公开(公告)号：US11222890B2

公开(公告)日：2022-01-11

申请号：US16839089

申请日：2020-04-03

Applicant: University of Electronic Science and Technology of China

Inventor： Ming Qiao ,  Linrong He ,  Yi Li ,  Chunlan Lai ,  Bo Zhang

IPC: H01L27/06 ,  H01L27/092 ,  H01L29/66 ,  H01L21/762 ,  H01L21/8238 ,  H01L29/06 ,  H01L29/739 ,  H01L29/78

Abstract: An integrated power semiconductor device, includes devices integrated on a single chip. The devices include a vertical high voltage device, a first high voltage pLDMOS device, a high voltage nLDMOS device, a second high voltage pLDMOS device, a low voltage NMOS device, a low voltage PMOS device, a low voltage NPN device, and a low voltage diode device. A dielectric isolation is applied to the first high voltage pLDMOS device, the high voltage nLDMOS device, the second high voltage pLDMOS device, the low voltage NMOS device, the low voltage PMOS device, the low voltage NPN device, and the low voltage diode device. A multi-channel design is applied to the first high voltage pLDMOS device, and the high voltage nLDMOS device. A single channel design is applied to the second high voltage pLDMOS device.

公开(公告)号：US10510747B1

公开(公告)日：2019-12-17

申请号：US16140572

申请日：2018-09-25

Applicant: University of Electronic Science and Technology of China

Inventor： Ming Qiao ,  Chunlan Lai ,  Linrong He ,  Li Ye ,  Bo Zhang

IPC: H01L27/06 ,  H01L29/06 ,  H01L29/739 ,  H01L29/78 ,  H01L29/08 ,  H01L21/768 ,  H01L21/3115 ,  H01L21/324

Abstract: A BCD semiconductor device includes devices integrated on a single chip. The devices include a first high voltage nLIGBT device, a second high voltage nLIGBT device, a first high voltage nLDMOS device, a second high voltage nLDMOS device, a third high voltage nLDMOS device, a first high voltage pLDMOS device and low voltage NMOS, PMOS and PNP devices, and a diode device. A dielectric isolation is applied to the high voltage nLIGBT, nLDMOS and pLDMOS devices to realize a complete isolation between the high and low voltage devices. The nLIGBT, nLDMOS, NPN and low voltage NMOS and PMOS are integrated on the substrate of a single chip. The isolation region composed of the dielectric, the second conductivity type buried layer, the dielectric trench, and the first conductivity type implanted region realizes full dielectric isolation of high and low voltage devices. The six types of high voltage transistors have multiple channels.