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公开(公告)号：US08698111B2
公开(公告)日：2014-04-15
申请号：US13283922
申请日：2011-10-28
IPC分类号： G21G4/00
摘要： An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly.
摘要翻译： 通过激发目标材料以将目标材料转化成等离子体来产生极紫外光的装置可以包括：框架; 产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 用于柔性地连接所述框架和所述室的第一连接构件; 用于将目标供给单元固定到框架的机构; 以及用于灵活地将目标供应单元连接到室的第二连接构件。
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公开(公告)号：US20120104290A1
公开(公告)日：2012-05-03
申请号：US13283922
申请日：2011-10-28
摘要： An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly.
摘要翻译： 通过激发目标材料以将目标材料转化成等离子体来产生极紫外光的装置可以包括：框架; 产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 用于柔性地连接所述框架和所述室的第一连接构件; 用于将目标供给单元固定到框架的机构; 以及用于灵活地将目标供应单元连接到室的第二连接构件。
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公开(公告)号：US09052615B2
公开(公告)日：2015-06-09
申请号：US12543582
申请日：2009-08-19
CPC分类号： G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
摘要翻译： EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构 在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室 预定位置和维护区域。
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公开(公告)号：US08759804B2
公开(公告)日：2014-06-24
申请号：US13122354
申请日：2011-03-11
CPC分类号： H05G2/008 , G03B27/54 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
摘要翻译： 与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。
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公开(公告)号：US20110309260A1
公开(公告)日：2011-12-22
申请号：US13122354
申请日：2011-03-11
CPC分类号： H05G2/008 , G03B27/54 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
摘要翻译： 与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。
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公开(公告)号：US08497489B2
公开(公告)日：2013-07-30
申请号：US13051649
申请日：2011-03-18
IPC分类号： G01K5/00
CPC分类号： G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.
摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。
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公开(公告)号：US08669542B2
公开(公告)日：2014-03-11
申请号：US12764517
申请日：2010-04-21
申请人： Yukio Watanabe , Osamu Wakabayashi , Miwa Igarashi
发明人： Yukio Watanabe , Osamu Wakabayashi , Miwa Igarashi
IPC分类号： G01J3/10
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , G21K1/04 , H05G2/003 , H05G2/005
摘要： An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.
摘要翻译： 一种用于向处理单元提供极紫外光的极紫外光源装置，用于通过使用极紫外光进行处理。 所述极紫外光源装置具有：向所述处理单元供给所述极紫外光的室， 收集器反射镜，用于收集在室中产生的极紫外光，以将极紫外光输出到处理单元; 以及光路连接模块，其用于限定所述室与所述处理单元之间的所述极紫外光的路线，并将所述极紫外光的路径与外部隔离。
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公开(公告)号：US09046651B2
公开(公告)日：2015-06-02
申请号：US13696528
申请日：2011-12-29
CPC分类号： G02B7/181 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70175
摘要： A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
摘要翻译： 反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部分中的相应凹槽上。
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公开(公告)号：US20130050862A1
公开(公告)日：2013-02-28
申请号：US13696528
申请日：2011-12-29
IPC分类号： G02B7/182
CPC分类号： G02B7/181 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70175
摘要： A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
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公开(公告)号：US08498317B2
公开(公告)日：2013-07-30
申请号：US13543510
申请日：2012-07-06
CPC分类号： H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
摘要： A temperature controller for a gas laser which controls temperatures of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
摘要翻译： 一种气体激光器的温度控制器，其控制包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分的温度控制装置的温度， 与第一温度控制部分相比，具有低或高温度的控制包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂，第二温度控制部分产生 冷却剂或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统和将第二温度控制部分和 第二个温度受控部分 平行
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