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    Solid state imaging device and fabrication method thereof, and camera incorporating the solid state imaging device
    1.
    发明申请
    Solid state imaging device and fabrication method thereof, and camera incorporating the solid state imaging device 有权
    固态成像装置及其制造方法以及并入固态成像装置的相机

    公开(公告)号：US20060158547A1

    公开(公告)日：2006-07-20

    申请号：US11333339

    申请日：2006-01-18

    申请人： Tomoko Komatsu ,  Toshihiro Higuchi

    发明人： Tomoko Komatsu ,  Toshihiro Higuchi

    IPC分类号： H04N5/225

    CPC分类号： H01L27/14621 ,  H01L27/14623 ,  H01L27/14627 ,  H01L27/14685

    摘要： A solid state imaging device of the present invention comprises: a semiconductor substrate; a plurality of light receiving elements arranged in a matrix configuration on the semiconductor substrate; a plurality of color filter segments provided above the light receiving elements; and a light collector provided above the color filter segments for collecting light on the light receiving elements. The color filter segments are mutually separated by interstices. The interstices contain a gas.

    摘要翻译： 本发明的固态成像装置包括：半导体衬底; 多个在所述半导体衬底上以矩阵构造布置的光接收元件; 设置在所述光接收元件上方的多个滤色器片段; 以及设置在滤色器片段上方的用于在光接收元件上收集光的集光器。 滤色片段通过间隙相互分离。 空隙含有气体。

    Solid state imaging device and fabrication method thereof, and camera incorporating the solid state imaging device
    2.
    发明授权
    Solid state imaging device and fabrication method thereof, and camera incorporating the solid state imaging device 有权
    固态成像装置及其制造方法以及并入固态成像装置的相机

    公开(公告)号：US08139131B2

    公开(公告)日：2012-03-20

    申请号：US11333339

    申请日：2006-01-18

    申请人： Tomoko Komatsu ,  Toshihiro Higuchi

    发明人： Tomoko Komatsu ,  Toshihiro Higuchi

    IPC分类号： H04N3/14 ,  H01L21/00 ,  H01L27/00 ,  H01L31/062

    CPC分类号： H01L27/14621 ,  H01L27/14623 ,  H01L27/14627 ,  H01L27/14685

    摘要： A solid state imaging device of the present invention comprises: a semiconductor substrate; a plurality of light receiving elements arranged in a matrix configuration on the semiconductor substrate; a plurality of color filter segments provided above the light receiving elements; and a light collector provided above the color filter segments for collecting light on the light receiving elements. The color filter segments are mutually separated by interstices. The interstices contain a gas.

    摘要翻译： 本发明的固态成像装置包括：半导体衬底; 多个在所述半导体衬底上以矩阵构造布置的光接收元件; 设置在所述光接收元件上方的多个滤色器片段; 以及设置在滤色器片段上方的用于在光接收元件上收集光的集光器。 滤色片段通过间隙相互分离。 空隙含有气体。

    SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    4.
    发明申请
    SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    固态成像装置及其制造方法

    公开(公告)号：US20090206430A1

    公开(公告)日：2009-08-20

    申请号：US11997959

    申请日：2006-04-25

    申请人： Toshihiro Higuchi ,  Masayuki Aoyama ,  Tomoko Komatsu

    发明人： Toshihiro Higuchi ,  Masayuki Aoyama ,  Tomoko Komatsu

    IPC分类号： H01L31/0232 ,  H01L21/302

    CPC分类号： G02B3/0018 ,  G02B3/0056 ,  G02B5/201 ,  G02B5/208 ,  H01L27/14627 ,  H01L27/14685 ,  H04N5/335

    摘要： A pattern (6B) is formed by performing selective exposure and development on a photosensitive resist (6A), and then the pattern (6B) is decolorized by irradiating the pattern with ultraviolet or visible light. Then, a microlens (6) is formed by deforming the shape of the pattern (6B) into a microlens shape by heating. An inequality of h/a≧1 is satisfied, where, (h) is the height of the microlens (6), and (2a) is the length of the bottom plane of the microlens (6) in a short side direction when viewed from the upper plane.

    摘要翻译： 通过对光敏抗蚀剂（6A）进行选择性曝光和显影来形成图案（6B），然后通过用紫外线或可见光照射图案来使图案（6B）脱色。 然后，通过加热将图案（6B）的形状变形为微透镜形状来形成微透镜（6）。 满足h / a> = 1的不等式，其中，（h）是微透镜（6）的高度，（2a）是微透镜（6）在短边方向上的底面的长度， 从上层飞机观察。

    Solid-state imaging device
    7.
    发明授权
    Solid-state imaging device 有权
    固态成像装置

    公开(公告)号：US08093672B2

    公开(公告)日：2012-01-10

    申请号：US11523698

    申请日：2006-09-20

    申请人： Tomoki Masuda ,  Toshihiro Higuchi ,  Yasuo Takeuchi ,  Tomoko Komatsu

    发明人： Tomoki Masuda ,  Toshihiro Higuchi ,  Yasuo Takeuchi ,  Tomoko Komatsu

    IPC分类号： H01L31/0232

    CPC分类号： H01L27/14627 ,  H01L27/14632 ,  H01L27/14687

    摘要： Provided is a manufacturing method of a solid-state imaging device, which is able to realize a solid-state imaging device whose reflection prevention coating is even and that does not have image noise in case of adopting a spincoating method in applying a material of the reflection prevention coating onto microlenses of the solid-state imaging device. In the solid-state imaging device 1 according to the present invention, a barrier wall pattern 7 is formed, as a step alleviating structure, in dicing areas 5X formed between adjacent imaging areas 9. The barrier wall pattern 7 has a rectangular sectional form. With use of the barrier wall pattern 7 in the spincoating method, reflection prevention coating 8 is coated onto the microlenses 6 more evenly than in conventional cases.

    摘要翻译： 提供一种固态成像装置的制造方法，其能够实现防反射涂层均匀的固态成像装置，并且在应用旋涂方法的情况下不具有图像噪声 反射防止涂层在固态成像装置的微透镜上。 在根据本发明的固态成像装置1中，在形成在相邻成像区域9之间的切割区域5X中形成阻挡壁图案7作为阶梯缓和结构。阻挡壁图案7具有矩形截面形状。 通过使用旋涂法中的阻挡壁图案7，与常规情况相比，防反射涂层8更均匀地涂覆在微透镜6上。

    Solid-state imaging device and manufacturing method thereof
    8.
    发明申请
    Solid-state imaging device and manufacturing method thereof 有权
    固态成像装置及其制造方法

    公开(公告)号：US20070096243A1

    公开(公告)日：2007-05-03

    申请号：US11523698

    申请日：2006-09-20

    申请人： Tomoki Masuda ,  Toshihiro Higuchi ,  Yasuo Takeuchi ,  Tomoko Komatsu

    发明人： Tomoki Masuda ,  Toshihiro Higuchi ,  Yasuo Takeuchi ,  Tomoko Komatsu

    IPC分类号： H01L31/06

    CPC分类号： H01L27/14627 ,  H01L27/14632 ,  H01L27/14687

    摘要： Provided is a manufacturing method of a solid-state imaging device, which is able to realize a solid-state imaging device whose reflection prevention coating is even and that does not have image noise in case of adopting a spincoating method in applying a material of the reflection prevention coating onto microlenses of the solid-state imaging device. In the solid-state imaging device 1 according to the present invention, a barrier wall pattern 7 is formed, as a step alleviating structure, in dicing areas 5X formed between adjacent imaging areas 9. The barrier wall pattern 7 has a rectangular sectional form. With use of the barrier wall pattern 7 in the spincoating method, reflection prevention coating 8 is coated onto the microlenses 6 more evenly than in conventional cases.

    摘要翻译： 提供一种固态成像装置的制造方法，其能够实现防反射涂层均匀的固态成像装置，并且在应用旋涂方法的情况下不具有图像噪声 反射防止涂层在固态成像装置的微透镜上。 在根据本发明的固态成像装置1中，在相邻成像区域9之间形成的切割区域5中形成有阻挡壁图案7作为阶梯缓和结构。 阻挡壁图案7具有矩形截面形状。 通过使用旋涂法中的阻挡壁图案7，与常规情况相比，防反射涂层8更均匀地涂覆在微透镜6上。

    Portable electronic equipment and battery mounting device of the equipment
    10.
    发明授权
    Portable electronic equipment and battery mounting device of the equipment 失效
    便携式电子设备和设备的电池安装装置

    公开(公告)号：US07043282B2

    公开(公告)日：2006-05-09

    申请号：US10466448

    申请日：2002-06-07

    申请人： Yoji Inomata ,  Yasunobu Ikeda ,  Toshihiro Higuchi

    发明人： Yoji Inomata ,  Yasunobu Ikeda ,  Toshihiro Higuchi

    IPC分类号： H04M1/00

    CPC分类号： H04M1/0262 ,  H01M2/1022 ,  H01M2/1066

    摘要： In order to enable both a back lid and a battery of a mobile electronic apparatus to be locked and unlocked with a single motion, the mobile electronic apparatus (10) in which the battery (11) is housed by opening the back lid (13) has such a structure that when a lock member (21) which is provided in a body of the mobile electronic apparatus so as to slide is slid to a locked position, the lock member (21) simultaneously locks both an engaging part (11a) provided in the battery (11) and an engaging part (13b) provided in the back lid (13), and when the lock member (21) is slid to an unlocked position, the lock member (21) simultaneously unlocks both the engaging parts (11a, 13b).

    摘要翻译： 为了使得后盖和移动电子设备的电池能够以单一动作被锁定和解锁，通过打开后盖（13）来容纳电池（11）的移动电子设备（10） 具有这样的结构：当设置在移动电子设备的主体中以便滑动的锁定构件（21）滑动到锁定位置时，锁定构件（21）同时锁定接合部分（11a） 设置在电池（11）中的接合部（13b）和设置在后盖（13）中的接合部（13b），并且当锁定构件（21）滑动到解锁位置时，锁定构件（21）同时解锁接合 部分（11a，13b）。