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公开(公告)号：US09822424B2
公开(公告)日：2017-11-21
申请号：US14752271
申请日：2015-06-26
Applicant: Tokyo Electron Limited
Inventor： Toru Ishii , Mitsuru Yamazaki
CPC classification number: C21D9/0006 , C21D1/26 , C21D9/00 , H01F41/304
Abstract: An annealing system and method of operating is described. The annealing system includes a furnace having a vacuum chamber wall that defines a processing space into which a plurality of workpieces may be translated and subjected to thermal and magnetic processing, wherein the furnace further includes a heating element assembly having at least one heating element located radially inward from the vacuum chamber wall and immersed within an outer region of the processing space, and wherein the heating element is composed of a non-metallic, anti-magnetic material. The annealing system further includes a magnet system arranged outside the vacuum chamber wall of the furnace, and configured to generate a magnetic field within the processing space.
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公开(公告)号：US11521876B2
公开(公告)日：2022-12-06
申请号：US16293471
申请日：2019-03-05
Applicant: Tokyo Electron Limited
Inventor： Ioan Domsa , Ian Colgan , Makoto Saito , Mitsuru Yamazaki , George Eyres
IPC: H01L21/67 , H01L21/673
Abstract: A horizontal substrate carrier is provided, for example a carrier for holding semiconductor substrates during horizontal thermal processing. The horizontal substrate carrier has asymmetrically placed support rails. One side of the horizontal substrate carrier has no upper rail while the other side of the horizontal substrate carrier has an upper rail placed at a relatively high location, for example at an angular location of 60° or more, more preferably of 70° or more, and most preferably at 90°. The side without an upper rail may be used for robotic loading of the horizontal substrate carrier. In a preferred embodiment, only three rails are provided: one upper rail on one side and two lower rails. The use and placement of these three rails can hold the substrate in precise uniform locations, minimize substrate movement, and minimize particle generation, all while allowing for easy robotic access.
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公开(公告)号：US10529918B2
公开(公告)日：2020-01-07
申请号：US15263942
申请日：2016-09-13
Applicant: TOKYO ELECTRON LIMITED
Inventor： Mitsuru Yamazaki , Koji Yamashita
Abstract: There is provided a semiconductor device manufacturing method which includes: loading a substrate with a magnetic substance film formed thereon into a process container; regulating an internal pressure of the process container to a first pressure lower than an atmospheric pressure; regulating the internal pressure of the process container from the first pressure to a second pressure higher than the first pressure; and magnetizing the magnetic substance film by applying a magnetic field to the magnetic substance film under the second pressure.
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Patent Agency Ranking
公开(公告)号：US09851149B2
公开(公告)日：2017-12-26
申请号：US14836047
申请日：2015-08-26
Applicant: Tokyo Electron Limited
Inventor： Mitsuru Yamazaki , Barry Clarke , Jattie Van Der Linde , Makoto Saito , Kazuyoshi Sugawara , Toshiji Abe , Tadashi Enomoto
CPC classification number: F27B17/0025 , F27D11/12 , F27D99/0001 , H01L21/67115 , H01L21/67248 , H01L43/12
Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.
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公开(公告)号：US20160061526A1
公开(公告)日：2016-03-03
申请号：US14840486
申请日：2015-08-31
Applicant: Tokyo Electron Limited
Inventor： Mitsuru Yamazaki , Barry Clarke , Ian Colgan , George Eyres , Ioan Domsa
CPC classification number: F27B17/0025 , F27B5/08 , F27B17/005 , F27D5/0037 , F27D99/0001 , H01L21/67115 , H01L21/67313 , H01L21/67754 , H01L43/12
Abstract: Disclosed is a magnetic annealing apparatus including a processing container having a horizontally-elongated tubular shape and configured to perform a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a heating unit provided to cover at least a part of a surface of the processing container that extends in a longitudinal direction, from outside; a magnet provided to cover the heating unit from the outside of the heating unit; a substrate holder configured to hold the plurality of substrates within the processing container; and a heat shielding plate provided to surround a part of the substrate holder.
Abstract translation: 公开了一种磁性退火装置，其包括具有水平细长管状形状的处理容器，并且被配置为在磁场中容纳在其中的多个基板上进行磁退火处理; 加热单元，其设置成覆盖从外部沿长度方向延伸的处理容器的表面的至少一部分; 设置成从加热单元的外部覆盖加热单元的磁体; 衬底保持器，其构造成将所述多个衬底保持在所述处理容器内; 以及设置成围绕基板保持器的一部分设置的热屏蔽板。
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公开(公告)号：US10254046B2
公开(公告)日：2019-04-09
申请号：US14840486
申请日：2015-08-31
Applicant: Tokyo Electron Limited
Inventor： Mitsuru Yamazaki , Barry Clarke , Ian Colgan , George Eyres , Ioan Domsa
IPC: F27B5/08 , F27B5/14 , F27D1/00 , F27D7/06 , H01L43/12 , F27B17/00 , F27D99/00 , H01L21/67 , H01L21/677 , F27D5/00 , H01L21/673
Abstract: Disclosed is a magnetic annealing apparatus including a processing container having a horizontally-elongated tubular shape and configured to perform a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a heating unit provided to cover at least a part of a surface of the processing container that extends in a longitudinal direction, from outside; a magnet provided to cover the heating unit from the outside of the heating unit; a substrate holder configured to hold the plurality of substrates within the processing container; and a heat shielding plate provided to surround a part of the substrate holder.
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公开(公告)号：US20160177412A1
公开(公告)日：2016-06-23
申请号：US14752271
申请日：2015-06-26
Applicant: Tokyo Electron Limited
Inventor： Toru Ishii , Mitsuru Yamazaki
CPC classification number: C21D9/0006 , C21D1/26 , C21D9/00 , H01F41/304
Abstract: An annealing system and method of operating is described. The annealing system includes a furnace having a vacuum chamber wall that defines a processing space into which a plurality of workpieces may be translated and subjected to thermal and magnetic processing, wherein the furnace further includes a heating element assembly having at least one heating element located radially inward from the vacuum chamber wall and immersed within an outer region of the processing space, and wherein the heating element is composed of a non-metallic, anti-magnetic material. The annealing system further includes a magnet system arranged outside the vacuum chamber wall of the furnace, and configured to generate a magnetic field within the processing space.
Abstract translation: 描述退火系统和操作方法。 退火系统包括具有真空室壁的炉，该真空室壁限定了可以平移多个工件并进行热和磁加工的处理空间，其中炉还包括加热元件组件，该组件具有至少一个位于径向上的加热元件 从真空室壁向内并浸没在处理空间的外部区域内，并且其中加热元件由非金属的抗磁性材料构成。 退火系统还包括布置在炉的真空室壁之外的磁体系统，并被配置为在处理空间内产生磁场。
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公开(公告)号：US20160061525A1
公开(公告)日：2016-03-03
申请号：US14836047
申请日：2015-08-26
Applicant: Tokyo Electron Limited
Inventor： Mitsuru Yamazaki , Barry Clarke , Jattie Van Der Linde , Makoto Saito , Kazuyoshi Sugawara , Toshiji Abe , Tadashi Enomoto
CPC classification number: F27B17/0025 , F27D11/12 , F27D99/0001 , H01L21/67115 , H01L21/67248 , H01L43/12
Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.
Abstract translation: 公开了一种磁性退火装置，包括：处理容器，其对容纳在其中的多个基板进行磁性退火处理; 衬底保持器，其将所述多个衬底基本上水平地保持在所述处理容器中; 分割加热器，其包括多个分割加热器，并且沿纵向方向覆盖处理容器的预定区域的外周的大致整个圆周表面; 安装用于覆盖分隔加热器外部的磁体; 以及控制器，被配置为反馈控制多个分割加热器中的预定控制目标加热器的温度，并且基于获得的控制输出来控制除了预定控制目标加热器之外的多个分割加热器的温度 通过将预定控制目标加热器的控制输出与预定比率相乘。
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