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公开(公告)号:US20170198399A1
公开(公告)日:2017-07-13
申请号:US15404382
申请日:2017-01-12
发明人: Zhenyu Zhu , Jiankun Zhou , Min Zheng Haeberle , Zhongxi Huang
CPC分类号: C23C18/168 , C23C18/1675 , C23C18/1676 , C23C18/1683 , C23C18/38 , G01N27/026 , G01N27/028
摘要: A method and apparatus for quantifying an activity of a chemical plating solution in a chemical plating system is disclosed. The method comprises performing an electrochemical impedance spectrum (EIS) measurement on one or more chemical plating solutions in the chemical plating system, processing data for each EIS measurement result to obtain a corresponding charge transfer resistance value, obtaining a correspondence between the activity and the charge transfer resistance value in each chemical plating solution, and quantifying the activity of each chemical plating solution in the chemical plating system using the correspondence to the charge transfer resistance value.