公开(公告)号：US09994684B2

公开(公告)日：2018-06-12

申请号：US14691214

申请日：2015-04-20

申请人： NISSAN CHEMICAL INDUSTRIES, LTD.

发明人： Hitoshi Furusho ,  Yuki Nohara ,  Hisayuki Watanabe ,  Yuichi Goto

IPC分类号： C08J3/28 ,  H01L21/02 ,  H01L21/225 ,  H01L31/0288 ,  H01L31/18 ,  H01L31/20 ,  B01J19/08

CPC分类号： C08J3/28 ,  B01J19/081 ,  B01J19/087 ,  C08J2383/16 ,  H01L21/0242 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/02592 ,  H01L21/02628 ,  H01L21/2254 ,  H01L31/0288 ,  H01L31/182 ,  H01L31/20 ,  H05H2245/123 ,  Y02E10/546 ,  Y02P70/521

摘要： Described is a doping technique that forms a stable amorphous silicon film and a stable polycrystalline silicon film at a low temperature and simultaneously that imparts conductivity in an atmospheric pressure environment. A method for producing a compound containing a bond between different elements belonging to Group 4 to Group 15 of the periodic table, the method including: applying, at a low frequency and atmospheric pressure, high voltage to an inside of an electric discharge tube obtained by attaching high-voltage electrodes to a metal tube or an insulator tube or between flat plate electrodes while passing an introduction gas, so as to convert molecules present in the electric discharge tube or between the flat plate electrodes into a plasma; and applying the plasma to substances to be irradiated, the substances to be irradiated being two or more elementary substances or compounds.

公开(公告)号：US20170356271A1

公开(公告)日：2017-12-14

申请号：US15543964

申请日：2015-02-17

申请人： Halliburton Energy Services, Inc.

发明人： Samuel J. LEWIS

IPC分类号： E21B33/13 ,  H05H7/00 ,  H05H7/04

CPC分类号： E21B33/13 ,  H05H7/001 ,  H05H7/04 ,  H05H2007/002 ,  H05H2007/045 ,  H05H2245/123

摘要： Systems and methods that produce bremsstrahlung radiation may facilitate the setting of a settable composition. For example, a method may include providing a settable composition in a portion of a wellbore penetrating a subterranean formation, a portion of the subterranean formation, or both; conveying an electron accelerator tool along the wellbore proximal to the settable composition; producing an electron beam in the electron accelerator tool with a trajectory that impinges a converter material, thereby converting the electron beam to bremsstrahlung photons; manipulating the trajectory of the electron beam in a radial direction, an axial direction, or both of the wellbore with a rastoring device of the electron accelerator tool; and irradiating the settable composition with the bremsstrahlung photons.

公开(公告)号：US20170125221A1

公开(公告)日：2017-05-04

申请号：US15335992

申请日：2016-10-27

申请人： VITO NV

发明人： Annick VANHULSEL ,  Erwin VAN HOOF ,  Jan COOLS

IPC分类号： H01J37/32

CPC分类号： H01J37/32532 ,  H01J37/32009 ,  H01J37/3244 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/245 ,  H05H2240/10 ,  H05H2245/123

摘要： Apparatus for plasma processing of a continuous fiber, comprising a first and a second plasma torch. Each plasma torch comprises oppositely arranged electrodes to define a plasma discharge chamber between the electrodes. The plasma discharge chamber comprises an inlet and an outlet for passing a plasma forming gas between the electrodes. The apparatus further comprises an afterglow chamber in fluid communication with the outlets of the plasma discharge chambers, which comprises a substrate inlet and a substrate outlet arranged at opposite sides of the outlets of the plasma discharge chambers. A transport system is configured to continuously transport the fiber from the substrate inlet to the substrate outlet through the afterglow chamber. The substrate inlet comprises an aperture having a cross-sectional size substantially smaller than a cross-sectional size of the afterglow chamber. The outlets of the plasma torches face each other and exhaust plasma activated species into the afterglow chamber.

公开(公告)号：US20160348292A1

公开(公告)日：2016-12-01

申请号：US15231229

申请日：2016-08-08

申请人： APJeT, Inc.

发明人： Carrie E. Cornelius ,  Gregory A. Roche ,  David W. Tyner

IPC分类号： D06B19/00 ,  D06B1/02

CPC分类号： D06B19/007 ,  B23K10/003 ,  D06B1/02 ,  D10B2401/021 ,  H05H1/46 ,  H05H2001/466 ,  H05H2240/10 ,  H05H2245/123

摘要： Methods for atmospheric pressure plasma discharge processing using powered electrodes having elongated planar surfaces; grounded electrodes having elongated planar surfaces parallel to and coextensive with the elongated surfaces of the powered electrodes, and spaced-apart a chosen distance therefrom, forming plasma regions, are described. RF power is provided to the at least one powered electrode, both powered and grounded electrodes may be cooled, and a plasma gas is flowed through the plasma regions at atmospheric pressure; whereby a plasma is formed in the plasma regions. The material to be processed may be moved into close proximity to the exit of the plasma gas from the plasma regions perpendicular to the gas flow, and perpendicular to the elongated electrode dimensions, whereby excited species generated in the plasma exit the plasma regions and impinge unimpeded onto the material.

摘要翻译： 使用具有细长平面的动力电极进行大气压等离子体放电处理的方法; 描述了具有与被动电极的细长表面平行并且共同延伸的细长平面的接地电极，并且与其间隔开一定距离，形成等离子体区域。 RF功率被提供给至少一个供电电极，电源和接地电极都可以被冷却，等离子体气体在大气压力下流过等离子体区域; 由此在等离子体区域中形成等离子体。 待处理的材料可以被移动到离垂直于气流的等离子体区域等离子体气体的出口附近，并且垂直于细长的电极尺寸，由此在等离子体中产生的激发物质离开等离子体区域并且不受阻碍地撞击 在材料上。

公开(公告)号：US20120318662A1

公开(公告)日：2012-12-20

申请号：US13518712

申请日：2010-12-23

申请人： Hitoshi Furusho ,  Yuki Nohara ,  Hisayuki Watanabe ,  Yuichi Goto

发明人： Hitoshi Furusho ,  Yuki Nohara ,  Hisayuki Watanabe ,  Yuichi Goto

IPC分类号： B01J19/08 ,  C01B21/00

CPC分类号： C08J3/28 ,  B01J19/081 ,  B01J19/087 ,  C08J2383/16 ,  H01L21/0242 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/02592 ,  H01L21/02628 ,  H01L21/2254 ,  H01L31/0288 ,  H01L31/182 ,  H01L31/20 ,  H05H2245/123 ,  Y02E10/546 ,  Y02P70/521

摘要： The present invention provides a doping technique that forms a stable amorphous silicon film and a stable polycrystalline silicon film at a low temperature and simultaneously that imparts conductivity in an atmospheric pressure environment. A method for producing a compound containing a bond between different elements belonging to Group 4 to Group 15 of the periodic table, the method included: applying, at a low frequency and atmospheric pressure, high voltage to an inside of an electric discharge tube obtained by attaching high-voltage electrodes to a metal tube or an insulator tube or between flat plate electrodes while passing an introduction gas, so as to convert molecules present in the electric discharge tube or between the flat plate electrodes into a plasma; and applying the plasma to substances to be irradiated, the substances to be irradiated being two or more elementary substances or compounds.

摘要翻译： 本发明提供一种掺杂技术，其在低温下形成稳定的非晶硅膜和稳定的多晶硅膜，同时在大气压环境中赋予导电性。 一种含有元素周期表第4〜15族的不同元素之间键合的化合物的制造方法，其特征在于，在低频大气压下，向由 在通过导入气体的同时将高压电极连接到金属管或绝缘体管或平板电极之间，以将存在于放电管中或平板电极之间的分子转化为等离子体; 并将等离子体施加到待照射的物质上，被照射物质是两种以上的元素或化合物。

公开(公告)号：US07931858B1

公开(公告)日：2011-04-26

申请号：US12144134

申请日：2008-06-23

申请人： Adam F. Gross ,  Kevin W. Kirby ,  Daniel J. Gregoire

发明人： Adam F. Gross ,  Kevin W. Kirby ,  Daniel J. Gregoire

IPC分类号： A61L2/02

CPC分类号： A61L2/14 ,  A61L2202/11 ,  H05H1/46 ,  H05H2001/4615 ,  H05H2245/123

摘要： A method of decontaminating a surface is provided. A surface to propagate electromagnetic surface waves is provided having a frequency in the microwave spectrum between 1 GHz and 1000 GHz. The surface includes a surface-wave medium or the surface-wave medium is laminated on the surface for confining the electromagnetic surface waves to the surface. The surface-wave medium includes a conductive ground plane. A dielectric is provided on the ground plane. A metallic pattern is provided on the dielectric for increasing an inductive reactance of the surface-wave medium. Electromagnetic surface waves are transmitted onto the surface from a surface-wave coupler coupled to the surface for destroying, removing, or neutralizing chemical or biological surface contaminants. The surface contaminants are destroyed, removed, or neutralized with a plasma created by the electromagnetic surface waves or through absorption of the electromagnetic surface waves.

摘要翻译： 提供一种净化表面的方法。 提供具有在1GHz和1000GHz之间的微波频谱中的频率的用于传播电磁表面波的表面。 表面包括表面波介质或表面波介质层压在表面上以将电磁表面波限制在表面上。 表面波介质包括导电接地平面。 在接地平面上提供电介质。 在电介质上提供金属图案以增加表面波介质的感抗。 电磁表面波从耦合到表面的表面波耦合器传播到表面上，用于破坏，去除或中和化学或生物表面污染物。 表面污染物被由电磁表面波产生的等离子体或通过吸收电磁表面波而被破坏，去除或中和。

公开(公告)号：US20090246542A1

公开(公告)日：2009-10-01

申请号：US12410492

申请日：2009-03-25

申请人： Ken Nakao ,  Shuji Moriya ,  Hiroyuki Kousaka

发明人： Ken Nakao ,  Shuji Moriya ,  Hiroyuki Kousaka

IPC分类号： B32B15/04 ,  C23C16/513

CPC分类号： H05H1/46 ,  H05H2001/4622 ,  H05H2240/10 ,  H05H2245/123 ,  Y10T428/31678

摘要： A disclosed plasma process apparatus includes an electromagnetic wave generator that generates electromagnetic waves; a vacuum vessel configured to be hermetically connected with an object to be processed, and evacuated to reduced pressures along with the object to be processed hermetically connected to the vacuum vessel; an electromagnetic wave guiding portion configured to guide the electromagnetic waves generated by the electromagnetic wave generator so that plasma is ignited in the vacuum vessel; a gas supplying portion configured to supply a process gas to the object to be processed hermetically connected to the vacuum vessel; an evacuation portion configured to evacuate the object to be processed hermetically connected to the vacuum vessel; and a voltage source configured to apply a predetermined voltage to the object to be processed hermetically connected to the vacuum vessel so that the plasma ignited in the vacuum vessel is guided to the object to be processed.

摘要翻译： 所公开的等离子体处理装置包括产生电磁波的电磁波发生器; 真空容器，其构造成与待处理物体气密连接，并与被加工物体一起被抽空到与真空容器密封连接的被处理物体上; 电磁波引导部，被配置为引导由电磁波发生器产生的电磁波，使得等离子体在真空容器中点燃; 气体供给部构造成将处理气体供给到与真空容器密封连接的待加工对象物; 排气部，其构造成对与所述真空容器密封连接的待加工物体进行抽真空; 以及电压源，其构造成对与所述真空容器进行气密连接的待加工对象施加预定电压，使得在所述真空容器中点燃的等离子体被引导到被处理物体。

公开(公告)号：US20060272674A1

公开(公告)日：2006-12-07

申请号：US11143083

申请日：2005-06-02

申请人： Peter Kurunczi

发明人： Peter Kurunczi

IPC分类号： B08B6/00 ,  C23F1/00

CPC分类号： H01J37/32825 ,  A61L2/14 ,  B08B7/00 ,  H01J37/32009 ,  H01J37/32348 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/2418 ,  H05H2240/10 ,  H05H2240/20 ,  H05H2245/123

摘要： An apparatus and method for cleaning objects using plasma are disclosed. The apparatus provides a plurality of elongated dielectric barrier members arranged adjacent each other; a first set of electrodes arranged to be coupled to a voltage source at a first voltage, each electrode of the first set contained within, and extending substantially along the length of, a first set of the elongated dielectric barrier members; and a second set of electrodes arranged to be coupled to a voltage source at a second voltage, each electrode of the second set contained within, and extending substantially along the length of, a second set of the elongated dielectric barrier members; whereby, when the first and second voltages are applied, dielectric barrier discharges are created to form plasma between adjacent elongated dielectric barrier members for cleaning at least a portion of the objects. The method provides a plurality of elongated dielectric barrier members having a first and second set of electrodes arranged therein; introducing the objects proximate the elongated dielectric barrier members; and generating a dielectric barrier discharge to form plasma between the elongated dielectric barrier members for cleaning at least a portion of each of the objects.

摘要翻译： 公开了一种使用等离子体清洁物体的设备和方法。 该装置提供了彼此相邻布置的多个细长介电阻挡件; 布置成以第一电压耦合到电压源的第一组电极，所述第一组的每个电极包含在第一组长形介电阻挡构件内并基本沿其长度延伸; 以及第二组电极，其布置成以第二电压耦合到电压源，所述第二组的每个电极包含在所述细长介电阻挡构件的第二组中并基本上沿着所述长度延伸; 由此，当施加第一和第二电压时，产生电介质阻挡放电以在相邻的细长电介质阻挡构件之间形成等离子体，以清洁至少一部分物体。 该方法提供多个细长介质阻挡件，其中布置有第一和第二组电极; 引入靠近细长介电阻挡构件的物体; 以及产生电介质势垒放电以在所述细长电介质阻挡件之间形成等离子体，以清洁每个所述物体的至少一部分。

公开(公告)号：US06676802B2

公开(公告)日：2004-01-13

申请号：US10156394

申请日：2002-05-28

申请人： J. Reece Roth

发明人： J. Reece Roth

IPC分类号： H05H100

CPC分类号： H01J37/32357 ,  A61L2/14 ,  B29C59/14 ,  C23C16/452 ,  H01J37/32366 ,  H01J2237/336 ,  H05H1/46 ,  H05H2001/466 ,  H05H2240/10 ,  H05H2240/20 ,  H05H2245/123 ,  H05H2277/14

摘要： An OAUGD plasma is generated using, for example, paraelectric or peristaltic electrohydrodynamic (EHD) techniques, in the plasma generator of a remote-exposure reactor, wherein one or more active species, especially oxidizing species in the plasma are convected away from the plasma-generation region and directed towards a workpiece that is located outside of the plasma-generation region (e.g., within an optional remote-exposure chamber configured to the plasma generator). In this way, the workpiece can be subjected to the one or more active species without directly being subjected to either the plasma or to the electric fields used to generate the plasma. The plasma generator may have a set of flat panels arranged within an air baffle to convect the active species in a serpentine manner through the plasma generator. The remote-exposure reactor can also be configured as a portable backpack unit with tubing that is used to direct the active species onto the workpiece, rather than placing the workpiece within a remote-exposure chamber of the reactor.

摘要翻译： 在远程暴露反应器的等离子体发生器中使用例如顺电或蠕动电动力学（EHD）技术产生OAUGD等离子体，其中一个或多个活性物质，特别是等离子体中的氧化物质与等离子体 - 并且指向位于等离子体产生区域外部的工件（例如，在配置到等离子体发生器的可选的远程曝光室内）。 以这种方式，工件可以经受一种或多种活性物质而不直接经受等离子体或用于产生等离子体的电场。 等离子体发生器可以具有布置在空气挡板内的一组平板，以通过等离子体发生器以蛇形方式对流活性物质。 远程曝光反应器也可以配置为具有用于将活性物质引导到工件上的管道的便携式背包单元，而不是将工件放置在反应器的远程暴露室内。

公开(公告)号：US5143748A

公开(公告)日：1992-09-01

申请号：US783022

申请日：1991-10-25

申请人： Hiroyuki Ishikawa ,  Hiroaki Usui ,  Yasushi Sawada ,  Satiko Okazaki ,  Masuhiro Kogoma

发明人： Hiroyuki Ishikawa ,  Hiroaki Usui ,  Yasushi Sawada ,  Satiko Okazaki ,  Masuhiro Kogoma

IPC分类号： B01J19/08 ,  B27K5/00

CPC分类号： B27K5/0055 ,  B27K3/0214 ,  H05H2240/10 ,  H05H2245/123

摘要： A surface treatment process for improving surface properties of a timber as to wetness by exposing the timber to a plasma mixture of an inert gas and a reactive gas at a near atmospheric pressure. Prior to being exposed to the plasma mixture, the timber is treated to reduce a moisture content below a fiber saturation point of the timber so as to eliminate free moisture from the fibers of the timber which would otherwise lead to unstable plasma and therefore detract an uniform improvement over substantially the entire surface expected at the subsequent exposure to the plasma mixture. Thus, the plasma treatment can be effected in the absence of the free moisture to obtain a desired surface improvement uniformly across the surface of the timber, which gives an enhanced practicability of improving the surface properties of the timber, in addition to that the plasma mixture is generated at near the atmospheric pressures readily available without requiring substantial vacuum generating equipments.

摘要翻译： 一种用于通过将木材暴露于接近大气压下的惰性气体和反应性气体的等离子体混合物来改善木材表面性能的表面处理方法。 在暴露于等离子体混合物之前，木材被处理以减少低于木材的纤维饱和点的水分含量，以消除木材纤维中的游离水分，否则会导致不稳定的等离子体，因此损害均匀 在随后暴露于等离子体混合物中预期的基本上整个表面的改进。 因此，等离子体处理可以在没有游离水分的情况下进行，以在木材的表面上均匀地获得期望的表面改进，这提高了改进木材表面性能的实用性，除了等离子体混合物 在大气压附近产生，而不需要大量的真空发生设备。