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公开(公告)号:US20180224817A1
公开(公告)日:2018-08-09
申请号:US15427279
申请日:2017-02-08
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Lian-Hua Shih , Chia-Chi Chang , Li-Ting Lin , Ching-Hsing Hsieh , Feng-Chi Chung , Meng-Chih Chang , Ming-Tung Wang , Chiu-Ping Chang , Yung-Yu Yang
IPC: G05B19/048 , G06F17/30 , G05B17/02
CPC classification number: G05B23/024
Abstract: A method of monitoring a processing system for processing a substrate is provided. The method includes the following steps: acquiring data from the processing system for a plurality of parameters, the data including a plurality of data values; grouping the parameters into a plurality of sub-groups, each of the sub-groups including a plurality of correlated parameters; constructing a principle components analysis (PCA) model from the data values for the correlated parameters in a first one of the sub-groups, including normalizing the data values in the first one of the sub-groups with a first weighting factor and a second weighting factor, wherein the first weighting factor is different from the second weighting factor; and determining a statistical quantity using the PCA model.
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公开(公告)号:US10606253B2
公开(公告)日:2020-03-31
申请号:US15427279
申请日:2017-02-08
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Lian-Hua Shih , Chia-Chi Chang , Li-Ting Lin , Ching-Hsing Hsieh , Feng-Chi Chung , Meng-Chih Chang , Ming-Tung Wang , Chiu-Ping Chang , Yung-Yu Yang
IPC: G05B23/02
Abstract: A method of monitoring a processing system for processing a substrate is provided. The method includes the following steps: acquiring data from the processing system for a plurality of parameters, the data including a plurality of data values; grouping the parameters into a plurality of sub-groups, each of the sub-groups including a plurality of correlated parameters; constructing a principle components analysis (PCA) model from the data values for the correlated parameters in a first one of the sub-groups, including normalizing the data values in the first one of the sub-groups with a first weighting factor and a second weighting factor, wherein the first weighting factor is different from the second weighting factor; and determining a statistical quantity using the PCA model.
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公开(公告)号:US20160274570A1
公开(公告)日:2016-09-22
申请号:US14660961
申请日:2015-03-18
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Lian-Hua Shih , Ching-Hsing Hsieh , Feng-Chi Chung , Chia-Chi Chang , Yu-Cheng Lin , Sian-Jhu Tsai , Meng-Chih Chang , Yi-Hui Tseng
IPC: G05B19/4097 , G05B15/02
CPC classification number: G05B19/41875 , G05B2219/32194 , G05B2219/37224 , Y02P90/22
Abstract: A method of virtual metrology is disclosed. Process data and measurement values corresponding to a workpiece are collected. The process data and the measurement values are used to establish a conjecture model. A theoretical model corresponding to the workpiece and the conjecture model is used to establish another conjecture model. The another conjecture model is used to establish a virtual metrology value. The virtual metrology value is used to predict properties of a subsequently manufactured workpiece.
Abstract translation: 公开了一种虚拟测量方法。 收集与工件对应的工艺数据和测量值。 过程数据和测量值用于建立猜想模型。 使用对应于工件和推测模型的理论模型来建立另一个推测模型。 另一个猜想模型用于建立虚拟计量学值。 虚拟计量值用于预测随后制造的工件的性能。
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