公开(公告)号：US08120763B2

公开(公告)日：2012-02-21

申请号：US12489639

申请日：2009-06-23

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00 ,  G01B9/02 ,  G03B27/42

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US20090257049A1

公开(公告)日：2009-10-15

申请号：US12489639

申请日：2009-06-23

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00 ,  G03B27/80

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US20120113429A1

公开(公告)日：2012-05-10

申请号：US13351710

申请日：2012-01-17

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/02

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US20090021726A1

公开(公告)日：2009-01-22

申请号：US12147034

申请日：2008-06-26

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

公开(公告)号：US20050007602A1

公开(公告)日：2005-01-13

申请号：US10816896

申请日：2004-04-05

申请人： Helmut Haidner ,  Wolfgang Emer ,  Rainer Hoch ,  Ulrich Wegmann ,  Martin Schriever ,  Markus Goeppert

发明人： Helmut Haidner ,  Wolfgang Emer ,  Rainer Hoch ,  Ulrich Wegmann ,  Martin Schriever ,  Markus Goeppert

IPC分类号： G01B9/02 ,  G01J9/04

CPC分类号： G03F7/706 ,  G01J9/04 ,  G01M11/0264 ,  G01M11/0271

摘要： Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.

摘要翻译： 用于通过相移干涉测量法对光学成像系统进行波前测量的装置和方法，具有要布置在物体侧的掩模结构（6a）和/或要布置在像侧的光栅结构（7a） 。 物体侧掩模结构包括一个或多个一维掩模结构图案，并且图像侧光栅结构包括一个或多个二维光栅结构图案。 或者，相反地，掩模结构包括一个或多个二维图案，并且光栅结构包括一个或多个一维图案。 附加地或替代地，由掩模结构和检测器元件的横向相对移动引起的瞳孔位置偏移可以通过使用相关联的相移特性反向计算分别由检测器元件记录的干涉图来考虑， 从记录的干涉图中获得的横向运动方向的波前衍生的计算校正。 该方法和/或装置可以通过例如用于在使用剪切或点干涉测量的微光刻曝光机的高分辨率投影物镜的情况下确定像差。

公开(公告)号：US07336371B1

公开(公告)日：2008-02-26

申请号：US10766014

申请日：2004-01-29

申请人： Helmut Haidner ,  Markus Goeppert ,  Martin Schriever ,  Ulrich Wegmann

发明人： Helmut Haidner ,  Markus Goeppert ,  Martin Schriever ,  Ulrich Wegmann

IPC分类号： G01B9/02

CPC分类号： G01M11/0271 ,  G03F7/706

摘要： A device and a method for wavefront measurement of an optical system (7), in particular by an interferometric measurement technique. A dynamic range correction element (12, 12a) is arranged in the beam path upstream of the detector arrangement (11) and is designed such that the variation in the spatially dependent characteristic of a phase of the wavefront forming the interference pattern is kept below a prescribed limit value throughout a detection area. In addition or as an alternative, a set of several diffraction structures of different period length can be used with a shearing interferometry technique and/or a set of several pairs of a reference pinhole and a signal passage opening with different hole spacings can be used with a point diffraction interferometry technique for different sub-areas of the detection area. A remaining distortion error can be taken into account by determining a corresponding distortion transformation and applying the inverse distortion transformation.

摘要翻译： 一种用于光学系统（7）的波前测量的装置和方法，特别是通过干涉测量技术。 动态范围校正元件（12,12a）被布置在检测器装置（11）的上游的光束路径中，并且被设计成使得形成干涉图案的波阵面的相位的空间相关特性的变化保持在 在整个检测区域的规定的极限值。 另外或作为替代，可以使用剪切干涉测量技术的一组不同周期长度的几种衍射结构，和/或一组几对参考针孔和具有不同孔间距的信号通道开口可以与 用于检测区域的不同子区域的点衍射干涉测量技术。 可以通过确定相应的失真变换并应用逆失真变换来考虑剩余的失真误差。

公开(公告)号：US07417745B2

公开(公告)日：2008-08-26

申请号：US10816896

申请日：2004-04-05

申请人： Helmut Haidner ,  Wolfgang Emer ,  Rainer Hoch ,  Ulrich Wegmann ,  Martin Schriever ,  Markus Goeppert

发明人： Helmut Haidner ,  Wolfgang Emer ,  Rainer Hoch ,  Ulrich Wegmann ,  Martin Schriever ,  Markus Goeppert

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01J9/04 ,  G01M11/0264 ,  G01M11/0271

摘要： Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.

摘要翻译： 用于通过相移干涉测量法对具有要布置在物体侧的掩模结构（6a）的光学成像系统的波前测量的装置和方法和/或布置在物体侧上的光栅结构（7a） 形象一面 物体侧掩模结构包括一个或多个一维掩模结构图案，并且图像侧光栅结构包括一个或多个二维光栅结构图案。 或者，相反地，掩模结构包括一个或多个二维图案，并且光栅结构包括一个或多个一维图案。 附加地或替代地，由掩模结构和检测器元件的横向相对移动引起的瞳孔位置偏移可以通过使用相关联的相移特性反向计算分别由检测器元件记录的干涉图来考虑， 从记录的干涉图中获得的横向运动方向的波前衍生的计算校正。 该方法和/或装置可以通过例如用于在使用剪切或点干涉测量的微光刻曝光机的高分辨率投影物镜的情况下确定像差。

公开(公告)号：US20080204729A1

公开(公告)日：2008-08-28

申请号：US11942507

申请日：2007-11-19

申请人： Matthias Manger ,  Markus Goeppert ,  Gordon Doering ,  Alfred Gatzweiler

发明人： Matthias Manger ,  Markus Goeppert ,  Gordon Doering ,  Alfred Gatzweiler

IPC分类号： G01B9/00

CPC分类号： G01M11/0257 ,  G03F7/70133 ,  G03F7/706

摘要： A method and an apparatus for determining at least one optical property of an imaging optical system which is designed to image an object disposed in an object plane of the optical system into an assigned image plane. The method includes disposing at least one test structure in the object plane of the optical system, disposing an image recording device in at least two different positions relative to the image plane of the optical system, in each of the at least two relative positions the image recording device being offset in relation to the image plane to such an extent that an image of the pupil of the optical system is produced respectively on the image recording device by the optical system by means of the test structure, and recording an image produced on the image recording device by the optical system by means of the test structure in each of the at least two relative positions by means of the image recording device.

摘要翻译： 一种用于确定成像光学系统的至少一个光学特性的方法和装置，其被设计成将设置在光学系统的物体平面中的物体成像为分配的图像平面。 该方法包括在光学系统的物平面中设置至少一个测试结构，在至少两个相对位置中的每一个中将图像记录装置相对于光学系统的图像平面设置在至少两个不同的位置，图像 记录装置相对于图像平面偏移到通过光学系统通过测试结构分别在图像记录装置上产生光学系统的光瞳的图像的程度，并且记录在 图像记录装置通过借助于图像记录装置的至少两个相对位置中的每一个中的测试结构由光学系统进行。

公开(公告)号：US07760345B2

公开(公告)日：2010-07-20

申请号：US11942507

申请日：2007-11-19

申请人： Matthias Manger ,  Markus Goeppert ,  Gordon Doering ,  Alfred Gatzweiler

发明人： Matthias Manger ,  Markus Goeppert ,  Gordon Doering ,  Alfred Gatzweiler

IPC分类号： G01B9/00

CPC分类号： G01M11/0257 ,  G03F7/70133 ,  G03F7/706

摘要： A method and an apparatus for determining at least one optical property of an imaging optical system which is designed to image an object disposed in an object plane of the optical system into an assigned image plane. The method includes disposing at least one test structure in the object plane of the optical system, disposing an image recording device in at least two different positions relative to the image plane of the optical system, in each of the at least two relative positions the image recording device being offset in relation to the image plane to such an extent that an image of the pupil of the optical system is produced respectively on the image recording device by the optical system by means of the test structure, and recording an image produced on the image recording device by the optical system by means of the test structure in each of the at least two relative positions by means of the image recording device.

摘要翻译： 一种用于确定成像光学系统的至少一个光学特性的方法和装置，其被设计成将设置在光学系统的物体平面中的物体成像为分配的图像平面。 该方法包括在光学系统的物平面中设置至少一个测试结构，在至少两个相对位置中的每一个中将图像记录装置相对于光学系统的图像平面设置在至少两个不同的位置，图像 记录装置相对于图像平面偏移到通过光学系统通过测试结构分别在图像记录装置上产生光学系统的光瞳的图像的程度，并且记录在 图像记录装置通过借助于图像记录装置的至少两个相对位置中的每一个中的测试结构由光学系统进行。