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公开(公告)号：US20130068324A1
公开(公告)日：2013-03-21
申请号：US13695844
申请日：2011-03-16
IPC分类号： F17D1/00
CPC分类号： B05D1/02 , B01D29/56 , B01D35/02 , B05C9/06 , B05C11/10 , F17D1/00 , H01L21/67017 , H01L21/6715 , H01L21/67173 , H01L21/67178 , Y10T137/794
摘要： A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.
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2.发明授权Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus 有权化学供应系统，包括其的基底处理装置以及包含相同装置的涂层和显影系统公开(公告)号：US09086190B2
公开(公告)日：2015-07-21
申请号：US13695844
申请日：2011-03-16
CPC分类号： B05D1/02 , B01D29/56 , B01D35/02 , B05C9/06 , B05C11/10 , F17D1/00 , H01L21/67017 , H01L21/6715 , H01L21/67173 , H01L21/67178 , Y10T137/794
摘要： A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.
摘要翻译： 化学品供应系统包括：第一容器和用于储存化学溶液的第二容器; 第一泵，位于连接第一和第二容器的第一管上，用于将存储在第一容器中的溶液引导到第二容器; 以及位于第一管道中的第一过滤器，用于将从第一容器流过第一管道的溶液过滤到第二容器。 该系统还包括：用于连接第一容器和第二容器的第二管; 以及位于第二管上的用于将存储在第二容器中的溶液引导到第一容器的第二泵。
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3.发明授权Process facility having at least two physical units each having a reduced density of contaminating particles with respect to the surroundings 有权具有至少两个物理单元的处理设备各自相对于周围环境具有降低的污染颗粒密度公开(公告)号：US06797029B2
公开(公告)日：2004-09-28
申请号：US10330444
申请日：2002-12-27
申请人： Kay Lederer , Steffen Hornig
发明人： Kay Lederer , Steffen Hornig
IPC分类号： B01D4600
CPC分类号： H01L21/67017 , Y10S55/18 , Y10S55/29 , Y10S55/46
摘要： In a process facility for producing semiconductor wafers, a third physical unit is configured between two physical units that produce mini environments. The third physical unit has a laminar flow at right angles to the laminar flows of the two physical units and is operated with a slightly higher flow velocity. According to the Bernoulli equation, the static pressure in the third physical unit is therefore lower than in the surrounding two physical units. Advantageously, therefore, no contamination from the more highly loaded one of the two physical units passes over into the lesser loaded one of the two physical units.
摘要翻译： 在用于制造半导体晶片的处理设备中，第三物理单元被配置在产生迷你环境的两个物理单元之间。 第三物理单元具有与两个物理单元的层流成直角的层流，并且以略高的流速操作。 根据伯努利方程，第三物理单元中的静压力因此低于周围的两个物理单位。 因此，有利的是，来自两个物理单元中较高负载的物体的污染物不会传递到两个物理单元中的较小负载的物理单元中。
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