Method For Protecting A Metal Surface By Means Of A Corrosion-Inhibiting Coating
    2.
    发明申请
    Method For Protecting A Metal Surface By Means Of A Corrosion-Inhibiting Coating 审中-公开
    通过腐蚀抑制涂层保护金属表面的方法

    公开(公告)号:US20080171211A1

    公开(公告)日:2008-07-17

    申请号:US11659156

    申请日:2005-08-01

    IPC分类号: B05D3/00 B32B27/06 H01B1/12

    摘要: The invention relates to a method for protecting a metal surface by means of a coating based on a corrosion-inhibiting composition containing the following component(s): a) at least one type of deposit substance comprising (1) anions incorporated by an oxidation reaction and (2) releasing at least a part of said anions for a potential variation between a redox potential of the deposit substance and an undisturbed corrosion potential of a metal surface or when a comparably small potential variation is produced on a defect, wherein said anions can inhibit a partial anodic or/and cathodic corrosion reaction or/and act as an adherence initiator, said anions comprise, respectively, an ionic radius non-impairing the migration thereof, possibly b) at least one type of matrix substance, wherein said deposit substance(s) disposed in the undisturbed areas of the coating are at least partially oxidised or at least partially doped by the anions and at least one type of the deposit substance in the disturbed areas of the at least partially reduced coating or devoid at least partially of doping anions, the coating is adjusted by selecting the contained components and the contents thereof in such a way that it is possible to act at least partially and prematurely against the generation or the progression of a delamination before an intense delamination occurred. The variants of the deposit substance optionally have a relatively low cation transport rate.

    摘要翻译: 本发明涉及一种通过基于包含以下成分的腐蚀抑制组合物的涂层来保护金属表面的方法:a)至少一种沉积物质,其包含(1)通过氧化反应引入的阴离子 和(2)释放所述阴离子的至少一部分,用于沉积物质的氧化还原电位与金属表面的未受干扰的腐蚀电位之间的潜在变化,或者当对缺陷产生相当小的电位变化时,其中所述阴离子可以 抑制部分阳极或/和阴极腐蚀反应或/并且作为粘附引发剂,所述阴离子分别包含不损害其迁移的离子半径,可能b)至少一种类型的基质物质,其中所述沉积物质 设置在涂层的未受干扰的区域中的至少一个或多个被至少部分氧化或至少部分地由阴离子和至少一种类型的沉积物质 所述至少部分减少的涂层的干扰区域或至少部分地不掺杂掺杂阴离子,通过以这样的方式选择所含的组分及其含量来调节涂层,使得可以至少部分地和过早地对抗产生或 在发生强烈分层之前,分层的进展。 沉积物质的变体任选地具有相对低的阳离子输送速率。