公开(公告)号：US20160061525A1

公开(公告)日：2016-03-03

申请号：US14836047

申请日：2015-08-26

Applicant: Tokyo Electron Limited

Inventor： Mitsuru Yamazaki ,  Barry Clarke ,  Jattie Van Der Linde ,  Makoto Saito ,  Kazuyoshi Sugawara ,  Toshiji Abe ,  Tadashi Enomoto

IPC: F27B17/00 ,  H01L43/12 ,  F27D99/00 ,  F27D5/00 ,  F27D7/06

CPC classification number: F27B17/0025 ,  F27D11/12 ,  F27D99/0001 ,  H01L21/67115 ,  H01L21/67248 ,  H01L43/12

Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.

Abstract translation: 公开了一种磁性退火装置，包括：处理容器，其对容纳在其中的多个基板进行磁性退火处理; 衬底保持器，其将所述多个衬底基本上水平地保持在所述处理容器中; 分割加热器，其包括多个分割加热器，并且沿纵向方向覆盖处理容器的预定区域的外周的大致整个圆周表面; 安装用于覆盖分隔加热器外部的磁体; 以及控制器，被配置为反馈控制多个分割加热器中的预定控制目标加热器的温度，并且基于获得的控制输出来控制除了预定控制目标加热器之外的多个分割加热器的温度 通过将预定控制目标加热器的控制输出与预定比率相乘。

公开(公告)号：US09851149B2

公开(公告)日：2017-12-26

申请号：US14836047

申请日：2015-08-26

Applicant: Tokyo Electron Limited

Inventor： Mitsuru Yamazaki ,  Barry Clarke ,  Jattie Van Der Linde ,  Makoto Saito ,  Kazuyoshi Sugawara ,  Toshiji Abe ,  Tadashi Enomoto

IPC: C30B23/02 ,  F27B17/00 ,  F27D99/00 ,  H01L43/12 ,  F27D11/12 ,  H01L21/67

CPC classification number: F27B17/0025 ,  F27D11/12 ,  F27D99/0001 ,  H01L21/67115 ,  H01L21/67248 ,  H01L43/12

Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.