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公开(公告)号：US08834631B2
公开(公告)日：2014-09-16
申请号：US13742712
申请日：2013-01-16
Applicant: Tokyo Electron Limited
Inventor： Katsuhito Hirose , Toshio Miyazawa , Toshiharu Hirata , Toshimasa Tanaka
CPC classification number: C23C16/4551 , C23C16/45544 , C23C16/45561 , C23C16/52 , F16K37/00 , F16K37/0041 , G01M13/00 , H03K21/00 , H03K21/023
Abstract: A processing apparatus includes a processing chamber configured to accommodate a target object to be processed, gas supply paths provided in a corresponding relationship with the kinds of process gases supplied into the processing chamber, and valves respectively arranged in the gas supply paths to open and close the gas supply paths. The processing apparatus further includes valve drive units configured to independently drive the valves, sensor units configured to independently monitor opening and closing operations of the valves, and a control unit configured to determine operation statuses of the valves based on valve opening and closing drive signals transmitted to the valve drive units and/or valve opening and closing detection signals transmitted from the sensor units.
Abstract translation: 处理装置包括：处理室，被配置为容纳待处理的目标物体，与供给到处理室中的处理气体的种类相对应地设置的气体供给路径，以及分别设置在气体供给路径中以打开和关闭的阀 供气路径。 处理装置还包括被配置为独立地驱动阀的阀驱动单元，被配置为独立地监视阀的打开和关闭操作的传感器单元，以及配置成基于阀打开和关闭传动的驱动信号来确定阀的操作状态的控制单元 与从传感器单元传送的阀驱动单元和/或阀打开和关闭检测信号。
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公开(公告)号：US20130183443A1
公开(公告)日：2013-07-18
申请号：US13742712
申请日：2013-01-16
Applicant: TOKYO ELECTRON LIMITED
Inventor： Katsuhito HIROSE , Toshio Miyazawa , Toshiharu Hirata , Toshimasa Tanaka
CPC classification number: C23C16/4551 , C23C16/45544 , C23C16/45561 , C23C16/52 , F16K37/00 , F16K37/0041 , G01M13/00 , H03K21/00 , H03K21/023
Abstract: A processing apparatus includes a processing chamber configured to accommodate a target object to be processed, gas supply paths provided in a corresponding relationship with the kinds of process gases supplied into the processing chamber, and valves respectively arranged in the gas supply paths to open and close the gas supply paths. The processing apparatus further includes valve drive units configured to independently drive the valves, sensor units configured to independently monitor opening and closing operations of the valves, and a control unit configured to determine operation statuses of the valves based on valve opening and closing drive signals transmitted to the valve drive units and/or valve opening and closing detection signals transmitted from the sensor units.
Abstract translation: 处理装置包括：处理室，被配置为容纳待处理的目标物体，与供给到处理室中的处理气体的种类相对应地设置的气体供给路径，以及分别设置在气体供给路径中以打开和关闭的阀 供气路径。 处理装置还包括被配置为独立地驱动阀的阀驱动单元，被配置为独立地监视阀的打开和关闭操作的传感器单元，以及配置成基于阀打开和关闭传动的驱动信号来确定阀的操作状态的控制单元 与从传感器单元传送的阀驱动单元和/或阀打开和关闭检测信号。
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公开(公告)号：US09708711B2
公开(公告)日：2017-07-18
申请号：US13748988
申请日：2013-01-24
Applicant: TOKYO ELECTRON LIMITED
Inventor： Katsuhito Hirose , Toshio Miyazawa , Toshiharu Hirata , Toshimasa Tanaka
IPC: C23C16/52 , C23C16/455
CPC classification number: C23C16/52 , C23C16/45544 , C23C16/45561
Abstract: A processing apparatus includes a processing chamber, gas supply paths provided in a corresponding relationship with the kinds of process gases supplied into the processing chamber, and valves respectively arranged in the gas supply paths. The apparatus further includes a measuring unit for measuring a physical parameter associated with each of the process gases passing through the gas supply paths, a register unit which stores the physical parameter, and a control unit configured to determine a process status based on the physical parameter stored in the register unit. The register unit is provided in a lower-hierarchy control device connected to the control unit of a higher hierarchy to transmit and receive signals to and from the control unit. The lower-hierarchy control device is configured to control input and output signals between the control unit and end devices under the control of the control unit.
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