公开(公告)号：US20130206583A1

公开(公告)日：2013-08-15

申请号：US13802828

申请日：2013-03-14

Applicant: Veeco Instruments, Inc.

Inventor： Boris L. Druz ,  Viktor Kanarov ,  Hariharakeshave S. Hegde ,  Alan V. Hayes ,  Emmanuel Lakios ,  Mario Roque

IPC: C23C14/50 ,  C23C14/54 ,  C23C14/46

CPC classification number: C23C14/505 ,  C23C14/044 ,  C23C14/221 ,  C23C14/225 ,  C23C14/46 ,  C23C14/542 ,  H01J37/08 ,  H01J37/20 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221

Abstract: Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.