摘要:
A beam position control system controls a position of a beam directed from a beam source. The beam position control system includes a beam position sensing system that generates one or more satellite beams which are used to determine the position of a main beam. A beam offset computation block determines a relative position of the main beam with respect to a desired main beam position and provides beam offset information to a controller that generates a compensation signal used to adjust the main beam position to the desired main beam position via a beam actuation system.
摘要:
A variable modulator assembly includes a deformable layer adhered to a compliant layer surface, and an n-phase electrode configuration, n>2, adhered to an opposite surface of the compliant layer. A controller is configured to selectively apply a variable signal to the selected electrodes of the electrode configuration. Application of the variable signal causes the deformable layer to reconfigure to an alternated shape having distinct peaks and valleys. The distance between the peaks and valleys being determined by the value of the applied variable signal, wherein the alternated shape travels in a preferred direction. An optical modulating method includes positioning the variable modulator assembly to receive and reflect light from a light source, monitoring the reflected light, and altering the variable signal to maintain a desired output intensity.
摘要:
A method of jet-printing smooth micro-scale features is presented. The desired feature prior to being printed is masked by various decimation filters and the decimation is performed at various pitches. The subsequently printed image is then scanned and analyzed to determine the roughness of the lines. The optimum decimation pitch is determined by the feature that exhibits the least amount of droplet spreading and has the lowest edge roughness. The optimum decimation pitch may also be calculated from the material properties and the dynamics of fluids.
摘要:
A method of jet-printing smooth micro-scale features is presented. The desired feature prior to being printed is masked by various decimation filters and the decimation is performed at various pitches. The subsequently printed image is then scanned and analyzed to determine the roughness of the lines. The optimum decimation pitch is determined by the feature that exhibits the least amount of droplet spreading and has the lowest edge roughness. The optimum decimation pitch may also be calculated from the material properties and the dynamics of fluids.
摘要:
The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.
摘要:
A variable modulator assembly includes an active layer. A deformable layer is in operational contact to a first surface of the active layer, and an electrode configuration consisting of a plurality of electrodes is in operational contact to a second surface of the active layer. A controller is configured to selectively apply a variable signal to the selected electrodes of the electrode configuration. Application of the variable signal causes the deformable layer to reconfigure to an alternated shape having distinct peaks and valleys. The distance between the peaks and valleys being determined by the value of the applied variable signal.In an optical modulating method, a variable modulator assembly is positioned to receive light at the deformable layer from a light source. Activation of an electrode configuration by the controller generates a variable signal, causing electrostatic charges to deform the deformable layer into a pattern corresponding to the activated electrodes.
摘要:
The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.
摘要:
Ink reservoir subassemblies for phase change ink can be designed and configured to include at least one structure comprising elements disposed within the ink reservoir. The elements may include fibers and/or beads that occupy a majority of a volume of the reservoir. The elements may provide enhanced thermal conductivity, ink filtering and/or bubble reduction.
摘要:
Approaches to remove objects from ink in an ink jet printer are described. An object separator for an ink jet printer includes one or more inlets configured to allow passage of ink that includes objects such as bubbles and particles into the object separator. The object separator has a number of stacked plates. Some of the plates have curved channels which are connected through other plates that include vias. The plates are arranged to form at least one cyclonic flow generator, the cyclonic flow generator configured to focus the objects into one or more focused flow streams. The object separator includes one or more object outlets that allow objects to exit the object separator and at least one ink outlet that allows the ink to exit the object separator.
摘要:
Ink reservoir subassemblies for phase change ink can be designed and configured to include at least one structure comprising elements disposed within the ink reservoir. The elements may include fibers and/or beads that occupy a majority of a volume of the reservoir. The elements may provide enhanced thermal conductivity, ink filtering and/or bubble reduction.