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公开(公告)号：US07598491B2
公开(公告)日：2009-10-06
申请号：US11415286
申请日：2006-05-02
IPC分类号： G21K7/00 , G01N23/225
CPC分类号： H01J37/28 , H01J2237/2817
摘要： The present invention relates to high-speed acquisition of both a perpendicular observation image and a tilt observation image, in observation using a scanning electron microscope. An electron-beam observation apparatus includes: a first electro-optical system which scans a converged electron beam from a substantially perpendicular direction to a defect on a target wafer to be observed, and acquires a defect image signal with perpendicular observation by detecting a secondary electron image or a reflected electron image generated from the defect; and a second electro-optical system which scans a converged electron beam from a tilt direction to the defect, and acquires a defect image signal with tilt observation by detecting a secondary electron image or a reflected electron image generated from the defect.
摘要翻译： 本发明涉及在使用扫描电子显微镜的观察中对垂直观察图像和倾斜观察图像进行高速采集。 电子束观察装置包括：第一电光学系统，其从基本垂直的方向扫描会聚的电子束到要观察的目标晶片上的缺陷，并通过检测二次电子获取垂直观察的缺陷图像信号 图像或从缺陷产生的反射电子图像; 以及第二电光学系统，其从倾斜方向扫描会聚的电子束到缺陷，并且通过检测从缺陷产生的二次电子图像或反射的电子图像来获取具有倾斜观察的缺陷图像信号。
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2.发明授权Apparatus and method for monitoring semiconductor device manufacturing process 有权用于监测半导体器件制造工艺的装置和方法公开(公告)号：US08547429B2
公开(公告)日：2013-10-01
申请号：US12379645
申请日：2009-02-26
申请人： Toshifumi Honda , Yuuji Takagi
发明人： Toshifumi Honda , Yuuji Takagi
CPC分类号： G06T7/0006 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A hotspot searching apparatus manufactures a small number of chips or regions on a semiconductor wafer under respectively different manufacturing process conditions, compares SEM images of their external appearances to output a point having large differences as a narrow process window, that is, a process monitoring point that should be managed in mass production, the narrow process window having a narrow manufacturing process condition (exposure condition) in the manufacturing of the semiconductor wafer, and sets the point as a measurement point by a CD-SEM apparatus, such that it extracts and determines plural circuit pattern parts having a narrow manufacturing process margin as the process monitoring point in a short time and a process monitoring point monitoring performs shape inspection or shape length measurement in detail at high resolution.
摘要翻译： 热点搜索装置分别在不同的制造工艺条件下制造半导体晶片上的少量芯片或区域，比较其外观的SEM图像以输出具有较大差异的点作为窄工艺窗口，即处理监视点 应在大规模生产中进行管理，在半导体晶片的制造中具有窄制造工艺条件（曝光条件）的窄工艺窗口，并且通过CD-SEM装置将点设定为测量点，使得其提取和 在短时间内确定具有窄制造工艺余量的多个电路图形部分作为处理监视点，并且处理监视点监视以高分辨率详细地进行形状检查或形状长度测量。
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3.发明申请公开(公告)号：US20090231424A1
公开(公告)日：2009-09-17
申请号：US12379645
申请日：2009-02-26
申请人： Toshifumi Honda , Yuuji Takagi
发明人： Toshifumi Honda , Yuuji Takagi
IPC分类号： H04N7/18
CPC分类号： G06T7/0006 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A hotspot searching apparatus manufactures a small number of chips or regions on a semiconductor wafer under respectively different manufacturing process conditions, compares SEM images of their external appearances to output a point having large differences as a narrow process window, that is, a process monitoring point that should be managed in mass production, the narrow process window having a narrow manufacturing process condition (exposure condition) in the manufacturing of the semiconductor wafer, and sets the point as a measurement point by a CD-SEM apparatus, such that it extracts and determines plural circuit pattern parts having a narrow manufacturing process margin as the process monitoring point in a short time and a process monitoring point monitoring performs shape inspection or shape length measurement in detail at high resolution.
摘要翻译： 热点搜索装置分别在不同的制造工艺条件下制造半导体晶片上的少量芯片或区域，比较其外观的SEM图像以输出具有较大差异的点作为窄工艺窗口，即处理监视点 应在大规模生产中进行管理，在半导体晶片的制造中具有窄制造工艺条件（曝光条件）的窄工艺窗口，并且通过CD-SEM装置将点设定为测量点，使得其提取和 在短时间内确定具有窄制造工艺余量的多个电路图形部分作为处理监视点，并且处理监视点监视以高分辨率详细地进行形状检查或形状长度测量。
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公开(公告)号：US20060289752A1
公开(公告)日：2006-12-28
申请号：US11415286
申请日：2006-05-02
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J2237/2817
摘要： The present invention relates to high-speed acquisition of both a perpendicular observation image and a tilt observation image, in observation using a scanning electron microscope. An electron-beam observation apparatus includes: a first electro-optical system which scans a converged electron beam from a substantially perpendicular direction to a defect on a target wafer to be observed, and acquires a defect image signal with perpendicular observation by detecting a secondary electron image or a reflected electron image generated from the defect; and a second electro-optical system which scans a converged electron beam from a tilt direction to the defect, and acquires a defect image signal with tilt observation by detecting a secondary electron image or a reflected electron image generated from the defect.
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5.发明授权Optical recording and reproducing apparatus having erasing function with controllable erasing beam 失效具有可擦除光束的擦除功能的光学记录和再现装置
公开(公告)号：US4799208A
公开(公告)日：1989-01-17
申请号：US915576
申请日：1986-10-03
IPC分类号： G11B7/00 , G11B7/0055 , G11B7/006 , G11B7/125 , G11B7/30
摘要： A data recording and reproducing apparatus is disclosed in which an optical disc for recording, reproducing or erasing data is radiated with an erasing light beam and a recording-reproducing light beam sequentially to record or reproduce the data with the recording-reproducing light beam and erase the data with the erasing light beam. In rewriting the data, the erasing light beam is radiated in advance of the recording-reproducing light beam on a data section of the disc, and the old data is erased by temperature increase and annealing by the erasing light beam, while new data is recorded by temperature increase and quenching with the recording-reproducing light beam set to the recording light intensity. After recording the new data, the light intensity of the erasing light beam is gradually decreased and turned off. In rewriting the sector data, the erasing light beam is radiated on the data section in advance of the recording-reproducing light beam, and by the temperature increase and annealing with the erasing light beam, the old data is erased, while new data is recorded by temperature increase and quenching with the recording-reproducing light beam set to the recording light intensity. After recording the new data, the light intensity of the erasing light beam is turned off after being modulated for a predetermined time. By doing so, the process of the temperature and quenching is eliminated which otherwise might be required at the time of turning off the erasing light beam, thereby preventing occurrence of a recording trace and a defect of the recording medium by a thermal shock.
摘要翻译： 公开了一种数据记录和再现装置，其中用于记录，再现或擦除数据的光盘依次用擦除光束和记录再现光束照射，以用记录 - 再现光束记录或再现数据并擦除 数据与擦除光束。 在重写数据时，擦除光束在记录再现光束之前在盘的数据部分上被辐射，并且通过擦除光束的温度升高和退火擦除旧数据，同时记录新数据 通过设置为记录光强度的记录 - 再现光束的温度升高和淬火。 在记录新数据之后，擦除光束的光强度逐渐降低并关闭。 在重写扇区数据时，擦除光束在记录再现光束之前在数据部分被辐射，并且通过用擦除光束进行升温和退火，旧数据被擦除，而新数据被记录 通过设置为记录光强度的记录 - 再现光束的温度升高和淬火。 在记录新数据之后，擦除光束的光强度在被调制预定时间后被关闭。 通过这样做，消除了在关闭擦除光束时可能需要的温度和淬灭的过程，从而防止由于热冲击而产生记录痕迹和记录介质的缺陷。
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6.发明授权Information recording and reproducing apparatus with management of defective sector 失效具有缺陷扇区管理的信息记录和再现装置
公开(公告)号：US4986668A
公开(公告)日：1991-01-22
申请号：US416834
申请日：1989-10-03
IPC分类号： G11B20/12 , G11B7/00 , G11B7/004 , G11B7/0055 , G11B20/18
CPC分类号： G11B20/1883 , G11B2220/20
摘要： An information recording and reproducing apparatus for recording and reproducing information on and from a disk type information recording medium, wherein the information recording medium is used in which normal sectors (S1, Sn) each having an address formatted on an address area 12 in a sector ID field 9 and an alternative sector R1 having an address not yet recorded thereon are included on a same track. When a defective sector S3 is detected, first, the address of the defective sector is disabled to be reproduced by recording a delete signal 109 on the address area 12 of the defective sector S3, and at the same time, the address of the defective sector is recorded on an address area 13 in the unused alternative sector R1 located on the same track as the defective sector S3, and then, the data to be recorded on the defective sector is recorded within the alternative sector R1. Owing to such an operation for using an alternative sector, the alternative sector having the same address and data as the defective sector is formed on the same track as the defective sector. As a result, an information recording and reproducing apparatus which enables to access the alternative sector without an additional seek operation at the time of reproduction is provided.
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公开(公告)号：US4789911A
公开(公告)日：1988-12-06
申请号：US49306
申请日：1987-05-13
CPC分类号： G11B27/3027 , G11B20/12 , G11B20/18 , G11B2220/20
摘要： In an information and recording and reproducing apparatus using a disc-shaped information recording medium having a plurality of recording tracks, each of which recording tracks is divided into a plurality of sectors, to record and reproduce information on and from the information recording medium on a sector-by-sector basis, when a target sector is detected to be a defective sector whose address can not be reproduced, in the first place, a reference sector, which is positioned preceding the defective target sector and whose address can be reproduced, is detected. Then, a rotational latency time from the detected reference sector to the defective target sector is measured by using:a time measuring circuit for measuring the rotational latency time per se; ora counter circuit for counting the number of a sector mark or sector marks which indicate the presence of an associated sector or sectors and which are detected during the rotational latency time,so that the defective target sector may be taken to be a normally detected target sector whereby information may be recorded and reproduced on and from the defective target sector, thereby making it possible to perform recording and reproduction of information on and from a defective sector whose address can not be reproduced.
摘要翻译： 在使用具有多个记录磁道的盘形信息记录介质的信息和记录和再现装置中，每个记录磁道被划分成多个扇区，以便在信息记录介质上记录和再现信息 当目标扇区被检测为不能再现其地址的缺陷扇区时，首先，位于缺陷目标扇区之前并且其地址可被再现的参考扇区是逐扇区的 检测到。 然后，通过以下方式测量从检测到的参考扇区到缺陷目标扇区的旋转等待时间：用于测量旋转等待时间本身的时间测量电路; 或用于计数表示相关扇区或扇区的存在并且在旋转等待时间期间被检测到的扇区标记或扇区标记的数量的计数器电路，使得有缺陷的目标扇区可以被认为是正常检测的目标 扇区，从而可以在有缺陷的目标扇区上记录和再现信息，从而使得可以在不能再现其地址的缺陷扇区上执行信息的记录和再现。
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8.发明授权Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device 有权观察曝光半导体器件的曝光条件的方法及其装置及制造半导体器件的方法公开(公告)号：US06913861B2
公开(公告)日：2005-07-05
申请号：US10370369
申请日：2003-02-18
申请人： Chie Shishido , Osamu Komuro , Hidetoshi Morokuma , Ryo Nakagaki , Maki Tanaka , Yuuji Takagi
发明人： Chie Shishido , Osamu Komuro , Hidetoshi Morokuma , Ryo Nakagaki , Maki Tanaka , Yuuji Takagi
CPC分类号： G03F7/70625 , G03F7/70641 , H01J37/28 , H01J2237/2817 , Y10S430/143
摘要： Size characteristic quantities are measured at a plural locations. The size characteristic quantities include edge widths, pattern widths, and/or pattern lengths of the electron-beam images of a resist-dropout pattern and a resist-remaining pattern that are located such that the effective exposure quantities differ depending on the places. With the predetermined measurement errors added thereto, the size characteristic quantities are compared with model data that has been created in advance and that causes various exposure conditions to be related with the size characteristic quantities measured under these various exposure conditions. This comparison makes it possible not only to estimate deviation quantities in the exposure quantity and the focal-point position from the correct values, but also to calculate ambiguity degrees of the estimated values. This, allows the implementation of a proper monitoring/controlling of the exposure-condition variations (i.e., the deviations in the exposure quantity and the focal-point position) in the lithography process.
摘要翻译： 在多个位置测量尺寸特征量。 尺寸特征量包括抗蚀剂落下图案和抗蚀剂剩余图案的电子束图像的边缘宽度，图案宽度和/或图案长度，其位置使得有效曝光量根据位置而不同。 随着预定的测量误差被添加到其中，将尺寸特征量与预先创建的模型数据进行比较，并使各种曝光条件与在这些各种曝光条件下测量的尺寸特征量相关。 该比较使得不仅可以从正确值估计曝光量和焦点位置中的偏差量，而且可以计算估计值的模糊度。 这允许在光刻工艺中实现曝光条件变化（即，曝光量和焦点位置的偏差）的适当监控/控制。
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公开(公告)号：US4695993A
公开(公告)日：1987-09-22
申请号：US743314
申请日：1985-06-10
申请人： Yuuji Takagi , Isao Satoh , Tatsuo Sugimura
发明人： Yuuji Takagi , Isao Satoh , Tatsuo Sugimura
IPC分类号： G11B7/004 , G11B7/007 , G11B19/04 , G11B20/12 , G11B20/18 , G11B27/30 , G11B5/09 , G11B15/04
CPC分类号： G11B20/1883 , G11B19/04 , G11B20/1217 , G11B27/3027 , G11B7/004 , G11B7/00745 , G11B2020/10879 , G11B2220/20 , G11B2220/218 , G11B2220/2537
摘要： An information recording and reproducing apparatus records and reproduces information in and from a recording medium including an information recording region divided into a plurality of sectors. In recording and reproducing information in and from the recording medium, each sector includes a sector address part formatted and a data recording part for recording data. A predetermined signal is overwritten in the address of a sector thereby making reproduction of the address impossible to prevent data from being recorded again by error in the sector containing data, while at the same time protecting the writing in the sectors. In data recording, on the other hand, the address signal from the recording medium is binary-coded at a different level to detect a sector of unstable address reproduction, so that a predetermined signal is overwritten in the address of this sector to make subsequent reproduction of the address impossible, thus permitting recording only in the sectors of stable address reproduction for stable data reproduction. Further, an optical disc having sectors of stable address reproduction alone detects a sector of unstable reproduction at the time of inspection, and overwrites a predetermined signal in the address part of the particular sector to make subsequent reproduction of the address impossible.
摘要翻译： 信息记录和再现装置在包括被划分为多个扇区的信息记录区域的记录介质中记录和再现信息。 在记录介质中记录和再现信息时，每个扇区包括格式化的扇区地址部分和用于记录数据的数据记录部分。 在扇区的地址中覆盖一个预定的信号，从而使该地址的再现不可能防止在包含数据的扇区中由错误再次记录数据，同时保护扇区中的写入。 另一方面，在数据记录中，来自记录介质的地址信号以不同的电平进行二进制编码，以检测不稳定地址再现的扇区，从而在该扇区的地址中覆盖预定的信号以进行后续再现 因此只允许在稳定的地址再现的扇区中进行记录，以便稳定的数据再现。 此外，具有稳定的地址再现的扇区的光盘检测在检查时不稳定再现的扇区，并且覆盖特定扇区的地址部分中的预定信号，以使该地址的后续再现成为可能。
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公开(公告)号：US06792366B2
公开(公告)日：2004-09-14
申请号：US10015276
申请日：2001-12-11
申请人： Naoki Hosoya , Yuuji Takagi , Hisae Shibuya , Kenji Obara
发明人： Naoki Hosoya , Yuuji Takagi , Hisae Shibuya , Kenji Obara
IPC分类号： H01L2100
CPC分类号： H01L22/20 , G06T7/0002 , G06T7/0004 , G06T7/41 , G06T2200/24 , G06T2207/30148
摘要： In a wafer inspection and sampling system, wafer defects are detected and stored in a data store as defect data. Information is also provided, representative of clusters of defects on the wafer. A statistically based sampling of the defects is made to obtain a set of sampled defects. Subsequent detailed inspection and analysis of the sampled defects produces additional data which facilitate an understanding of process errors.
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