THERMAL TREATMENT APPARATUS AND THERMAL TREATMENT METHOD

    公开(公告)号:US20240263801A1

    公开(公告)日:2024-08-08

    申请号:US18421407

    申请日:2024-01-24

    CPC classification number: F24C15/101 F24C15/103 F24C15/322 F24C7/083 F24C15/12

    Abstract: A thermal treatment apparatus includes: a hot plate on which a substrate is mounted and which is configured to heat the substrate; an upper cover configured to cover a treatment space above the hot plate and form an opening being a carry-in/out port for the substrate to/from the treatment space; an exhauster provided at a position opposite to the opening across the hot plate in plan view and configured to exhaust gas from the treatment space; a shutter configured to cover a lower portion of the opening; and a gas flow guide provided at a position spaced apart from the shutter, wherein the gas flow guide divides gas flowing into the treatment space due to the exhaust of gas by the exhauster from an upper portion of the opening whose lower portion is covered with the shutter, into an upper side and a lower side.

    HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD

    公开(公告)号:US20210005468A1

    公开(公告)日:2021-01-07

    申请号:US16904802

    申请日:2020-06-18

    Abstract: A heat treatment apparatus for heating, in a treatment container, a substrate on which a coating film is formed, the heat treatment apparatus includes: a mount provided in the treatment container and configured to mount the substrate thereon; a heating part configured to heat the substrate mounted on the mount; a suction pipe leading to a suction port formed in the mount, penetrating the mount, and extending directly downward; and a collection container provided on a suction path between the suction pipe and a suction mechanism, wherein the collection container is provided directly below the mount in plan view and connected to the suction pipe to collect a sublimate in the treatment container.

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