公开(公告)号：US20060269733A1

公开(公告)日：2006-11-30

申请号：US10569363

申请日：2004-08-26

申请人： Utako Mizuno ,  Midori Nakajo ,  Seiji Shinohara ,  Toshio Yoshihara ,  Hiroyasu Nishida ,  Ryo Muraguchi ,  Masafumi Hirai

发明人： Utako Mizuno ,  Midori Nakajo ,  Seiji Shinohara ,  Toshio Yoshihara ,  Hiroyasu Nishida ,  Ryo Muraguchi ,  Masafumi Hirai

IPC分类号： B32B3/26

CPC分类号： C09D5/006 ,  B05D3/06 ,  C08K3/36 ,  C08K7/26 ,  C08K9/06 ,  C09D4/00 ,  C09D7/61 ,  C09D7/67 ,  C09D7/70 ,  G02B1/111 ,  Y10T428/249953

摘要： There is provided an antireflective laminate having a low refractive index and excellent mechanical strength, which comprises a coating layer of an ionizing radiation curing-type resin composition comprising ionizing radiation curing group-containing hollow silica fine particles. The antireflective laminate comprises a light transparent base material and at least a low refractive index layer having a refractive index of not more than 1.45 provided on the light transparent base material, wherein the low refractive index layer comprises an ionizing radiation curing-type resin composition and silica fine particles having an outer shell layer with the interior of the silica fine particles being porous or void, and, for a part or all of the silica fine particles, at least a part of the surface of the silica fine particle has been treated with an ionizing radiation curing group-containing silane coupling agent.

摘要翻译： 提供了具有低折射率和优异的机械强度的抗反射层压体，其包括含有电离辐射固化基团的中空二氧化硅细颗粒的电离辐射固化型树脂组合物的涂层。 所述抗反射层叠体包含透光性基材和至少具有设在所述透光性基材上的折射率为1.45以下的低折射率层，其中所述低折射率层包含电离辐射固化型树脂组合物和 具有外壳层的二氧化硅细颗粒，二氧化硅细颗粒的内部是多孔的或空隙的，并且对于二氧化硅微粒的一部分或全部，二氧化硅细颗粒的至少一部分表面已经用 含电离辐射固化基团的硅烷偶联剂。