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公开(公告)号：US20160154309A1
公开(公告)日：2016-06-02
申请号：US14953068
申请日：2015-11-27
发明人： Daisuke YAJIMA , Kazuyuki TSURUOKA
CPC分类号： G02B5/3025 , G02B1/118 , G02B1/12 , G03F7/201 , G03F7/70408 , G03F7/70466
摘要： A method manufactures a structure having a first fine pattern on a substrate. The method includes forming a resist layer on the substrate, dividing a laser beam into two branch beams, and causing the branch beams to cross each other at an interference angle thereby generating a first interference beam. The method also includes exposing the resist layer with the first interference beam. The method also includes producing a second interference beam from the branch beams such that the second interference beam crosses the first interference beam at a predetermined angle, and exposing the resist layer with the second interference beam. The method also includes removing those areas of the resist layer which are irradiated with the first and second interference beams, thereby forming a second fine pattern in the resist layer. The method also includes etching the substrate with the second fine pattern of the resist layer.
摘要翻译： 一种方法在衬底上制造具有第一精细图案的结构。 该方法包括在衬底上形成抗蚀剂层，将激光束分成两个分支光束，并使分支光束以干涉角相互交叉，从而产生第一干涉光束。 该方法还包括用第一干涉光束曝光抗蚀剂层。 该方法还包括从分支光束产生第二干涉光束，使得第二干涉光束以预定角度穿过第一干涉光束，并且用第二干涉光束曝光抗蚀剂层。 该方法还包括去除被第一和第二干涉光束照射的那些抗蚀剂层的区域，从而在抗蚀剂层中形成第二精细图案。 该方法还包括用抗蚀剂层的第二精细图案蚀刻衬底。
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公开(公告)号：US20170017027A1
公开(公告)日：2017-01-19
申请号：US15124616
申请日：2015-03-10
发明人： Kazuyuki TSURUOKA , Ryuhei ARAKI , Yohei NAWAKI
IPC分类号： G02B5/30 , G02F1/1337
CPC分类号： G02B5/3058 , G02F1/133528 , G02F1/133788 , G02F2001/133548
摘要： A stripe-shaped grid provided on a transparent substrate is made from dielectrics or semiconductors. For each linear segment of the grid, a gap (t) on one side of the linear segment, and an opposite gap (T) on an opposite side of the linear segment materially satisfy the relation t
摘要翻译： 设置在透明基板上的条形网格由电介质或半导体制成。 对于网格的每个线性段，线性段的一侧上的间隙（t）和线性段的相对侧上的相对间隙（T）以周期性方式物理地满足关系t
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公开(公告)号：US20150160391A1
公开(公告)日：2015-06-11
申请号：US14556474
申请日：2014-12-01
发明人： Kazuyuki TSURUOKA , Ryuhei ARAKI
CPC分类号： G02B5/3075 , G02B5/3058 , G02B27/0006
摘要： A grid polarizing element has a structure that can prevent deteriorations due to an oxidization gas. The grid polarizing element is preferably used to polarize light in a ultraviolet light region. The grid polarizing element includes a transparent substrate and a grid layer disposed on the transparent substrate. The grid layer has a plurality of linear portions, and is shaped like a stripe. The grid layer is covered with a gas blocking layer to block the oxidization gas generated by the ultraviolet light such as ozone and active oxygen species. The gas blocking layer is transparent at a wavelength of the light to be polarized.
摘要翻译： 栅极偏振元件具有能够防止氧化气体引起的劣化的结构。 栅极偏振元件优选用于使紫外光区域的光偏振。 栅极偏振元件包括透明基板和布置在透明基板上的栅格层。 网格层具有多个直线部分，并且形状为条状。 栅格层被气体阻挡层覆盖以阻挡由诸如臭氧和活性氧的紫外线产生的氧化气体。 气体阻挡层在要偏振的光的波长处是透明的。
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公开(公告)号：US20210263206A1
公开(公告)日：2021-08-26
申请号：US17252252
申请日：2019-05-31
发明人： Yohei NAWAKI , Kazuyuki TSURUOKA
IPC分类号： G02B5/30 , G02F1/1337
摘要： The present invention is to provide an appropriate configuration of a VUV polarizer that can be used for such a process as photo-alignment. The VUV polarizer can polarize VUV light not more than 200 nm in wavelength, and has a substrate transparent to the VUV light and a grid on the substrate. The grid is formed of a lot of linear parts in parallel and structured with no filler between the linear parts. A material of each linear part is an oxide of a Group 3 element or Group 4 element, and makes PE not less than 0.2 under an optical constant combination making PE maximum in the VUV range, where PE=T2×log10(ER), T is the transmittance of the grid, and ER is the extinction ratio of the grid. A workpiece is subjected to a photo-alignment processing by irradiation of VUV polarized light emitting from the VUV polarizer.
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公开(公告)号：US20200218148A1
公开(公告)日：2020-07-09
申请号：US16737669
申请日：2020-01-08
发明人： Yohei NAWAKI , Kazuyuki TSURUOKA
摘要： The present invention is to solve the problem of residues in nanoimprint lithography without losing the merits thereof, i.e., low cost and high productivity, and provides a metal film formation technique advantageous in pattern accuracy and product reliability over time. A metal film formation method according to the present invention comprises a first step where a nanoimprint lithography material is deposited on an insulating substrate to form an underlayer, a second step where the underlayer is pressed with a mold having protrusions to pattern by nanoimprint lithography, a third step where residues of the underlayer at regions pressed with the protrusions of the mold are evaporated by heating to be removed, and forming a metal film at least on the patterned underlayer. A nanoimprint lithography material according to the present invention contains a catalyst for a metal plating.
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公开(公告)号：US20170242171A1
公开(公告)日：2017-08-24
申请号：US15514726
申请日：2015-09-29
发明人： Kazuyuki TSURUOKA
IPC分类号： G02B5/30 , G02F1/1337 , G02F1/13
CPC分类号： G02B5/3058 , G02B5/3075 , G02F1/1303 , G02F1/133788 , G02F2001/133548 , G03F7/70566
摘要： An absorptive grid polarization element includes a transparent substrate, and a stripe-like grid provided on the transparent substrate. Each of a plurality of linear parts which form the grid absorbs more s polarization light than p polarization light, and thus achieves a polarizing action. The transparent substrate is made of quartz glass. Each of the linear parts includes a second layer formed on the transparent substrate, and a first layer formed on the second layer. The first layers are formed from amorphous titanium oxide. The second layers are formed from amorphous silicon.
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7.发明申请公开(公告)号：US20160153624A1
公开(公告)日：2016-06-02
申请号：US14953740
申请日：2015-11-30
发明人： Daisuke YAJIMA , Kazuyuki TSURUOKA
CPC分类号： F21V9/30 , F21K9/64 , F21Y2101/00 , F21Y2115/30 , G02B5/008 , G03F7/0005 , G03F7/201 , G03F7/2022 , G03F7/70408
摘要： A method manufactures a light emitting element of a fluorescent light source. The method includes forming a photosensitive material layer on a fluorescent substrate, and dividing a coherent beam into branch beams. The method includes causing the branch beams to cross each other thereby generating a first interference beam, and applying an exposure process to the photosensitive material layer with the first interference beam. The method includes producing a second interference beam, and applying the exposure process to the photosensitive material with the second interference beam. The method includes removing those areas of the photosensitive material layer which are irradiated with the first and second interference beams, thereby forming a fine pattern in the photosensitive material layer. The method includes applying an etching process to the fluorescent substrate with the fine pattern of the photosensitive material layer, thereby creating a photonic structure on the fluorescent substrate.
摘要翻译： 一种制造荧光光源的发光元件的方法。 该方法包括在荧光基板上形成感光材料层，并将相干光束分成分支光束。 该方法包括使分支光束彼此交叉从而产生第一干涉光束，并且利用第一干涉光束对感光材料层施加曝光处理。 该方法包括产生第二干涉光束，以及用第二干涉光束将感光材料施加到曝光处理。 该方法包括去除用第一和第二干涉光束照射的感光材料层的那些区域，从而在感光材料层中形成精细图案。 该方法包括用感光材料层的精细图案向荧光基板施加蚀刻工艺，从而在荧光基板上产生光子结构。
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8.发明申请公开(公告)号：US20150185386A1
公开(公告)日：2015-07-02
申请号：US14578876
申请日：2014-12-22
发明人： Kazuyuki TSURUOKA
CPC分类号： G02B5/3058 , G02B5/3075
摘要： A non-reflection type grid polarizing element can stably provide a desired polarizing effect even when the grid polarizing element is used under conditions such as in an oxidizing environment (e.g., when the polarizing element is used to polarize the ultraviolet light). The grid polarizing element is easy to fabricate. The grid polarizing element selectively transmits particular polarized light among incident light through the polarizing element to polarize the incident light. The grid polarizing element includes a transparent substrate and a grid disposed on the transparent substrate. The grid has a plurality of linear portions arranged like a stripe. Each of the linear portions has a dominant layer made from titanium nitride or titanium oxynitride. The linear portions contain no simple metal layers.
摘要翻译： 即使在氧化环境（例如，当偏振元件用于偏振紫外光的情况下）的条件下使用栅极偏振元件时，非反射型栅极偏振元件也可以稳定地提供期望的偏振效果。 栅极偏振元件容易制造。 栅极偏振元件通过偏振元件选择性地透射入射光中的特定偏振光，以使入射光偏振。 栅极偏振元件包括透明基板和布置在透明基板上的格栅。 格栅具有多条排列成条状的直线部分。 每个直线部分具有由氮化钛或氮氧化钛制成的主导层。 线状部分不含简单的金属层。
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