摘要:
A glass composition for ultraviolet light is provided. The glass composition for ultraviolet light contains Lu, Al, and O in an amount of 99.99 weight % or more in total. The glass composition contains Lu in an amount of 24% or more and 33% or less in cation percent and Al in an amount of 67% or more and 76% or less in cation percent.
摘要:
An optical glass containing Si, Al, Ca, and O is provided. The optical glass contains Si in an amount of 7% or more and 93% or less, in cation percent, Al in an amount of 2% or more and 57% or less, in cation percent, and Ca in an amount of 2% or more and 52% or less, in cation percent. In the optical glass, a total amount of Si, Al, and Ca is 99.5% or more, in cation percent. Further, the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 15% or more at a thickness of 5 mm.
摘要:
A glass composition for ultraviolet light is provided. The glass composition for ultraviolet light contains Lu, Al, and O in an amount of 99.99 weight % or more in total. The glass composition contains Lu in an amount of 24% or more and 33% or less in cation percent and Al in an amount of 67% or more and 76% or less in cation percent.
摘要:
An optical glass that contains Si, Al, Mg, and O is provided. The optical glass contains Si in an amount of 40% or more and 60% or less, in cation percent, Al in an amount of 10% or more and 35% or less, in cation percent, and Mg in an amount of 20% or more and 35% or less, in cation percent. In the optical glass, the total amount of Si, Al, and Mg is 99.5% or more, in cation percent. Furthermore, the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 40% or more at a thickness of 5 mm.
摘要:
An optical glass containing Si, Al, Ca, and O is provided. The optical glass contains Si in an amount of 7% or more and 93% or less, in cation percent, Al in an amount of 2% or more and 57% or less, in cation percent, and Ca in an amount of 2% or more and 52% or less, in cation percent. In the optical glass, a total amount of Si, Al, and Ca is 99.5% or more, in cation percent. Further, the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 15% or more at a thickness of 5 mm.
摘要:
An optical glass that contains Si, Al, Mg, and O is provided. The optical glass contains Si in an amount of 40% or more and 60% or less, in cation percent, Al in an amount of 10% or more and 35% or less, in cation percent, and Mg in an amount of 20% or more and 35% or less, in cation percent. In the optical glass, the total amount of Si, Al, and Mg is 99.5% or more, in cation percent. Furthermore, the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 40% or more at a thickness of 5 mm.
摘要:
An optical glass that contains Si, Al, Mg, and O is provided. The optical glass contains Si in an amount of 40% or more and 60% or less, in cation percent, Al in an amount of 10% or more and 35% or less, in cation percent, and Mg in an amount of 20% or more and 35% or less, in cation percent. In the optical glass, the total amount of Si, Al, and Mg is 99.5% or more, in cation percent. Furthermore, the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 40% or more at a thickness of 5 mm.
摘要:
An imaging apparatus includes a diffraction grating which diffracts electromagnetic waves from an electromagnetic wave source, a shield grating which shields a part of the electromagnetic waves diffracted by the diffraction grating, a detector which detects an intensity distribution of the electromagnetic waves through the shield grating, and an adjusting unit which adjusts the attitude of at least one of the diffraction grating and the shield grating on the basis of the detection result by the detector, wherein the adjusting unit divides the intensity distribution detected by the detector into a plurality of regions and adjusts the attitude of at least one of the diffraction grating and the shield grating on the basis of the intensity distributions of the plurality of regions.
摘要:
There is provided an X-ray imaging method for reducing unnecessary components caused by a transmittance distribution of an object and unevenness in irradiation by a light source and accurately calculating a differential phase at the time of X-ray imaging by SDG.
摘要:
A phase grating used for X-ray phase imaging is provided, in which a pitch can be narrowed by using a diffraction grating with a low aspect ratio. A phase grating used for X-ray phase imaging, characterized in that the phase grating includes a first diffraction grating in which a first projection part whose thickness is formed so that an in-coming X-ray transmits with a phase π-shifted, and a first aperture part with the same aperture width as a width of the first projection part are cyclically arranged, and a second diffraction grating in which a second projection part with the same width as a width of the first projection part, and a second aperture part with the same aperture width as the aperture width of the first aperture part are cyclically arranged, and the second diffraction grating is formed as displaced on the first diffraction grating.