CONTROL DEVICE, SYSTEM AND CONTROL METHOD

    公开(公告)号:US20220020618A1

    公开(公告)日:2022-01-20

    申请号:US17369122

    申请日:2021-07-07

    Abstract: A control device includes a reception unit configured to receive a film characteristic at a plurality of positions of a film formed on a substrate by a film forming processing based on a processing recipe, an optimization processing unit configured to execute an optimization calculation of the processing recipe based on the film characteristic, a diagnosis unit configured to diagnose a validity of an in-plane shape of the film characteristic based on the film characteristic, and a determination unit configured to determine whether or not to notify a user of an encouraging action based on a diagnosis result by the diagnosis unit.

    HEAT TREATMENT APPARATUS AND METHOD OF CONTROLLING THE SAME
    3.
    发明申请
    HEAT TREATMENT APPARATUS AND METHOD OF CONTROLLING THE SAME 有权
    热处理装置及其控制方法

    公开(公告)号:US20130204416A1

    公开(公告)日:2013-08-08

    申请号:US13742603

    申请日:2013-01-16

    CPC classification number: G05B19/418 H01L21/67109 H01L21/67115 H01L21/67248

    Abstract: The heat treatment apparatus that increases a temperature of a processing object and performs a heat treatment in a constant temperature, the heat treatment apparatus includes: a processing chamber which accommodates the processing object; a heating unit which heats the processing object accommodated in the processing chamber; a memory unit which stores two or more temperature control models that are previously created, a temperature controller which controls a temperature of the heating unit; and an apparatus controller which controls the temperature controller and the memory unit, wherein the apparatus controller selects a temperature control model among the two or more temperature control models according to desired heat treatment conditions, and wherein the temperature controller reads out the selected temperature control model from the memory unit to control the heating unit.

    Abstract translation: 所述热处理装置具有:处理室,其容纳所述处理对象物;处理对象物, 加热单元,其加热容纳在处理室中的处理对象; 存储单元,其存储先前创建的两个或更多个温度控制模型;温度控制器,其控制所述加热单元的温度; 以及控制所述温度控制器和所述存储单元的装置控制器,其中所述装置控制器根据期望的热处理条件在所述两个或更多个温度控制模型中选择温度控制模型,并且其中所述温度控制器读出所选择的温度控制模型 从存储单元控制加热单元。

    LICENSE AUTHENTICATION DEVICE AND LICENSE AUTHENTICATION METHOD

    公开(公告)号:US20200380095A1

    公开(公告)日:2020-12-03

    申请号:US16884141

    申请日:2020-05-27

    Abstract: A license authentication device includes a memory that stores a license file including a license expiration date of an application that adjusts a parameter of a semiconductor manufacturing apparatus in a semiconductor factory; and a processor coupled to the memory. The processor acquires log data when the semiconductor manufacturing apparatus executes a processing; and determines whether or not a time included in the log data has passed the license expiration date stored in the license information storage.

Patent Agency Ranking