公开(公告)号：US20140011368A1

公开(公告)日：2014-01-09

申请号：US13937902

申请日：2013-07-09

Applicant: Tokyo Electron Limited

Inventor： Tomoyuki OBU ,  Satoshi MIZUNAGA ,  Takehiro OTSUKA

IPC: H01L21/02

CPC classification number: H01L21/02304 ,  C23C16/0272 ,  C23C16/26 ,  H01L21/02115 ,  H01L21/02271

Abstract: According to an embodiment of present disclosure, a method of forming a carbon film on a substrate to be processed is provided. The method includes loading a substrate to be processed with a carbon film formed thereon into a processing chamber of a film forming apparatus (Process 1), and thermally decomposing a hydrocarbon-based carbon source gas in the processing chamber to form a carbon film on the substrate to be processed (Process 2). In Process 2, a film forming temperature of the carbon film is set to a temperature less than a thermal decomposition temperature of a simple substance of the hydrocarbon-based carbon source gas without plasma assistance, the hydrocarbon-based carbon source gas and a thermal decomposition temperature drop gas containing a halogen element are introduced into the processing chamber, and a non-plasma thermal CVD method is performed.

Abstract translation: 根据本公开的实施例，提供了一种在待处理的基板上形成碳膜的方法。 该方法包括将其上形成有碳膜的待处理基板加载到成膜装置的处理室（方法1）中，并且在处理室中热分解烃类碳源气体以在其上形成碳膜 待处理衬底（工艺2）。 在方法2中，将碳膜的成膜温度设定为低于无等离子体辅助的烃系碳源气体的单体的热分解温度的温度，烃类碳源气体和热分解 将含有卤素元素的降温气体引入到处理室中，进行非等离子体热CVD法。

公开(公告)号：US20130109196A1

公开(公告)日：2013-05-02

申请号：US13661120

申请日：2012-10-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Atsushi ENDO ,  Satoshi MIZUNAGA ,  Takehiro OTSUKA

IPC: C23C16/46 ,  H01L21/31

CPC classification number: C23C16/4404 ,  C23C16/4405 ,  H01L21/02115 ,  H01L21/02271

Abstract: A method of operating a film forming apparatus includes forming a carbon film on each of surfaces of a plurality of objects held by a holding unit in a processing container and performing a cleaning process with a cleaning gas to remove an unnecessary carbon film adhered on a inside of the processing container, wherein the method further includes, before the forming of the carbon film, forming, on a surface of a member contacting a processing space in the processing container, a tolerant pre-coating film which has a tolerance to the cleaning gas and improves adhesion of the carbon film to the surface of the member. Accordingly, the adhesion of the carbon film is improved, and further, the tolerant pre-coating film remains even when the cleaning process of removing the unnecessary carbon film is performed.

Abstract translation: 一种操作成膜设备的方法包括在由处理容器中的保持单元保持的多个物体的每个表面上形成碳膜，并用清洁气体进行清洁处理以除去附着在内部的不必要的碳膜 所述方法还包括在形成所述碳膜之前，在与所述处理容器中的处理空间接触的构件的表面上形成对所述清洁气体具有耐受性的耐受预涂膜 并提高碳膜对构件表面的粘附性。 因此，提高了碳膜的粘合性，进一步地，即使进行去除不需要的碳膜的清洗工序，耐磨预涂膜仍然残留。

公开(公告)号：US20130109195A1

公开(公告)日：2013-05-02

申请号：US13661107

申请日：2012-10-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Atsushi ENDO ,  Satoshi MIZUNAGA ,  Takehiro OTSUKA

IPC: C23C16/46 ,  H01L21/31

CPC classification number: C23C16/4405 ,  C23C16/4404

Abstract: Provided is a method of operating a film forming apparatus capable of suppressing generation of particles by improving an adhesion of a carbon film to surfaces of members which are formed of a quartz material and contact a processing space in a processing container. The method includes forming a carbon film on each of surfaces of a plurality of objects held by a holding unit in a processing container formed of a quartz material, wherein the method further includes forming an adhesion film to improve the adhesion of the carbon film, on surfaces of members which are formed of a quartz material and contact a processing space in the processing container. Accordingly, the adhesion of the carbon film to the surface of the member formed of a quartz material contacting the processing space in the processing container is improved, thereby suppressing generation of particles.

Abstract translation: 提供了一种操作成膜装置的方法，该成膜装置能够通过改善碳膜与由石英材料形成并与处理容器中的处理空间接触的部件的表面的粘合力来抑制颗粒的产生。 该方法包括在由石英材料形成的处理容器中的由保持单元保持的多个物体的每个表面上形成碳膜，其中所述方法还包括形成粘合膜以改善所述碳膜的粘附性， 由石英材料形成并与处理容器中的处理空间接触的构件的表面。 因此，提高了碳膜对与处理容器内的处理空间接触的石英材料形成的部件的表面的粘附性，抑制了颗粒的产生。