公开(公告)号：US09731013B2

公开(公告)日：2017-08-15

申请号：US14666803

申请日：2015-03-24

Applicant: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.

Inventor： Vijay Krishna ,  Karl R. Zawoy ,  Brij M. Moudgil ,  Benjamin L. Koopman ,  Nathanael Ian Stevens ,  Kevin William Powers

IPC: H01L51/00 ,  A61K41/00 ,  A61B18/18 ,  F42C19/08 ,  A61N5/06 ,  A61N5/10 ,  A61N5/02

CPC classification number: A61K41/0052 ,  A61B18/18 ,  A61B18/1815 ,  A61N5/025 ,  A61N5/0601 ,  A61N5/062 ,  A61N5/10 ,  A61N2005/0659 ,  A61N2005/0661 ,  A61N2005/0662 ,  A61N2005/1098 ,  F42C19/08 ,  Y10S977/734 ,  Y10S977/902 ,  Y10S977/915 ,  Y10S977/931

Abstract: An electromagnetic radiation activated device comprises a property changing material and at least one functionalized fullerene that upon irradiation of the functionalized fullerenes with electromagnetic radiation of one or more frequencies a thermally activated chemical or physical transformation occurs in the property changing material. The thermal activated transformation of the property changing material is triggered by the heating or combustion of the functionalized fullerenes upon their irradiation. The device can include a chemical agent that is embedded in the property changing material and is released when the material is heated by the functionalized fullerenes upon irradiation.

公开(公告)号：US20140346875A1

公开(公告)日：2014-11-27

申请号：US14368217

申请日：2012-12-24

Applicant: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION INC.

Inventor： Raul Andres Chinga ,  Karl R. Zawoy ,  Subrata Roy ,  Jenshan Lin

IPC: H02M1/08 ,  H02M7/44 ,  H01J37/32

CPC classification number: H02M1/08 ,  H01J37/32348 ,  H02M7/44 ,  H02M7/53803 ,  H02M2001/0003 ,  H02M2007/4815 ,  H05H1/46 ,  H05H2001/4682 ,  Y02B70/1441 ,  Y10T307/406

Abstract: Embodiments of the subject invention are drawn to power supply units and systems for supplying power to loads. Specific embodiments relate to systems incorporating the loads. The power supply units and systems can include a feedback mechanism for monitoring the system and maintaining a parameter of interest at or near a desired value (e.g., for maintaining the frequency of operation at or near resonance). The feedback mechanism is configured such that, if the at least one parameter indicates that the frequency of operation is away from a resonant frequency of the power amplifier, the feedback mechanism adjusts the frequency of operation closer to the resonant frequency of the power amplifier. The at least one load can have a variable impedance, though embodiments are not limited thereto.

Abstract translation: 本发明的实施例涉及用于向负载供电的供电单元和系统。 具体实施例涉及包含负载的系统。 电源单元和系统可以包括用于监视系统并将感兴趣的参数维持在或接近期望值的反馈机制（例如，用于维持在或接近共振的操作频率）。 反馈机构被配置为使得如果至少一个参数指示操作频率远离功率放大器的谐振频率，则反馈机构调节操作频率更接近功率放大器的谐振频率。 至少一个负载可以具有可变阻抗，尽管实施例不限于此。

公开(公告)号：US09774239B2

公开(公告)日：2017-09-26

申请号：US14368217

申请日：2012-12-24

Applicant: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.

Inventor： Raul Andres Chinga ,  Karl R. Zawoy ,  Subrata Roy ,  Jenshan Lin

IPC: H02J1/04 ,  H02M1/08 ,  H05H1/46 ,  H02M7/538 ,  H01J37/32 ,  H02M7/44 ,  H02M7/48 ,  H02M1/00

CPC classification number: H02M1/08 ,  H01J37/32348 ,  H02M7/44 ,  H02M7/53803 ,  H02M2001/0003 ,  H02M2007/4815 ,  H05H1/46 ,  H05H2001/4682 ,  Y02B70/1441 ,  Y10T307/406

Abstract: Embodiments of the subject invention are drawn to power supply units and systems for supplying power to loads. Specific embodiments relate to systems incorporating the loads. The power supply units and systems can include a feedback mechanism for monitoring the system and maintaining a parameter of interest at or near a desired value (e.g., for maintaining the frequency of operation at or near resonance). The feedback mechanism is configured such that, if the at least one parameter indicates that the frequency of operation is away from a resonant frequency of the power amplifier, the feedback mechanism adjusts the frequency of operation closer to the resonant frequency of the power amplifier. The at least one load can have a variable impedance, though embodiments are not limited thereto.