公开(公告)号：US3634645A

公开(公告)日：1972-01-11

申请号：US3634645D

申请日：1970-04-21

Applicant: WESTINGHOUSE ELECTRIC CORP

Inventor： LEMPERT JOSEPH ,  LOWRY JERALD F ,  BONNER FREDERICK M

IPC: H01J37/063 ,  H01J37/21 ,  H01J37/24 ,  H01J37/301 ,  B23K9/00

CPC classification number: H01J37/063 ,  H01J37/21 ,  H01J37/241 ,  H01J37/301

Abstract: The electron beam B is projected on work W, usually in the atmosphere outside of the chamber where the beam is generated, through a plurality of aperture members 11, 13, 15, 17. The holes in the aperture members are as small as practicable to suppress the feedback of air into the chamber. The beam B is focussed in regions 85 and 87 (FIG. 3) with reference to the aperture members so as to preclude damage to the members by impingement of the beam on the walls of the holes through which the beam passes. The beam current is varied in dependence on the demands of the work but the focus of the beam is maintained by bias resistor 115 (FIG. 1), without damage to the aperture member, by instantaneous change in the bias impressed on the beam by a control electrode G.

Abstract translation: 电子束B通过多个孔径构件11,13,15,17，通常在产生梁的室内的大气外部突出在工件W上。孔径构件中的孔尽可能地小到 抑制空气反馈到室内。 光束B参照光圈元件聚焦在区域85和87（图3）中，以防止光束撞击光束通过的孔的壁上的部件损坏。 光束电流根据工作的需要而变化，但是通过偏置电阻器115（图1）来保持光束的焦点，而不会损坏孔径部件，通过施加在光束上的偏置的瞬时变化由 控制电极G.