PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORAGE MEDIUM

    公开(公告)号:US20230111278A1

    公开(公告)日:2023-04-13

    申请号:US17961589

    申请日:2022-10-07

    Abstract: The present disclosure provides a non-transitory computer-readable storage medium storing a control program of a plasma processing apparatus which performs a plasma processing by supplying a source power to a plasma generator and supplying a bias power to a stage that places a processing target substrate thereon. The control program causes a computer to execute a process including: monitoring a peak-to-peak voltage value of the source power or the bias power; and correcting the source power supplied to the plasma generator and the bias power supplied to the stage according to a fluctuation of the peak-to-peak voltage value, to make the monitored peak-to-peak voltage value approach an initial set value while fixing a ratio of the source power and the bias power.

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