号：US20240295027A1

公开(公告)日：2024-09-05

申请号：US18581954

申请日：2024-02-20

Applicant: Tokyo Electron Limited

Inventor： Junnosuke TAGUCHI ,  Yasushi TAKEUCHI ,  Manabu HONMA ,  Ibuki HAYASHI

IPC: C23C16/458

CPC classification number: C23C16/4584

Abstract: A substrate processing apparatus includes a vacuum chamber; a rotary table rotatably provided in the vacuum chamber; and a stage configured to rotate together with the rotary table. The rotary table has an opening provided at a position spaced apart from a rotation center of the rotary table. An inner surface of the opening is continuous with an upper surface and a lower surface of the rotary table. The stage is spaced apart from the inner surface of the opening by a clearance.