Method of printing smooth micro-scale features
    1.
    发明授权
    Method of printing smooth micro-scale features 有权
    打印平滑微尺度功能的方法

    公开(公告)号:US07524015B2

    公开(公告)日:2009-04-28

    申请号:US11642146

    申请日:2006-12-20

    IPC分类号: B41J29/393

    摘要: A method of jet-printing smooth micro-scale features is presented. The desired feature prior to being printed is masked by various decimation filters and the decimation is performed at various pitches. The subsequently printed image is then scanned and analyzed to determine the roughness of the lines. The optimum decimation pitch is determined by the feature that exhibits the least amount of droplet spreading and has the lowest edge roughness. The optimum decimation pitch may also be calculated from the material properties and the dynamics of fluids.

    摘要翻译: 提出了一种喷墨打印平滑微尺度特征的方法。 在打印之前的期望特征被各种抽取滤波器遮蔽,并且以各种间距进行抽取。 然后扫描并分析随后打印的图像以确定线的粗糙度。 最佳抽取间距由表现出最小量的液滴扩散并具有最低边缘粗糙度的特征决定。 也可以根据流体的材料性质和动力学来计算最佳抽取间距。

    Method of printing smooth micro-scale features
    2.
    发明申请
    Method of printing smooth micro-scale features 有权
    打印平滑微尺度功能的方法

    公开(公告)号:US20080150989A1

    公开(公告)日:2008-06-26

    申请号:US11642146

    申请日:2006-12-20

    IPC分类号: B41J29/38

    摘要: A method of jet-printing smooth micro-scale features is presented. The desired feature prior to being printed is masked by various decimation filters and the decimation is performed at various pitches. The subsequently printed image is then scanned and analyzed to determine the roughness of the lines. The optimum decimation pitch is determined by the feature that exhibits the least amount of droplet spreading and has the lowest edge roughness. The optimum decimation pitch may also be calculated from the material properties and the dynamics of fluids.

    摘要翻译: 提出了一种喷墨打印平滑微尺度特征的方法。 在打印之前的期望特征被各种抽取滤波器遮蔽,并且以各种间距进行抽取。 然后扫描并分析随后打印的图像以确定线的粗糙度。 最佳抽取间距由表现出最小量的液滴扩散并具有最低边缘粗糙度的特征决定。 也可以根据流体的材料性质和动力学来计算最佳抽取间距。

    Method and system for patterning a mask layer
    3.
    发明申请
    Method and system for patterning a mask layer 有权
    图案化掩模层的方法和系统

    公开(公告)号:US20080241712A1

    公开(公告)日:2008-10-02

    申请号:US11731689

    申请日:2007-03-30

    IPC分类号: G03F1/00

    摘要: The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.

    摘要翻译: 目前描述的实施例使用打印过程,例如。 蜡印刷技术,用于对例如印刷电路的掩模层(例如焊接掩模层)进行图案化。 可以维持开发焊接掩模和曝光工艺中的所有其他常规工艺。 根据目前描述的实施例,每个印刷电路将具有匹配均匀和非均匀跳动的独特图案。 在一种形式中,图案由具有特定间隙的蜡单滴组成,以使得该过程对于当前行业实践是透明的。 此外,单滴可以用于大小区域而没有任何显影时间差。 在至少一种形式中,间隙中的蜡图案和焊接掩模在显影期间被去除。

    Method and system for patterning a mask layer
    4.
    发明授权
    Method and system for patterning a mask layer 有权
    图案化掩模层的方法和系统

    公开(公告)号:US08968985B2

    公开(公告)日:2015-03-03

    申请号:US11731689

    申请日:2007-03-30

    IPC分类号: G03F7/20 H05K3/00 H05K3/28

    摘要: The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.

    摘要翻译: 目前描述的实施例使用打印过程,例如。 蜡印刷技术,用于对例如印刷电路的掩模层(例如焊接掩模层)进行图案化。 可以维持开发焊接掩模和曝光工艺中的所有其他常规工艺。 根据目前描述的实施例,每个印刷电路将具有匹配均匀和非均匀跳动的独特图案。 在一种形式中,图案由具有特定间隙的蜡单滴组成,以使得该过程对于当前行业实践是透明的。 此外,单滴可以用于大小区域,而没有任何显影时间差。 在至少一种形式中,间隙中的蜡图案和焊接掩模在显影期间被去除。

    Optical beam position active sensing and control using satellite beams
    7.
    发明授权
    Optical beam position active sensing and control using satellite beams 有权
    使用卫星光束的光束位置主动感测和控制

    公开(公告)号:US07116613B2

    公开(公告)日:2006-10-03

    申请号:US10443184

    申请日:2003-05-22

    IPC分类号: G11B5/09

    摘要: A beam position control system controls a position of a beam directed from a beam source. The beam position control system includes a beam position sensing system that generates one or more satellite beams which are used to determine the position of a main beam. A beam offset computation block determines a relative position of the main beam with respect to a desired main beam position and provides beam offset information to a controller that generates a compensation signal used to adjust the main beam position to the desired main beam position via a beam actuation system.

    摘要翻译: 光束位置控制系统控制从光束源引导的光束的位置。 波束位置控制系统包括波束位置检测系统,其产生用于确定主波束位置的一个或多个卫星波束。 波束偏移计算块确定主波束相对于期望的主波束位置的相对位置,并将波束偏移信息提供给控制器,该控制器产生用于经由波束将主波束位置调整到期望主波束位置的补偿信号 驱动系统。

    Configurable grating based on surface relief pattern for use as a variable optical attenuator
    8.
    发明授权
    Configurable grating based on surface relief pattern for use as a variable optical attenuator 失效
    基于表面浮雕图案的可配置光栅用作可变光衰减器

    公开(公告)号:US06930817B2

    公开(公告)日:2005-08-16

    申请号:US10423752

    申请日:2003-04-25

    摘要: A variable modulator assembly includes an active layer. A deformable layer is in operational contact to a first surface of the active layer, and an electrode configuration consisting of a plurality of electrodes is in operational contact to a second surface of the active layer. A controller is configured to selectively apply a variable signal to the selected electrodes of the electrode configuration. Application of the variable signal causes the deformable layer to reconfigure to an alternated shape having distinct peaks and valleys. The distance between the peaks and valleys being determined by the value of the applied variable signal.In an optical modulating method, a variable modulator assembly is positioned to receive light at the deformable layer from a light source. Activation of an electrode configuration by the controller generates a variable signal, causing electrostatic charges to deform the deformable layer into a pattern corresponding to the activated electrodes.

    摘要翻译: 可变调制器组件包括有源层。 可变形层与有源层的第一表面工作接触,并且由多个电极构成的电极配置与活性层的第二表面操作接触。 控制器被配置为选择性地将可变信号施加到所选择的电极配置的电极。 可变信号的应用使可变形层重新配置成具有不同峰和谷的交替形状。 峰值和谷之间的距离由施加的可变信号的值决定。 在光学调制方法中,可变调制器组件被定位成从光源接收可变形层处的光。 由控制器激活电极配置产生可变信号,导致静电电荷使可变形层变形成对应于活化电极的图案。

    Optical modulator with a traveling surface relief pattern
    9.
    发明授权
    Optical modulator with a traveling surface relief pattern 有权
    具有行进表面浮雕图案的光学调制器

    公开(公告)号:US07054054B1

    公开(公告)日:2006-05-30

    申请号:US11017402

    申请日:2004-12-20

    IPC分类号: G02B26/00

    CPC分类号: G02B26/0825

    摘要: A variable modulator assembly includes a deformable layer adhered to a compliant layer surface, and an n-phase electrode configuration, n>2, adhered to an opposite surface of the compliant layer. A controller is configured to selectively apply a variable signal to the selected electrodes of the electrode configuration. Application of the variable signal causes the deformable layer to reconfigure to an alternated shape having distinct peaks and valleys. The distance between the peaks and valleys being determined by the value of the applied variable signal, wherein the alternated shape travels in a preferred direction. An optical modulating method includes positioning the variable modulator assembly to receive and reflect light from a light source, monitoring the reflected light, and altering the variable signal to maintain a desired output intensity.

    摘要翻译: 可变调制器组件包括粘附到顺应性层表面的可变形层和粘附到柔顺层的相对表面上的n相电极构型n> 2。 控制器被配置为选择性地将可变信号施加到所选择的电极配置的电极。 可变信号的应用使可变形层重新配置成具有不同峰和谷的交替形状。 峰值和谷之间的距离由施加的可变信号的值确定,其中交替形状沿优选方向行进。 光调制方法包括定位可变调制器组件以接收和反射来自光源的光,监测反射光,以及改变可变信号以保持期望的输出强度。

    Ink reservoir containing structure
    10.
    发明授权
    Ink reservoir containing structure 有权
    墨水储存结构

    公开(公告)号:US09061513B2

    公开(公告)日:2015-06-23

    申请号:US13273811

    申请日:2011-10-14

    申请人: Eric J. Shrader

    发明人: Eric J. Shrader

    IPC分类号: B41J2/175 B41J29/02

    CPC分类号: B41J2/17593 B41J29/02

    摘要: Ink reservoir subassemblies for phase change ink can be designed and configured to include at least one structure comprising elements disposed within the ink reservoir. The elements may include fibers and/or beads that occupy a majority of a volume of the reservoir. The elements may provide enhanced thermal conductivity, ink filtering and/or bubble reduction.

    摘要翻译: 用于相变油墨的油墨储存器组件可以被设计和构造成包括至少一个包括设置在油墨储存器内的元件的结构。 元件可以包括占据储存器体积的大部分的纤维和/或珠粒。 这些元件可以提供增强的导热性,油墨过滤和/或气泡减少。