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公开(公告)号：US20160061525A1
公开(公告)日：2016-03-03
申请号：US14836047
申请日：2015-08-26
Applicant: Tokyo Electron Limited
Inventor： Mitsuru Yamazaki , Barry Clarke , Jattie Van Der Linde , Makoto Saito , Kazuyoshi Sugawara , Toshiji Abe , Tadashi Enomoto
CPC classification number: F27B17/0025 , F27D11/12 , F27D99/0001 , H01L21/67115 , H01L21/67248 , H01L43/12
Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.
Abstract translation: 公开了一种磁性退火装置，包括：处理容器，其对容纳在其中的多个基板进行磁性退火处理; 衬底保持器，其将所述多个衬底基本上水平地保持在所述处理容器中; 分割加热器，其包括多个分割加热器，并且沿纵向方向覆盖处理容器的预定区域的外周的大致整个圆周表面; 安装用于覆盖分隔加热器外部的磁体; 以及控制器，被配置为反馈控制多个分割加热器中的预定控制目标加热器的温度，并且基于获得的控制输出来控制除了预定控制目标加热器之外的多个分割加热器的温度 通过将预定控制目标加热器的控制输出与预定比率相乘。
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公开(公告)号：US12230523B2
公开(公告)日：2025-02-18
申请号：US17889624
申请日：2022-08-17
Applicant: Tokyo Electron Limited
Inventor： Tadashi Enomoto , Nao Akashi , Yutai Matsuhashi , Masakazu Yamamoto
IPC: H01L21/67 , H01L21/673 , H01L21/68
Abstract: A substrate processing apparatus includes: a chamber that accommodates a boat; a transfer mechanism that is provided inside the chamber, and transfers a substrate; a first camera that captures an image of a support column of the boat and the substrate; a support member that is inserted through an opening formed in a wall surface of the chamber, and supports the first camera; and a driver that drives the support member in order to move the first camera between a standby position and a measurement position.
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Patent Agency Ranking
公开(公告)号：US10096416B2
公开(公告)日：2018-10-09
申请号：US15242783
申请日：2016-08-22
Applicant: Tokyo Electron Limited
Inventor： Tadashi Enomoto , Makoto Saito
Abstract: Disclosed is a magnetizing apparatus including: a placing table configured to place thereon a storage container storing a plurality of substrates; a magnetizing chamber configured to accommodate the storage container and apply a magnetic field to the plurality of substrates in the storage container; and a conveying mechanism configured to convey the storage container from the placing table into the magnetizing chamber.
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公开(公告)号：US09851149B2
公开(公告)日：2017-12-26
申请号：US14836047
申请日：2015-08-26
Applicant: Tokyo Electron Limited
Inventor： Mitsuru Yamazaki , Barry Clarke , Jattie Van Der Linde , Makoto Saito , Kazuyoshi Sugawara , Toshiji Abe , Tadashi Enomoto
CPC classification number: F27B17/0025 , F27D11/12 , F27D99/0001 , H01L21/67115 , H01L21/67248 , H01L43/12
Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.
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公开(公告)号：US20170062112A1
公开(公告)日：2017-03-02
申请号：US15242783
申请日：2016-08-22
Applicant: Tokyo Electron Limited
Inventor： Tadashi Enomoto , Makoto Saito
CPC classification number: H01F13/003 , H01L43/12
Abstract: Disclosed is a magnetizing apparatus including: a placing table configured to place thereon a storage container storing a plurality of substrates; a magnetizing chamber configured to accommodate the storage container and apply a magnetic field to the plurality of substrates in the storage container; and a conveying mechanism configured to convey the storage container from the placing table into the magnetizing chamber.
Abstract translation: 公开了一种磁化装置，包括：放置台，其配置成在其上放置存储多个基板的存储容器; 磁化室，其构造成容纳所述存储容器并向所述存储容器中的所述多个基板施加磁场; 以及输送机构，其构造成将所述储存容器从所述放置台输送到所述磁化室。
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公开(公告)号：US09349589B2
公开(公告)日：2016-05-24
申请号：US14591245
申请日：2015-01-07
Applicant: Tokyo Electron Limited
Inventor： Tadashi Enomoto , Kiichi Takahashi , Keiichi Tanaka
IPC: H01L21/02 , C23C16/458 , C23C16/44 , C23C16/455 , H01L21/677 , H01L21/687
CPC classification number: H01L21/0228 , C23C16/4412 , C23C16/45551 , C23C16/4584 , H01L21/67748 , H01L21/68742 , H01L21/68764 , H01L21/68771
Abstract: A vacuum processing apparatus is configured to include a process chamber, a turntable provided in the process chamber, and a substrate receiving area provided in one surface of the turntable and including a regulation part formed therearound to regulate a position of a substrate. A transfer mechanism is provided outside the process chamber, and a lifting member is configured to support the substrate and to move up and down in order to transfer the substrate between the transfer mechanism and the turntable. An exhaust mechanism is configured to selectively evacuate a gap between the substrate receiving area and the substrate before the lifting member places the substrate on the substrate receiving area.
Abstract translation: 真空处理装置被配置为包括处理室，设置在处理室中的转台和设置在转台的一个表面中的基板接收区域，并且包括在其周围形成的调节部分以调节基板的位置。 传送机构设置在处理室外部，并且提升构件被构造成支撑基板并且上下移动，以便在传送机构和转台之间传送基板。 排气机构构造成在提升构件将基板放置在基板接收区域之前选择性地排空基板接收区域和基板之间的间隙。
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公开(公告)号：US11908717B2
公开(公告)日：2024-02-20
申请号：US16883965
申请日：2020-05-26
Applicant: Tokyo Electron Limited
Inventor： Masakazu Yamamoto , Tadashi Enomoto
IPC: H01L21/67 , H01L21/673 , H01L21/677 , G01B11/14 , B25J11/00 , B25J9/16 , G05B19/4061
CPC classification number: H01L21/67259 , B25J9/1666 , B25J9/1674 , B25J9/1676 , B25J11/0095 , G01B11/14 , G05B19/4061 , H01L21/67178 , H01L21/67288 , H01L21/67303 , H01L21/67781 , G05B2219/40317 , G05B2219/40476
Abstract: A transfer method transfers a substrate between a transfer unit configured to hold and transfer the substrate and a substrate stage serving as a transfer destination or a transfer source of the substrate. The transfer method includes: acquiring positional information of the transfer unit and positional information of the substrate stage; determining whether or not there is a risk for the substrate to contact with the substrate stage, based on the acquired positional information of the transfer unit and positional information of the substrate stage; and when determined that there is a risk for the substrate to contact with the substrate stage, notifying the risk according to the determination at the determining.
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