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公开(公告)号:US12248123B2
公开(公告)日:2025-03-11
申请号:US16764735
申请日:2018-12-19
Inventor: Sin-Yen Leo , Peng Jiang , Zhuxiao Gu
Abstract: Described herein are antireflective layers, methods for forming antireflective layers, and structures including antireflective layers. Methods are included for forming a durable antireflective layer on the surface of a substrate, wherein the substrate has a complex three-dimensional shape, wherein the durable antireflective layer comprises a uniform monolayer of silica nanoparticles interconnected by SiO2, a uniform monolayer of silica nanoparticles bonded to the surface of the substrate, or a combination thereof.
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公开(公告)号:US11705527B2
公开(公告)日:2023-07-18
申请号:US16956029
申请日:2018-12-18
Inventor: Peng Jiang , Zhuxiao Gu , Ruwen Tan
IPC: H01L31/18 , G02B1/118 , H01L31/0216
CPC classification number: H01L31/02168 , G02B1/118 , H01L31/186
Abstract: Embodiments of the present disclosure provide for methods of making substrates having an (AR) antireflective layer, substrates having an antireflective layer, devices including a substrate having an antireflective layer, and the like. The AR layer can have a total specular reflection of less than 10% at a wavelength of about 400-800 nm, and a height of about 500-1000 nm.
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公开(公告)号:US12224362B2
公开(公告)日:2025-02-11
申请号:US18203436
申请日:2023-05-30
Inventor: Peng Jiang , Zhuxiao Gu , Ruwen Tan
IPC: H01L31/0216 , G02B1/118 , H01L31/18
Abstract: Embodiments of the present disclosure provide for methods of making substrates having an (AR) antireflective layer, substrates having an antireflective layer, devices including a substrate having an antireflective layer, and the like. The AR layer can have a total specular reflection of less than 10% at a wavelength of about 400-800 nm, and a height of about 500-1000 nm.
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公开(公告)号:US12031919B2
公开(公告)日:2024-07-09
申请号:US17901286
申请日:2022-09-01
Inventor: Peng Jiang , Zhuxiao Gu , Sin-Yen Leo
IPC: G01N21/78
CPC classification number: G01N21/78
Abstract: Described are chromogenic sensors, methods of use, and kits including sensors. The sensors can have a polymer structure with a waveform cross-section in a programmed state. Upon exposure to a first liquid, the polymer structure in the programmed state changes to polymer structure in an activated state. Methods for measuring the presence of a liquid using the sensor are described, as are kits including the sensors.
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公开(公告)号:US11480527B2
公开(公告)日:2022-10-25
申请号:US16765132
申请日:2018-12-19
Inventor: Peng Jiang , Zhuxiao Gu , Sin-Yen Leo
IPC: G01N21/78
Abstract: Described are chromogenic sensors, methods of use, and kits including sensors. The sensors can have a polymer structure with a waveform cross-section in a programmed state. Upon exposure to a first liquid, the polymer structure in the programmed state changes to polymer structure in an activated state. Methods for measuring the presence of a liquid using the sensor are described, as are kits including the sensors.
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