POSITIONING APPARATUS
    1.
    发明申请
    POSITIONING APPARATUS 有权
    定位装置

    公开(公告)号:US20110248578A1

    公开(公告)日:2011-10-13

    申请号:US13166573

    申请日:2011-06-22

    IPC分类号: H02K41/02

    摘要: A positioning apparatus includes a moving member, an actuator, and a controller. The moving member can move in at least a first direction. The actuator is provided along the first direction. The controller controls a current applied to the actuator in order to support the weight of the moving member. The bending rigidity of the moving member in the first direction is greater than the bending rigidity of the moving member in a second direction perpendicular to the first direction.

    摘要翻译: 定位装置包括移动构件,致动器和控制器。 移动构件可以在至少第一方向上移动。 致动器沿第一方向设置。 控制器控制施加到致动器的电流,以便支撑移动构件的重量。 移动构件在第一方向上的弯曲刚度大于垂直于第一方向的第二方向上的移动构件的弯曲刚度。

    Positioning apparatus
    2.
    发明授权
    Positioning apparatus 有权
    定位装置

    公开(公告)号:US08786831B2

    公开(公告)日:2014-07-22

    申请号:US13166573

    申请日:2011-06-22

    IPC分类号: G03B27/58 H02K41/02 G03F7/20

    摘要: A positioning apparatus includes a moving member, an actuator, and a controller. The moving member can move in at least a first direction. The actuator is provided along the first direction. The controller controls a current applied to the actuator in order to support the weight of the moving member. The bending rigidity of the moving member in the first direction is greater than the bending rigidity of the moving member in a second direction perpendicular to the first direction.

    摘要翻译: 定位装置包括移动构件,致动器和控制器。 移动构件可以在至少第一方向上移动。 致动器沿第一方向设置。 控制器控制施加到致动器的电流,以便支撑移动构件的重量。 移动构件在第一方向上的弯曲刚度大于垂直于第一方向的第二方向上的移动构件的弯曲刚度。

    Positioning apparatus
    3.
    发明授权
    Positioning apparatus 有权
    定位装置

    公开(公告)号:US08031328B2

    公开(公告)日:2011-10-04

    申请号:US11339896

    申请日:2006-01-26

    IPC分类号: G03B27/58 H02K41/02

    摘要: A positioning apparatus includes a moving member, an actuator, and a controller. The moving member can move in at least a first direction. The actuator is provided along the first direction. The controller controls a current applied to the actuator in order to support the weight of the moving member. The bending rigidity of the moving member in the first direction is greater than the bending rigidity of the moving member in a second direction perpendicular to the first direction.

    摘要翻译: 定位装置包括移动构件,致动器和控制器。 移动构件可以在至少第一方向上移动。 致动器沿第一方向设置。 控制器控制施加到致动器的电流,以便支撑移动构件的重量。 移动构件在第一方向上的弯曲刚度大于垂直于第一方向的第二方向上的移动构件的弯曲刚度。

    Positioning apparatus
    4.
    发明申请
    Positioning apparatus 有权
    定位装置

    公开(公告)号:US20060175910A1

    公开(公告)日:2006-08-10

    申请号:US11339896

    申请日:2006-01-26

    IPC分类号: H02K41/00

    摘要: A positioning apparatus includes a moving member, an actuator, and a controller. The moving member can move in at least a first direction. The actuator is provided along the first direction. The controller controls a current applied to the actuator in order to support the weight of the moving member. The bending rigidity of the moving member in the first direction is greater than the bending rigidity of the moving member in a second direction perpendicular to the first direction.

    摘要翻译: 定位装置包括移动构件,致动器和控制器。 移动构件可以在至少第一方向上移动。 致动器沿第一方向设置。 控制器控制施加到致动器的电流,以便支撑移动构件的重量。 移动构件在第一方向上的弯曲刚度大于垂直于第一方向的第二方向上的移动构件的弯曲刚度。

    Alignment apparatus, exposure apparatus, and device manufacturing method
    5.
    发明申请
    Alignment apparatus, exposure apparatus, and device manufacturing method 失效
    对准装置,曝光装置和装置的制造方法

    公开(公告)号:US20060175993A1

    公开(公告)日:2006-08-10

    申请号:US11342040

    申请日:2006-01-27

    IPC分类号: H02P7/00

    摘要: An alignment apparatus which moves a object comprises a first structure having a holding member which holds the object, a second structure having a magnet which constitutes a linear motor, the linear motor drives the first and second structure, and a flow passage formed between the holding member and the magnet.

    摘要翻译: 移动物体的对准装置包括具有保持物体的保持构件的第一结构,具有构成线性电动机的磁体的第二结构,线性电动机驱动第一和第二结构,以及形成在保持 会员和磁铁。

    Alignment apparatus, exposure apparatus, and device manufacturing method
    6.
    发明授权
    Alignment apparatus, exposure apparatus, and device manufacturing method 失效
    对准装置,曝光装置和装置的制造方法

    公开(公告)号:US07282874B2

    公开(公告)日:2007-10-16

    申请号:US11342040

    申请日:2006-01-27

    IPC分类号: H02P5/00

    摘要: An alignment apparatus which moves a object comprises a first structure having a holding member which holds the object, a second structure having a magnet which constitutes a linear motor, the linear motor drives the first and second structure, and a flow passage formed between the holding member and the magnet.

    摘要翻译: 移动物体的对准装置包括具有保持物体的保持构件的第一结构,具有构成线性电动机的磁体的第二结构,线性电动机驱动第一和第二结构,以及形成在保持 会员和磁铁。

    Alignment apparatus, exposure apparatus, and device manufacturing method
    7.
    发明授权
    Alignment apparatus, exposure apparatus, and device manufacturing method 失效
    对准装置,曝光装置和装置的制造方法

    公开(公告)号:US07330093B2

    公开(公告)日:2008-02-12

    申请号:US11246185

    申请日:2005-10-11

    IPC分类号: H01F7/08

    摘要: An alignment apparatus moves an X-Y slider together with X and Y beams. Electromagnetic guides (electromagnetic mechanisms) are interposed between the X-Y slider, the X beam, and the Y beam. The electromagnetic guides include alignment and acceleration electromagnets attached to the X-Y slider, and targets attached to the X and Y beams. The alignment electromagnet is feedback controlled, whereas the acceleration electromagnet is feedforward controlled.

    摘要翻译: 对准装置与X和Y光束一起移动X-Y滑块。 电磁导轨(电磁机构)插在X-Y滑块,X光束和Y光束之间。 电磁导轨包括连接到X-Y滑块的对准和加速电磁铁,以及附着到X和Y光束的目标。 对准电磁铁是反馈控制的,而加速电磁铁是前馈控制的。

    Alignment apparatus, exposure apparatus, and device manufacturing method
    8.
    发明申请
    Alignment apparatus, exposure apparatus, and device manufacturing method 失效
    对准装置,曝光装置和装置的制造方法

    公开(公告)号:US20060028310A1

    公开(公告)日:2006-02-09

    申请号:US11246185

    申请日:2005-10-11

    IPC分类号: H01F7/08

    摘要: An alignment apparatus moves an X-Y slider together with X and Y beams. Electromagnetic guides (electromagnetic mechanisms) are interposed between the X-Y slider, the X beam, and the Y beam. The electromagnetic guides include alignment and acceleration electromagnets attached to the X-Y slider, and targets attached to the X and Y beams. The alignment electromagnet is feedback controlled, whereas the acceleration electromagnet is feedforward controlled.

    摘要翻译: 对准装置与X和Y光束一起移动X-Y滑块。 电磁导轨(电磁机构)插在X-Y滑块,X光束和Y光束之间。 电磁导轨包括连接到X-Y滑块的对准和加速电磁铁,以及附着到X和Y光束的目标。 对准电磁铁是反馈控制的,而加速电磁铁是前馈控制的。

    Exposure apparatus with a stage, driving unit,and force applying unit having a separate magnetic shield
    9.
    发明授权
    Exposure apparatus with a stage, driving unit,and force applying unit having a separate magnetic shield 失效
    具有舞台,驱动单元和具有单独磁屏蔽的施力单元的曝光装置

    公开(公告)号:US07932646B2

    公开(公告)日:2011-04-26

    申请号:US11971067

    申请日:2008-01-08

    申请人: Yugo Shibata

    发明人: Yugo Shibata

    IPC分类号: H02K41/00

    摘要: A device includes a stage, a force applying unit configured to apply a magnetically repulsive force to the stage, the force applying unit including a first magnet provided at the stage, and a second magnet provided at an end of a movement stroke of the stage so as to face the first magnet, a driving unit configured to drive the stage within the movement stroke, a magnetic-flux reinforcement unit configured to reinforce magnetic flux of the second magnet, and a magnetic shield configured to shield the magnetic flux of the second magnet.

    摘要翻译: 一种装置,包括:载物台,施加弹性力的力施加单元,所述施力单元包括设置在所述载物台上的第一磁体,所述第二磁体设置在所述载物台的移动行程末端, 为了面对第一磁体,配置成在移动行程内驱动平台的驱动单元,被配置为增强第二磁体的磁通量的磁通增强单元,以及用于屏蔽第二磁体的磁通量的磁屏蔽 。

    Alignment apparatus, exposure apparatus, and device manufacturing method
    10.
    发明授权
    Alignment apparatus, exposure apparatus, and device manufacturing method 失效
    对准装置,曝光装置和装置的制造方法

    公开(公告)号:US07193493B2

    公开(公告)日:2007-03-20

    申请号:US10670241

    申请日:2003-09-26

    IPC分类号: H01F7/08

    摘要: An alignment apparatus moves an X-Y slider together with X and Y beams. Electromagnetic guides (electromagnetic mechanisms) are interposed between the X-Y slider, the X beam, and the Y beam. The electromagnetic guides include alignment and acceleration electromagnets attached to the X-Y slider, and targets attached to the X and Y beams. The alignment electromagnet is feedback-controlled, whereas the acceleration electromagnet is feedforward-controlled.

    摘要翻译: 对准装置与X和Y光束一起移动X-Y滑块。 电磁导轨(电磁机构)插在X-Y滑块,X光束和Y光束之间。 电磁导轨包括连接到X-Y滑块的对准和加速电磁铁,以及附着到X和Y光束的目标。 对准电磁铁是反馈控制的,而加速电磁铁是前馈控制的。