公开(公告)号：US20240202606A1

公开(公告)日：2024-06-20

申请号：US18589462

申请日：2024-02-28

Applicant: Tokyo Electron Limited

Inventor： Yukiya SAITOU ,  Yuki KATAOKA

IPC: G06N20/20

CPC classification number: G06N20/20

Abstract: To provide an information processing method, an information processing apparatus, and a substrate processing system. Acquiring time series data from a plurality of types of sensors having different sampling periods provided in a substrate processing apparatus, performing learning of first learning models that output information relating to the substrate processing apparatus in a case where the time series data from the sensors are input, using each of the pieces of time series data having different sampling periods for each of the sensors individually, and inputting the time series data from the sensors into the corresponding first learning models after learning to output an estimation result based on information obtained from the first learning models are included.

公开(公告)号：US20250004432A1

公开(公告)日：2025-01-02

申请号：US18882797

申请日：2024-09-12

Applicant: Tokyo Electron Limited

Inventor： Masaki KITSUNEZUKA ,  Jun TAMURA ,  Tsutomu MURATA ,  Masahiro SHIGA ,  Tsuyoshi MORIYA ,  Yuki KATAOKA

IPC: G05B13/04 ,  G06F21/62

Abstract: Provided is a data analysis system, a data analysis device, a data analysis method, and a recording medium. The data analysis system includes: a first data conversion device configured to conceal first data on a first product manufactured in a first manufacturing system and output the first data as first concealed data; and a data analysis device configured to select an element of the first concealed data that affects second data on a second product manufactured using the first product by evaluating a degree of influence between the first concealed data and the second data.

公开(公告)号：US20240045401A1

公开(公告)日：2024-02-08

申请号：US18258965

申请日：2021-12-13

Applicant: Tokyo Electron Limited,

Inventor： Tsuyoshi MORIYA ,  Hironori MOKI ,  Yuki KATAOKA ,  Takahito MATSUZAWA ,  Kazuya UOYAMA

IPC: G05B19/4099

CPC classification number: G05B19/4099 ,  G05B2219/45031 ,  H01L21/67253

Abstract: A management system for managing a substrate manufacturing process includes agent units configured to monitor a state of a substrate processing device that performs the substrate manufacturing process and detect a predetermined event, and transmission paths configured to, when a predetermined event is detected in any one of the agent units, transmit and receive information between the agent units based on the detected event, wherein the one agent unit derives an instruction to the substrate processing device based on the information transmitted and received via the transmission paths so that an index value of the substrate manufacturing process is optimized.

公开(公告)号：US20240045388A1

公开(公告)日：2024-02-08

申请号：US18258644

申请日：2021-12-14

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tsuyoshi MORIYA ,  Hironori MOKI ,  Yuki KATAOKA ,  Kazuya UOYAMA ,  Takahito MATSUZAWA

IPC: G05B13/04 ,  G05B13/02

CPC classification number: G05B13/048 ,  G05B13/0265

Abstract: A mechanism of predicting a change in process values with respect to a control target and using a prediction result is provided. A management apparatus includes a prediction model unit, with respect to which an input-output relationship between multivariate control values at a time T with respect to a control target and multivariate process values at a time T+ΔT with respect to the control target has been learned; and an optimization model unit configured to seek multivariate control values of the time T that minimize respective differences between the multivariate process values at the time T+ΔT output from the prediction model unit and corresponding target values, and control the control target using the multivariate control values of the time T that have been sought. The prediction model unit is configured to, in response to a request from an agent, predict multivariate process values of a time after an elapse of a time ΔT with respect to the control target in a case where the control target is controlled with designated control values, and output the multivariate process values that have been predicted to the agent, the agent managing the prediction model unit.

公开(公告)号：US20150227139A1

公开(公告)日：2015-08-13

申请号：US14695202

申请日：2015-04-24

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takuo YAMAMOTO ,  Yuki KATAOKA

IPC: G05B19/418

CPC classification number: G05B19/41875 ,  C23C16/52 ,  F02D41/1402 ,  F02D41/1441 ,  F02D2041/1412 ,  F02D2041/1416 ,  F02D2041/1426 ,  F02D2041/1433 ,  F02D2041/2058 ,  F02D2200/0402 ,  G05B13/041 ,  G05B13/042 ,  G05B2219/31103 ,  G05B2219/32018 ,  G05B2219/32187 ,  G06N5/022 ,  H01L22/20 ,  H01L2924/0002 ,  Y02P90/12 ,  Y02P90/22 ,  H01L2924/00

Abstract: A device for computing correction for control parameter in a manufacturing process executed on a manufacturing apparatus includes circuitry which acquires an index representing fluctuation in a manufacturing apparatus, acquires an apparatus model and a process model, acquires an output from a sensor in the manufacturing apparatus, transforms the output into first fluctuation for a process element, transforms the index into second fluctuation for the process element based on the apparatus model, computes fluctuation for performance indicator from the first and second fluctuation based on the process model, computes correction for the performance indicator from control range for the performance indicator and the fluctuation for the performance indicator, and converts the correction for the performance indicator into correction for each process element based on the process model such that correction for control parameter in process executed on the manufacturing apparatus is computed from the correction converted for each process element.

Abstract translation: 在制造装置中执行的制造过程中用于计算控制参数校正的装置包括获取表示制造装置中的波动的指标的电路，获取装置模型和处理模型，从制造装置中的传感器获取输出， 将输出变换为处理单元的第一波动，基于设备模型将索引变换为处理单元的第二波动，基于过程模型从第一和第二波动计算性能指标的波动，计算性能指标的校正 从性能指标的控制范围和性能指标的波动，并且基于过程模型将性能指标的校正转换为每个处理元件的校正，使得在制造设备上执行的处理中的控制参数的校正是从 对每个过程元素进行校正。

公开(公告)号：US20130148817A1

公开(公告)日：2013-06-13

申请号：US13708048

申请日：2012-12-07

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tsuyoshi MORIYA ,  Nobutoshi TERASAWA ,  Yuki KATAOKA ,  Masahiro YATABE ,  Shirou ARAKI

IPC: H04R29/00

CPC classification number: H04R29/00

Abstract: An abnormality detection apparatus for a periodic driving system includes a detection unit; a data obtaining unit for time series data from the detected sound; a determinism derivation unit configured to derive a plurality of values representing determinism providing an indicator of whether the time series data is deterministic or stochastic or a plurality of intermediate variations in a calculation process of the values representing determinism at a predetermined interval from the time series data; a probability distribution calculation unit. The abnormality detection apparatus further includes a determination unit configured to determine existence or non-existence of abnormality in the periodic driving system based on the probability distribution of the values representing determinism or the intermediate variations.

Abstract translation: 一种用于周期性驱动系统的异常检测装置，包括检测单元; 数据获取单元，用于根据检测到的声音的时间序列数据; 确定性推导单元，被配置为导出表示确定性的多个值，所述确定性提供时间序列数据是确定性还是随机性的指示符，或者表示从时间序列数据以预定间隔表示确定性的值的计算处理中的多个中间变化 ; 概率分布计算单元。 异常检测装置还包括：判定部，其基于代表确定性或中间变化的值的概率分布，来确定周期性驱动系统中的异常的存在或不存在。

公开(公告)号：US20250147498A1

公开(公告)日：2025-05-08

申请号：US19016213

申请日：2025-01-10

Applicant: Tokyo Electron Limited ,  University of Tsukuba

Inventor： Jun TAMURA ,  Tsuyoshi MORIYA ,  Yuki KATAOKA ,  Akira IMAKURA ,  Tetsuya SAKURAI ,  Yasunori FUTAMURA ,  Xiucai YE

IPC: G05B19/418

Abstract: An information processing method, an information processing system, and a recording medium are provided. A computer executes processing of: acquiring, from apparatuses, first intermediate representations obtained by applying an intermediate representation conversion function to first data individually used by the apparatuses, acquiring, from the apparatuses, second intermediate representations obtained by applying the intermediate representation conversion function to second data commonly used by the apparatuses, adjusting parameters of an integrated representation conversion function to minimize a difference in integrated representations obtained by applying the integrated representation conversion function to the second intermediate representations acquired from the apparatuses, and deriving an apparatus difference correction function for correcting an apparatus difference between the apparatuses based on each of the first intermediate representations acquired from the apparatuses and the integrated representation conversion function for which the parameters are adjusted.

公开(公告)号：US20240272592A1

公开(公告)日：2024-08-15

申请号：US18567534

申请日：2022-03-23

Applicant: Tokyo Electron Limited

Inventor： Takuro TSUTSUI ,  Yuki KATAOKA ,  Yukiya SAITOU ,  Yuanchieh LING

IPC: G05B13/02

CPC classification number: G05B13/0265

Abstract: A workload required for learning work is reduced. A substrate processing apparatus includes a reservoir feature generating unit configured to receive acquired first time-series sensor data and output a reservoir feature; a learning unit configured to learn, in a learning period, a weight parameter so that prediction result data obtained by performing calculations on the reservoir feature under the weight parameter correlates with acquired second time-series sensor data; a predicting unit configured to perform calculations, in a prediction period, on the reservoir feature output from the reservoir feature generating unit in response to the acquired first time-series sensor data being input, under the learned weight parameter, to output prediction result data; and a determining unit configured to determine, in the prediction period, a state of the substrate manufacturing process by comparing the prediction result data with acquired second time-series sensor data.

公开(公告)号：US20240202607A1

公开(公告)日：2024-06-20

申请号：US18589947

申请日：2024-02-28

Applicant: Tokyo Electron Limited

Inventor： Yukiya SAITOU ,  Yuki KATAOKA

IPC: G06N20/20

CPC classification number: G06N20/20

Abstract: To provide an information processing method, an information processing apparatus, and an information processing system. Acquiring a feature value of data processed by a plurality of first learning models, performing learning of a second learning model that outputs information relating to an estimation result in a case where the feature value of data processed by the first learning model is input based on the acquired feature value, and inputting the acquired feature value of data into the second learning model after learning to output an estimation result based on information obtained from the second learning model are included.

公开(公告)号：US20230393540A1

公开(公告)日：2023-12-07

申请号：US18250636

申请日：2021-10-29

Applicant: Tokyo Electron Limited

Inventor： Yuki KATAOKA ,  Hironori MOKI

IPC: G05B13/04 ,  G05B23/02

CPC classification number: G05B13/042 ,  G05B23/0283 ,  G05B23/0262

Abstract: A model management system, a model management method, and a model management program that efficiently manage models applied to a substrate manufacturing process is provided. The model management system separately manages the models applied to the substrate manufacturing process in three or more layers, and includes a first management unit configured to manage a model at a predetermined layer, and one or more second management units configured to manage one or more models at a layer one level lower than the predetermined layer. The first management unit includes a calculating unit configured to, when one or more model parameters of the one or more models managed by the one or more second management units are updated, calculate a new model parameter based on each of the updated one or more model parameters, and a control unit configured to perform control so that the new model parameter is set in a plurality of models respectively managed by a plurality of management units at a lowest layer, belonging to the first management unit.