公开(公告)号：US20230347595A1

公开(公告)日：2023-11-02

申请号：US17569933

申请日：2020-07-17

申请人： VITO NV

发明人： Bart MICHIELSEN ,  Jasper LEFEVERE ,  Wim BOUWEN ,  Steven MULLENS ,  Marijn GYSEN ,  Erwin VAN HOOF

IPC分类号： B29C64/393 ,  B29C64/255 ,  B33Y50/02 ,  B33Y10/00 ,  B29C64/118 ,  B33Y30/00

CPC分类号： B29C64/393 ,  B29C64/118 ,  B29C64/255 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B29K2105/04

摘要： A method and system for manufacturing a three-dimensional porous structure. Filaments are deposited in a predetermined interconnected arrangement in a plurality of stacked layers for forming a porous structure with interconnected pores. A pressure value indicative of a pressure being applied on the build material in the build material reservoir of a nozzle used for deposition is monitored during deposition of the filaments. The processing unit is configured to adjust at least one extrusion parameter in order to compensate for the irregular rising and/or falling of the pressure value.

公开(公告)号：US20170125221A1

公开(公告)日：2017-05-04

申请号：US15335992

申请日：2016-10-27

申请人： VITO NV

发明人： Annick VANHULSEL ,  Erwin VAN HOOF ,  Jan COOLS

IPC分类号： H01J37/32

CPC分类号： H01J37/32532 ,  H01J37/32009 ,  H01J37/3244 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/245 ,  H05H2240/10 ,  H05H2245/123

摘要： Apparatus for plasma processing of a continuous fiber, comprising a first and a second plasma torch. Each plasma torch comprises oppositely arranged electrodes to define a plasma discharge chamber between the electrodes. The plasma discharge chamber comprises an inlet and an outlet for passing a plasma forming gas between the electrodes. The apparatus further comprises an afterglow chamber in fluid communication with the outlets of the plasma discharge chambers, which comprises a substrate inlet and a substrate outlet arranged at opposite sides of the outlets of the plasma discharge chambers. A transport system is configured to continuously transport the fiber from the substrate inlet to the substrate outlet through the afterglow chamber. The substrate inlet comprises an aperture having a cross-sectional size substantially smaller than a cross-sectional size of the afterglow chamber. The outlets of the plasma torches face each other and exhaust plasma activated species into the afterglow chamber.