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    FINE STRUCTURE TRANSFER APPARATUS AND FINE STRUCTURE TRANSFER METHOD
    2.
    发明申请
    FINE STRUCTURE TRANSFER APPARATUS AND FINE STRUCTURE TRANSFER METHOD 审中-公开
    精细结构转移装置和精细结构转移方法

    公开(公告)号：US20120319326A1

    公开(公告)日：2012-12-20

    申请号：US13577337

    申请日：2011-03-10

    申请人： Toshimitsu Shiraishi ,  Kyoichi Mori ,  Noritake Shizawa ,  Naoaki Yamashita ,  Masahiko Ogino ,  Akihiro Miyauchi

    发明人： Toshimitsu Shiraishi ,  Kyoichi Mori ,  Noritake Shizawa ,  Naoaki Yamashita ,  Masahiko Ogino ,  Akihiro Miyauchi

    IPC分类号： B29C59/02

    CPC分类号： G11B5/855 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The fine structure transfer apparatus is provided with a pattern transfer mechanism having a resin applying mechanism, a substrate handling mechanism, an aligning mechanism, a pressurizing mechanism, and a peeling mechanism, and the pressurizing mechanism is configured of an upper head section and a lower stage section, the molding die having the fine pattern formed thereon is fixed on the lower surface of the upper head section, and after pressurization and transfer, the lower stage section retracts from a position below the substrate in the state wherein the substrate is adhered to the molding die, then, after the peeling mechanism is moved to a position below the substrate, the substrate adhered to the molding die is peeled.

    摘要翻译： 精细结构传送装置设置有具有树脂施加机构，基板处理机构，对准机构，加压机构和剥离机构的图案转印机构，并且加压机构由上部头部和下部 具有形成在其上的精细图案的成形模具固定在上部头部的下表面上，并且在加压和转印之后，下基板在基板被粘附的状态下从基板下方的位置缩回 成型模具，然后，在剥离机构移动到基板下方的位置之后，粘附到成型模具的基板被剥离。

    DEVICE AND METHOD FOR TRANSFERRING MICRO STRUCTURE
    4.
    发明申请
    DEVICE AND METHOD FOR TRANSFERRING MICRO STRUCTURE 失效
    用于传输微结构的装置和方法

    公开(公告)号：US20120205838A1

    公开(公告)日：2012-08-16

    申请号：US13370413

    申请日：2012-02-10

    申请人： Ryuta WASHIYA ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

    发明人： Ryuta WASHIYA ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

    IPC分类号： B29C59/16

    CPC分类号： G03F7/0002 ,  B29C33/3878 ,  B82Y10/00 ,  B82Y40/00

    摘要： A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.

    摘要翻译： 微结构转印装置的特征在于，该装置包括由用第一波长的光固化的第一光固化树脂组合物制成的压模和发射长于第一波长的第二波长的光的光源。 将微结构转移到提供有第二光固化树脂组合物的印模受体中，该第二光固化树脂组合物可用由光源发出的第二波长的光固化。

    STAMPER FOR TRANSFERRING FINE PATTERN AND METHOD FOR MANUFACTURING THEREOF
    5.
    发明申请
    STAMPER FOR TRANSFERRING FINE PATTERN AND METHOD FOR MANUFACTURING THEREOF 审中-公开
    用于传输精细图案的冲压器及其制造方法

    公开(公告)号：US20100155989A1

    公开(公告)日：2010-06-24

    申请号：US12635730

    申请日：2009-12-11

    申请人： Satoshi ISHII ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

    发明人： Satoshi ISHII ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

    IPC分类号： B29C59/16 ,  B28B1/10

    CPC分类号： B29C59/022 ,  B29C35/02 ,  B29C35/0888 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.

    摘要翻译： 本发明的目的是提供一种用于转印精细图案的压模和用于制造压模的方法，压模具有精细的结构层，以提高树脂压模的连续转印性能，并允许精确和连续的转印。 为了实现上述目的，本发明提供一种用于转印精细图案的压模，包括：支撑基板上的精细结构层，其中精细结构层是主成分为倍半硅氧烷衍生物的树脂化合物的聚合物， 多个聚合性官能团。

    IMPRINT APPARATUS
    6.
    发明申请
    IMPRINT APPARATUS 有权

    公开(公告)号：US20100098799A1

    公开(公告)日：2010-04-22

    申请号：US12582732

    申请日：2009-10-21

    申请人： Miho Sasaki ,  Masahiko Ogino ,  Akihiro Miyauchi ,  Noritake Shizawa ,  Kyoichi Mori

    发明人： Miho Sasaki ,  Masahiko Ogino ,  Akihiro Miyauchi ,  Noritake Shizawa ,  Kyoichi Mori

    IPC分类号： B29C59/16 ,  B29C59/02

    CPC分类号： B29C59/022 ,  B29C2035/0827 ,  B29C2059/023

    摘要： An imprint apparatus has a head unit with a fine structure. The head unit includes a fine imprint pattern layer including fine concavities and convexities, a resin layer on a face of the fine imprint pattern layer opposite to a face where the concavities and convexities are formed, a first pressurizing base member on a face of the resin layer opposite to a face contacting the fine imprint pattern layer, and a second pressurizing base member on a face of the first pressurizing base member opposite to a face contacting the resin layer. The resin layer has a modulus of elasticity smaller than that of the fine imprint pattern layer, and the first pressurizing base member has a modulus of elasticity smaller than that of the resin layer. A light source or a heat source may be further provided. The head unit may be light permeable. A replacement layer may be further provided for replacement.

    摘要翻译： 压印装置具有精细结构的头单元。 头单元包括精细的凹凸图案，在与形成凹凸面的面相反的微细图案层的表面上的树脂层，树脂的表面上的第一加压基材 在与第一加压基体的与接触树脂层的面相反的表面上的第二加压基底部件与接触精细压印图案层的面相反。 树脂层的弹性模量小于精细印刷图案层的弹性模量，第一加压基材的弹性模量小于树脂层的弹性模量。 可以进一步提供光源或热源。 头单元可以是透光的。 还可以提供更换层以进行更换。

    Micropattern transfer method and micropattern transfer device
    8.
    发明授权
    Micropattern transfer method and micropattern transfer device 失效
    微图案转印方式和微图案转印装置

    公开(公告)号：US08562896B2

    公开(公告)日：2013-10-22

    申请号：US12765145

    申请日：2010-04-22

    申请人： Satoshi Ishii ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

    发明人： Satoshi Ishii ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

    IPC分类号： B82Y40/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.

    摘要翻译： 本发明的目的是提供一种微图案转印方法和一种微图案转印装置，其中少量的树脂施加于基底，并且在所获得的图案形成层上防止出现不均匀的厚度。 为了实现上述目的，本发明提供一种微图案转印方法，其中通过将具有微图案的压模压入到施加到基板上的树脂上而将微图案转印到树脂上，包括以下步骤：将树脂施加到 为了获得多个树脂岛，使得每个树脂岛的中心部分形成平面薄膜，并且树脂岛的周边部分比中心部分上升得更高。

    PHOTOPOLYMERIZABLE RESIN COMPOSITION FOR TRANSFERRING MICROSTRUCTURE
    10.
    发明申请
    PHOTOPOLYMERIZABLE RESIN COMPOSITION FOR TRANSFERRING MICROSTRUCTURE 审中-公开
    用于转移微结构的光聚合树脂组合物

    公开(公告)号：US20120029110A1

    公开(公告)日：2012-02-02

    申请号：US13193658

    申请日：2011-07-29

    申请人： Ryuta WASHIYA ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

    发明人： Ryuta WASHIYA ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

    IPC分类号： C08F220/10

    CPC分类号： G11B5/855 ,  C08F2/50 ,  C08F290/064 ,  C08F290/067 ,  C08F220/10 ,  C08F222/10

    摘要： A photopolymerizable resin composition for transferring a microstructure, which allows a thinner and uniform thin film to be formed, a transfer accuracy of extremely smaller microfine pattern to be excellent, and a curing time of the thin film to be shortened, is provided. The photopolymerizable resin composition for transferring a microstructure comprises the following component (A), component (B), component (C), component (D) and component (E) at the rate described below: (A) a 6 to 15-functional acrylate; in 0.5 to 10 mass % (B) an acrylate with a weight-average molecular weight (Mw) of 1000 to 10000; in 0.5 to 10 mass % (C) an acrylate having a benzene ring; in 0.5 to 10 mass % (D) a reactive diluent; in 80 to 98 mass % (E) a photopolymerization initiator; in 0.1 to 5 mass %.

    摘要翻译： 提供了用于转印微结构的可光聚合树脂组合物，其允许形成更薄且均匀的薄膜，极小的微细图案的转印精度优异，并且缩短薄膜的固化时间。 用于转移微结构的光聚合性树脂组合物以下述速度包含以下组分（A），组分（B），组分（C），组分（D）和组分（E）：（A）6至15官能 丙烯酸酯; 0.5〜10质量％（B）重均分子量（Mw）为1000〜10000的丙烯酸酯; 为0.5〜10质量％（C）具有苯环的丙烯酸酯; 为0.5〜10质量％（D）反应性稀释剂; 80〜98质量％（E）光聚合引发剂; 为0.1〜5质量％。