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    Antireflection laminate
    1.
    发明申请
    Antireflection laminate 审中-公开
    防反射层压板

    公开(公告)号：US20060269733A1

    公开(公告)日：2006-11-30

    申请号：US10569363

    申请日：2004-08-26

    申请人： Utako Mizuno ,  Midori Nakajo ,  Seiji Shinohara ,  Toshio Yoshihara ,  Hiroyasu Nishida ,  Ryo Muraguchi ,  Masafumi Hirai

    发明人： Utako Mizuno ,  Midori Nakajo ,  Seiji Shinohara ,  Toshio Yoshihara ,  Hiroyasu Nishida ,  Ryo Muraguchi ,  Masafumi Hirai

    IPC分类号： B32B3/26

    CPC分类号： C09D5/006 ,  B05D3/06 ,  C08K3/36 ,  C08K7/26 ,  C08K9/06 ,  C09D4/00 ,  C09D7/61 ,  C09D7/67 ,  C09D7/70 ,  G02B1/111 ,  Y10T428/249953

    摘要： There is provided an antireflective laminate having a low refractive index and excellent mechanical strength, which comprises a coating layer of an ionizing radiation curing-type resin composition comprising ionizing radiation curing group-containing hollow silica fine particles. The antireflective laminate comprises a light transparent base material and at least a low refractive index layer having a refractive index of not more than 1.45 provided on the light transparent base material, wherein the low refractive index layer comprises an ionizing radiation curing-type resin composition and silica fine particles having an outer shell layer with the interior of the silica fine particles being porous or void, and, for a part or all of the silica fine particles, at least a part of the surface of the silica fine particle has been treated with an ionizing radiation curing group-containing silane coupling agent.

    摘要翻译： 提供了具有低折射率和优异的机械强度的抗反射层压体，其包括含有电离辐射固化基团的中空二氧化硅细颗粒的电离辐射固化型树脂组合物的涂层。 所述抗反射层叠体包含透光性基材和至少具有设在所述透光性基材上的折射率为1.45以下的低折射率层，其中所述低折射率层包含电离辐射固化型树脂组合物和 具有外壳层的二氧化硅细颗粒，二氧化硅细颗粒的内部是多孔的或空隙的，并且对于二氧化硅微粒的一部分或全部，二氧化硅细颗粒的至少一部分表面已经用 含电离辐射固化基团的硅烷偶联剂。

    Chain inorganic oxide fine particle groups
    2.
    发明授权
    Chain inorganic oxide fine particle groups 失效
    链无机氧化物微粒组

    公开(公告)号：US07309457B2

    公开(公告)日：2007-12-18

    申请号：US10981845

    申请日：2004-11-05

    申请人： Ryo Muraguchi ,  Masayuki Matsuda ,  Hiroyasu Nishida ,  Toshiharu Hirai ,  Mitsuaki Kumazawa

    发明人： Ryo Muraguchi ,  Masayuki Matsuda ,  Hiroyasu Nishida ,  Toshiharu Hirai ,  Mitsuaki Kumazawa

    IPC分类号： H01B1/00 ,  H01B1/02 ,  H01B1/08

    CPC分类号： C01G30/005 ,  B82Y30/00 ,  C01B33/146 ,  C01F7/02 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/40 ,  H01C17/06533

    摘要： A chain antimony oxide fine particle group comprising antimony oxide fine particles which have an average particle diameter of 5 to 50 nm, are connected in the form of a chain and have an average connection number of 2 to 30 and preferably used for forming a hard coating film. The fine particle group can be prepared by a process comprising treating an alkali antimonate aqueous solution with a cation exchange resin to prepare an antimonic acid (gel) dispersion and then treating the dispersion with an anion exchange resin and/or adding a base to the dispersion. Also provided is a substrate with a film comprising a substrate and a hard coating film. The hard coating film includes a chain inorganic oxide fine particle group, in which inorganic oxide fine particles of 2 to 30 on the average are connected in the form of a chain, and a matrix. The inorganic oxide particles may be silica particles, silica-alumina particles being preferable, and porous particles and/or hollow particles having a cavity inside being more preferable.

    摘要翻译： 包含平均粒径为5〜50nm的氧化锑微粒的链状氧化锑微粒组以链状连接，平均连接数为2〜30，优选用于形成硬涂层 电影。 微粒子组可以通过以下方法制备，该方法包括用阳离子交换树脂处理碱式锑酸盐水溶液以制备锑酸（凝胶）分散体，然后用阴离子交换树脂处理分散体和/或向分散体中加入碱 。 还提供了具有包括基底和硬涂膜的薄膜的基底。 硬涂膜包括链状无机氧化物细粒子群，其中平均形式为2至30的无机氧化物细颗粒以链的形式连接，并且基质。 无机氧化物颗粒可以是二氧化硅颗粒，二氧化硅 - 氧化铝颗粒是优选的，并且更优选具有内部空腔的多孔颗粒和/或中空颗粒。

    Chain inorganic oxide fine particle groups, process for preparing dispersion of the fine particle groups, and uses of the fine particle groups
    4.
    发明申请
    Chain inorganic oxide fine particle groups, process for preparing dispersion of the fine particle groups, and uses of the fine particle groups 失效
    链状无机氧化物微粒子群，微粒子群分散体的制造方法，细粒子群的使用

    公开(公告)号：US20050116205A1

    公开(公告)日：2005-06-02

    申请号：US10981845

    申请日：2004-11-05

    申请人： Ryo Muraguchi ,  Masayuki Matsuda ,  Hiroyasu Nishida ,  Toshiharu Hirai ,  Mitsuaki Kumazawa

    发明人： Ryo Muraguchi ,  Masayuki Matsuda ,  Hiroyasu Nishida ,  Toshiharu Hirai ,  Mitsuaki Kumazawa

    IPC分类号： B01J2/00 ,  B01J2/20 ,  C01B33/146 ,  C01B33/26 ,  C01F7/02 ,  C01G30/00 ,  H01C17/065 ,  H01C1/00

    CPC分类号： C01G30/005 ,  B82Y30/00 ,  C01B33/146 ,  C01F7/02 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/40 ,  H01C17/06533

    摘要： A chain antimony oxide fine particle group comprising antimony oxide fine particles which have an average particle diameter of 5 to 50 nm, are connected in the form of a chain and have an average connection number of 2 to 30 and preferably used for forming a hard coating film. The fine particle group can be prepared by a process comprising treating an alkali antimonate aqueous solution with a cation exchange resin to prepare an antimonic acid (gel) dispersion and then treating the dispersion with an anion exchange resin and/or adding a base to the dispersion. Also provided is a substrate with a film comprising a substrate and a hard coating film. The hard coating film includes a chain inorganic oxide fine particle group, in which inorganic oxide fine particles of 2 to 30 on the average are connected in the form of a chain, and a matrix. The inorganic oxide particles may be silica particles, silica-alumina particles being preferable, and porous particles and/or hollow particles having a cavity inside being more preferable.

    摘要翻译： 包含平均粒径为5〜50nm的氧化锑微粒的链状氧化锑微粒组以链状连接，平均连接数为2〜30，优选用于形成硬涂层 电影。 微粒子组可以通过以下方法制备，该方法包括用阳离子交换树脂处理碱式锑酸盐水溶液以制备锑酸（凝胶）分散体，然后用阴离子交换树脂处理分散体和/或向分散体中加入碱 。 还提供了具有包括基底和硬涂膜的薄膜的基底。 硬涂膜包括链状无机氧化物细粒子群，其中平均形式为2至30的无机氧化物细颗粒以链的形式连接，并且基质。 无机氧化物颗粒可以是二氧化硅颗粒，二氧化硅 - 氧化铝颗粒是优选的，并且更优选具有内部空腔的多孔颗粒和/或中空颗粒。

    Method of producing nodular silica sol
    8.
    发明授权
    Method of producing nodular silica sol 有权
    生成结节状硅溶胶的方法

    公开(公告)号：US08585791B2

    公开(公告)日：2013-11-19

    申请号：US13137661

    申请日：2011-09-01

    申请人： Kazuhiro Nakayama ,  Akira Nakashima ,  Hiroyasu Nishida ,  Yoshinori Wakamiya

    发明人： Kazuhiro Nakayama ,  Akira Nakashima ,  Hiroyasu Nishida ,  Yoshinori Wakamiya

    IPC分类号： C09K3/14

    CPC分类号： C01B33/1435 ,  C01B33/146 ,  C09K3/1454

    摘要： In producing nodular silica sol, a polymerized silicic acid solution with viscosity of silicic acid from 0.9 to 100 mPa·s is prepared by aging a silicic acid solution with pH from 1.0 to 7.0 and silica concentration from 0.05 to 3.0% by weight at a temperature from 1 to 98° C. Then, a seed liquid is prepared by adding an alkali to the polymerized solution to adjust the pH from 10 to 12.5 and heating the resultant mixture solution at a temperature from 50 to 150° C. According to necessity, an alkali is added to the obtained seed liquid to adjust the pH in from 9 to 12.5. Finally, a silicic acid solution or a highly purified silicic acid solution is dropped to the seed liquid at a temperature from 20 to 98° C. continuously or intermittently for building up.

    摘要翻译： 在生产结节状二氧化硅溶胶中，通过使pH为1.0〜7.0的硅酸溶液老化，硅酸盐浓度为0.05〜3.0重量％，在粘度为0.9〜100mPa·s的聚合硅酸溶液中， 1至98℃。然后，通过向聚合溶液中加入碱以将pH调节至10至12.5并在50至150℃的温度下加热所得混合物溶液来制备种子液。根据需要， 向获得的种子液中加入碱以将pH调节至9至12.5。 最后，连续地或间歇地将硅酸溶液或高纯度的硅酸溶液在20〜98℃的温度下滴加到种液中以进行构建。

    Nodular silica sol and method of producing the same
    9.
    发明申请
    Nodular silica sol and method of producing the same 有权
    球状硅溶胶及其制造方法

    公开(公告)号：US20110314745A1

    公开(公告)日：2011-12-29

    申请号：US13137661

    申请日：2011-09-01

    申请人： Kazuhiro Nakayama ,  Akira Nakashima ,  Hiroyasu Nishida ,  Yoshinori Wakamiya

    发明人： Kazuhiro Nakayama ,  Akira Nakashima ,  Hiroyasu Nishida ,  Yoshinori Wakamiya

    IPC分类号： C09G1/02 ,  C09K3/14

    CPC分类号： C01B33/1435 ,  C01B33/146 ,  C09K3/1454

    摘要： A nodular silica sol has a ratio of an average particle diameter (r) measured by the dynamic light scattering method versus a particle diameter (r′) converted to that of an equivalent sphere computed from an average specific surface area measured by means of the nitrogen absorption method (r/r′, referred to as “association ratio”) in a range from 1.2 to 10, the particle diameter (r′) in a range from 5 to 200 nm, and the specific surface area in a range from 13 to 550 m2/g. The nodular silica particles have heterogeneous forms, and contents of Ca and Mg contained in the nodular silica particles are below 1000 ppm against SiO2 respectively.

    摘要翻译： 球状二氧化硅溶胶具有通过动态光散射法测得的平均粒径（r）与通过氮气测得的平均比表面积计算的等效球体的粒径（r'）的比值 吸收方法（r / r'，称为“缔合比”）在1.2〜10的范围内，粒径（r'）在5〜200nm的范围内，比表面积在13 至550m2 / g。 球状二氧化硅颗粒具有异质形式，并且结晶二氧化硅颗粒中所含的Ca和Mg的含量分别低于1000ppm。

    Nodular Silica Sol and Method of Producing the Same
    10.
    发明申请
    Nodular Silica Sol and Method of Producing the Same 审中-公开
    球状二氧化硅溶胶及其制备方法

    公开(公告)号：US20100146864A1

    公开(公告)日：2010-06-17

    申请号：US11990111

    申请日：2006-08-01

    申请人： Kazuhiro Nakayama ,  Akira Nakashima ,  Hiroyasu Nishida ,  Yoshinori Wakamiya

    发明人： Kazuhiro Nakayama ,  Akira Nakashima ,  Hiroyasu Nishida ,  Yoshinori Wakamiya

    IPC分类号： C01B33/146 ,  C09K3/14

    CPC分类号： C01B33/1435 ,  C01B33/146 ,  C09K3/1454

    摘要： A novel nodular silica sol adapted to use as a polishing material for polishing, for instance, CMP.The nodular silica sol has a ratio of an average particle diameter (r) measured by the dynamic light scattering method versus a particle diameter (r′) converted to that of an equivalent sphere computed from an average specific surface area measured by means of the nitrogen absorption method (r/r′, referred to as “association ratio”) in a range from 1.2 to 10, the particle diameter (r′) in a range from 5 to 200 nm, and the specific surface area in a range from 13 to 550 m2/g. The nodular silica particles have heterogeneous forms, and contents of Ca and Mg contained in the nodular silica particles are below 1000 ppm against SiO2 respectively.

    摘要翻译： 适于用作抛光用抛光材料的新型结节状硅溶胶，例如CMP。 球状二氧化硅溶胶具有通过动态光散射法测得的平均粒径（r）与通过氮气测量的平均比表面积计算的等效球体的粒径（r'）的比值 吸收方法（r / r'，称为“缔合比”）在1.2〜10的范围内，粒径（r'）在5〜200nm的范围内，比表面积在13 至550m2 / g。 球状二氧化硅颗粒具有异质形式，并且结晶二氧化硅颗粒中所含的Ca和Mg的含量分别低于1000ppm。