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    Optical system of a microlithographic projection exposure apparatus
    1.
    发明授权
    Optical system of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的光学系统

    公开(公告)号：US08212991B2

    公开(公告)日：2012-07-03

    申请号：US12628294

    申请日：2009-12-01

    申请人： Aurelian Dodoc ,  Albrecht Ehrmann ,  Sascha Bleidistel

    发明人： Aurelian Dodoc ,  Albrecht Ehrmann ,  Sascha Bleidistel

    IPC分类号： G03B27/42 ,  G03B27/68 ,  G03B27/58

    CPC分类号： G02B3/12 ,  G03F7/70341

    摘要： An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which bounds the cavity at the top during operation of the projection exposure apparatus. This makes it possible to fill the module outside the optical system. The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.

    摘要翻译： 微光刻投影曝光装置的光学系统包含可以安装在光学系统中并作为一个单元从其中移除的模块。 该模块包含一个可完全充满液体并密封的空腔，以及在投影曝光设备的操作期间界定顶部空腔的凹曲面的光学表面。 这使得可以将模块填充到光学系统外部。 模块可以在那里倾斜，从而不会形成阻止完全填充的气泡，可以形成在凹曲面的光学表面之下。

    Device and method for the optical measurement of an optical system by using an immersion fluid
    2.
    发明授权
    Device and method for the optical measurement of an optical system by using an immersion fluid 有权
    通过使用浸液进行光学系统的光学测量的装置和方法

    公开(公告)号：US07408652B2

    公开(公告)日：2008-08-05

    申请号：US11080525

    申请日：2005-03-16

    申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

    发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

    IPC分类号： G01B9/02 ,  G02B27/40

    CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

    摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

    摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

    Optical System of a Microlithographic Projection Exposure Apparatus
    3.
    发明申请
    Optical System of a Microlithographic Projection Exposure Apparatus 审中-公开
    微光刻投影曝光装置的光学系统

    公开(公告)号：US20080170217A1

    公开(公告)日：2008-07-17

    申请号：US11911899

    申请日：2006-05-13

    申请人： Aurelian Dodoc ,  Albrecht Ehrmann ,  Sascha Bleidistel

    发明人： Aurelian Dodoc ,  Albrecht Ehrmann ,  Sascha Bleidistel

    IPC分类号： G03B27/54

    CPC分类号： G02B3/12 ,  G03F7/70341

    摘要： An optical system of a microlithographic projection exposure apparatus (10) contains a module (50; 150), which can be fitted in the optical system and removed from it as a unit. The module contains a cavity (42; 142) which can be completely filled with a liquid (34; 134) and hermetically sealed, and a concavely curved optical surface (S) which bounds the cavity at the top during operation of the projection exposure apparatus (10). This makes it possible to fill the module outside the optical system, The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.

    摘要翻译： 微光刻投影曝光装置（10）的光学系统包含可以安装在光学系统中并作为一个单元从其中移除的模块（50; 150）。 该模块包括可完全充满液体（34; 134）并气密密封的空腔（42; 142）和在投影曝光设备的操作期间界定顶部空腔的凹曲面光学表面（S） （10）。 这使得可以将模块填充到光学系统外部。该模块可以在那里倾斜，使得不会在凹曲面光学表面下方形成防止完全填充的气泡。

    Method of producing a perforated mask for particle radiation
    6.
    发明授权
    Method of producing a perforated mask for particle radiation 有权
    制造用于粒子辐射的穿孔掩模的方法

    公开(公告)号：US06773854B2

    公开(公告)日：2004-08-10

    申请号：US10210011

    申请日：2002-07-31

    申请人： Albrecht Ehrmann ,  Ernst Haugeneder ,  Frank-Michael Kamm ,  Alexander Petraschenko ,  Stefan Schunck

    发明人： Albrecht Ehrmann ,  Ernst Haugeneder ,  Frank-Michael Kamm ,  Alexander Petraschenko ,  Stefan Schunck

    IPC分类号： G03F900

    CPC分类号： G03F1/20 ,  H01J2237/0453 ,  H01J2237/3175

    摘要： A method for producing a perforated mask for particle radiation includes calculating values of an elasticity of adjacent cells of a mask with respect to longitudinal and shear stresses in a main plane of the mask on a model of the desired pattern of mask openings. For the respective individual cells, length and direction of all the edge sections of the openings and cross-sectional areas of the openings are determined. Therefrom, statistical parameters are derived, which are used as a variable in preselected empirical functions to determine the elasticity values of the cells analytically. By linking the elasticity values determined with deformation forces to be expected, the vector field of a distortion of the mask to be expected is calculated by FE calculation. For cutting the mask openings into a blank, a pattern is selected that represents the desired pattern with a distortion being the inverse of the previously calculated distortion.

    摘要翻译： 用于制造用于粒子辐射的穿孔掩模的方法包括在掩模开口的所需图案的模型上相对于掩模的主平面中的纵向和剪切应力计算掩模的相邻单元的弹性值。 对于各个单元，确定开口的所有边缘部分和开口的横截面积的长度和方向。 因此，导出统计参数，其被用作预选经验函数中的变量，以分析细胞的弹性值。 通过将通过预期的变形力确定的弹性值相联系，通过FE计算来计算要预期的掩模的失真的矢量场。 为了将掩模开口切割成空白，选择表示期望图案的图案，其中失真是先前计算的失真的倒数。

    System for measuring the image quality of an optical imaging system
    7.
    发明授权
    System for measuring the image quality of an optical imaging system 失效
    用于测量光学成像系统的图像质量的系统

    公开(公告)号：US08488127B2

    公开(公告)日：2013-07-16

    申请号：US12850740

    申请日：2010-08-05

    申请人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

    发明人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

    IPC分类号： G01B11/02

    CPC分类号： G01M11/0257 ,  G01M11/0214 ,  G01M11/0271 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70716 ,  G03F7/70958 ,  Y10T428/31

    摘要： A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy.

    摘要翻译： 一种用于光学成像系统的光学测量的测量系统，其被设置为对成像系统的图像表面中布置在成像系统的物体表面中的图案进行成像，包括物体侧结构载体，其具有物体侧 测量结构，被布置在成像系统的物体侧; 具有图像侧测量结构的图像侧结构载体，被布置在成像系统的图像侧; 物体侧测量结构和图像侧测量结构彼此匹配，使得当物体侧测量结构借助于成像系统成像到图像侧测量结构上时，叠加 图案生产; 以及用于局部求解叠加图案的检测器。 成像系统被设计为用于借助于浸没液体进行成像的浸没系统。 布置在浸没液体区域中的结构载体被分配保护系统，以便增加测量结构对浸入液体引起的降解的阻力。 因此，在浸没条件下的浸渍系统的测量可以在浸没液体对测量精度的不利影响的情况下进行。

    SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM
    9.
    发明申请
    SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM 失效
    用于测量光学成像系统的图像质量的系统

    公开(公告)号：US20100315651A1

    公开(公告)日：2010-12-16

    申请号：US12850740

    申请日：2010-08-05

    申请人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

    发明人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

    IPC分类号： G01B11/02

    CPC分类号： G01M11/0257 ,  G01M11/0214 ,  G01M11/0271 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70716 ,  G03F7/70958 ,  Y10T428/31

    摘要： A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy.

    摘要翻译： 一种用于光学成像系统的光学测量的测量系统，其被设置为对成像系统的图像表面中布置在成像系统的物体表面中的图案进行成像，包括物体侧结构载体，其具有物体侧 测量结构，被布置在成像系统的物体侧; 具有图像侧测量结构的图像侧结构载体，被布置在成像系统的图像侧; 物体侧测量结构和图像侧测量结构彼此匹配，使得当物体侧测量结构借助于成像系统成像到图像侧测量结构上时，叠加 图案生产; 以及用于局部求解叠加图案的检测器。 成像系统被设计为用于借助于浸没液体进行成像的浸没系统。 布置在浸没液体区域中的结构载体被分配保护系统，以便增加测量结构对浸入液体引起的降解的阻力。 因此，在浸没条件下的浸渍系统的测量可以在浸没液体对测量精度的不利影响的情况下进行。