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1.发明申请Scanning Electron Microscope and a Method for Imaging a Specimen Using the Same 有权扫描电子显微镜和使用其的成像样品的方法公开(公告)号：US20120181426A1
公开(公告)日：2012-07-19
申请号：US13432176
申请日：2012-03-28
IPC分类号： G01N23/00
CPC分类号： G01N23/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/1536 , H01J2237/216 , H01J2237/2817
摘要： (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.
摘要翻译： （1）可以从CAD数据自动计算成像点的数量，坐标，成像顺序，成像位置的各部分，成像顺序，成像位置变化方法和成像条件，（2）输入信息和 用于成像配方创建的输出信息可以任意设定，并且（3）决定是否成功/成功的任意成像点的成像或处理，并且在确定失败的情况下，可以进行解除处理 成像点或成像序列改变。
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公开(公告)号：US07559047B2
公开(公告)日：2009-07-07
申请号：US11342694
申请日：2006-01-31
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
摘要翻译： 在使用扫描电子显微镜创建半导体图案的SEM观察的成像配方的成像配方制作装置中，为了从观察图像测量布线宽度和图案的其他各种尺寸值的成像配方，从而 通过使用通过从CAD数据转换获得的CAD图像的分析，在最小时间内自动生成图案的形状，通过将CAD数据转换为图像格式来创建CAD图像的CAD图像创建单元， 量化宽度确定部分，亮度信息提供部分和图案形状变形处理部分; 使用由CAD图像创建单元创建的CAD图像来创建成像配方。
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3.发明申请Method and apparatus for semiconductor device production process monitoring and method and apparatus for estimating cross sectional shape of a pattern 有权用于半导体器件生产过程监控的方法和装置以及用于估计图案的截面形状的方法和装置公开(公告)号：US20070105243A1
公开(公告)日：2007-05-10
申请号：US11592175
申请日：2006-11-03
CPC分类号： H01L22/12 , H01L2924/0002 , Y10S430/143 , H01L2924/00
摘要： In an exposure process or etching process, an image feature amount useful for estimating a cross-sectional shape of a target evaluation pattern, process conditions for the pattern, or device characteristics of the pattern is calculated from an SEM image. The image feature amount is compared with learning data that correlates data preliminarily stored in a database, which data includes cross-sectional shapes of patterns, process conditions for the patterns, or device characteristics of the patterns, to the image feature amount calculated from the SEM image. Thereby, the cross-sectional shape of the target evaluation pattern, the process conditions of the pattern, or the device characteristics of the pattern are nondestructively calculated.
摘要翻译： 在曝光处理或蚀刻处理中，从SEM图像计算出用于估计目标评价图案的截面形状，图案的处理条件或图案的装置特性的图像特征量。 将图像特征量与将预先存储在数据库中的数据相关联的学习数据与将图案的截面形状，图案的处理条件或者图案的装置特性相关联的学习数据与从SEM计算出的图像特征量相关联 图片。 由此，非破坏性地计算目标评价图案的截面形状，图案的处理条件或图案的装置特性。
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4.发明申请Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device pattern 失效用于布置扫描电子显微镜配方的方法和装置以及用于评估半导体器件图案形状的装置公开(公告)号：US20060284081A1
公开(公告)日：2006-12-21
申请号：US11330215
申请日：2006-01-12
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/153 , H01J37/21 , H01J2237/1532 , H01J2237/216 , H01J2237/24592 , H01J2237/2487 , H01J2237/2816 , H01J2237/2817
摘要： In order to provide an imaging-recipe arranging or creating apparatus and method adapted so that selection rules for automatic arrangement of an imaging recipe can be optimized by teaching in a SEM apparatus or the like, the imaging-recipe arranging or creating apparatus in this invention that arranges an imaging recipe for SEM-observing a semiconductor pattern using a scanning electron microscope includes a database that receives and stores layout information of the above semiconductor pattern in a low-magnification field, and an imaging-recipe arranging unit which, on the basis of the database-stored semiconductor pattern layout information, arranges the imaging recipe automatically in accordance with the automatic arrangement algorithm that includes teaching-optimized selection rules for selecting an imaging point(s).
摘要翻译： 为了提供一种成像配方布置或创建装置和方法，适于使得通过在SEM装置等中的教导来优化成像配方的自动布置的选择规则，本发明的成像配方布置或创建装置 使用扫描型电子显微镜配置SEM观察半导体图案的成像配方，包括：数据库，其接收并存储在低倍率场中的上述半导体图案的布局信息;以及成像配方配置单元，其基于 数据库存储的半导体图案布局信息，根据包括用于选择成像点的教学优化选择规则的自动布置算法自动布置成像配方。
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5.发明申请Method and apparatus for measuring dimension of a pattern formed on a semiconductor wafer 有权用于测量形成在半导体晶片上的图案的尺寸的方法和装置公开(公告)号：US20060288325A1
公开(公告)日：2006-12-21
申请号：US11342694
申请日：2006-01-31
IPC分类号： G06F17/50
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
摘要翻译： 在使用扫描电子显微镜创建半导体图案的SEM观察的成像配方的成像配方制作装置中，为了从观察图像测量布线宽度和图案的其他各种尺寸值的成像配方，从而 通过使用通过从CAD数据转换获得的CAD图像的分析，在最小时间内自动生成图案的形状，通过将CAD数据转换为图像格式来创建CAD图像的CAD图像创建单元， 量化宽度确定部分，亮度信息提供部分和图案形状变形处理部分; 使用由CAD图像创建单元创建的CAD图像来创建成像配方。
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6.发明授权Method and apparatus for monitoring cross-sectional shape of a pattern formed on a semiconductor device 有权用于监测形成在半导体器件上的图案的横截面形状的方法和装置公开(公告)号：US08881067B2
公开(公告)日：2014-11-04
申请号：US13738795
申请日：2013-01-10
CPC分类号： G03F7/70625 , G06K9/00798 , G06K9/48 , G06T7/001 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2804 , H01J2237/2817
摘要： To enable SEM-based management of a cross-sectional shape or manufacturing process parameters of a semiconductor device pattern to be measured, the association between the shape or parameters and SEM image characteristic quantities effective for estimating the shape or parameters is saved as learning data. The image characteristic quantities are collated with learning data to estimate the shape or to monitor the process parameters. Accuracy and reliability is achievable by calculating three kinds of reliability (reliability of the image characteristic quantities, reliability of estimation engines, and reliability of estimating results) based on the distribution of the image characteristic quantities and then judging whether additional learning is necessary, or selecting and adjusting image characteristic quantities and estimation engine based on the reliability.
摘要翻译： 为了能够对待测量的半导体器件图案的横截面形状或制造工艺参数进行基于SEM的管理，可以将有效估计形状或参数的形状或参数与SEM图像特征量之间的关联保存为学习数据。 图像特征量与学习数据进行比较，以估计形状或监视过程参数。 根据图像特征量的分布，通过计算三种可靠性（图像特征量的可靠性，估计引擎的可靠性和估计结果的可靠性），然后判断是否需要额外的学习，或者选择 并根据可靠性调整图像特征量和估计引擎。
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公开(公告)号：USRE45224E1
公开(公告)日：2014-10-28
申请号：US12621307
申请日：2009-11-18
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
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公开(公告)号：USRE45204E1
公开(公告)日：2014-10-21
申请号：US12614358
申请日：2009-11-06
IPC分类号： G06F17/50
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
摘要翻译： 在使用扫描电子显微镜创建半导体图案的SEM观察的成像配方的成像配方制作装置中，为了从观察图像测量布线宽度和图案的其他各种尺寸值的成像配方，从而 通过使用通过从CAD数据转换获得的CAD图像的分析，在最小时间内自动生成图案的形状，通过将CAD数据转换为图像格式来创建CAD图像的CAD图像创建单元， 量化宽度确定部分，亮度信息提供部分和图案形状变形处理部分; 使用由CAD图像创建单元创建的CAD图像来创建成像配方。
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9.发明申请METHOD AND APPARATUS FOR MONITORING CROSS-SECTIONAL SHAPE OF A PATTERN FORMED ON A SEMICONDUCTOR DEVICE 有权用于监测形成在半导体器件上的图案的交叉形状的方法和装置公开(公告)号：US20130195346A1
公开(公告)日：2013-08-01
申请号：US13738795
申请日：2013-01-10
IPC分类号： G06T7/00
CPC分类号： G03F7/70625 , G06K9/00798 , G06K9/48 , G06T7/001 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2804 , H01J2237/2817
摘要： To enable SEM-based management of a cross-sectional shape or manufacturing process parameters of a semiconductor device pattern to be measured, the association between the shape or parameters and SEM image characteristic quantities effective for estimating the shape or parameters is saved as learning data. The image characteristic quantities are collated with learning data to estimate the shape or to monitor the process parameters. Accuracy and reliability is achievable by calculating three kinds of reliability (reliability of the image characteristic quantities, reliability of estimation engines, and reliability of estimating results) based on the distribution of the image characteristic quantities and then judging whether additional learning is necessary, or selecting and adjusting image characteristic quantities and estimation engine based on the reliability.
摘要翻译： 为了能够对待测量的半导体器件图案的横截面形状或制造工艺参数进行基于SEM的管理，可以将有效估计形状或参数的形状或参数与SEM图像特征量之间的关联保存为学习数据。 图像特征量与学习数据进行比较，以估计形状或监视过程参数。 根据图像特征量的分布，通过计算三种可靠性（图像特征量的可靠性，估计引擎的可靠性和估计结果的可靠性），然后判断是否需要额外的学习，或者选择 并根据可靠性调整图像特征量和估计引擎。
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10.发明授权Method and apparatus for monitoring cross-sectional shape of a pattern formed on a semiconductor device 有权用于监测形成在半导体器件上的图案的横截面形状的方法和装置公开(公告)号：US08356260B2
公开(公告)日：2013-01-15
申请号：US11673065
申请日：2007-02-09
IPC分类号： G06F17/50
CPC分类号： G03F7/70625 , G06K9/00798 , G06K9/48 , G06T7/001 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2804 , H01J2237/2817
摘要： A method is provided for estimating a cross-sectional shape or for monitoring manufacturing process parameters of a semiconductor device pattern to be measured. In this method, in order to enable SEM-based management of the cross-sectional shape or manufacturing process parameters of the pattern to be measured, the association between the cross-sectional shape or process parameters of the pattern and SEM image characteristic quantities effective for estimating the cross-sectional shape or process parameters of the pattern, is saved as learning data, and then the image characteristic quantities that have been calculated from a SEM image of the pattern are collated with the learning data to estimate the cross-sectional shape or to monitor process parameters of the pattern. Estimation with high accuracy and reliability is achievable by calculating all or part of three kinds of reliability (reliability of the image characteristic quantities, reliability of estimation engines, and reliability of estimating results) based on the distribution of the image characteristic quantities and judging from the calculated reliability whether additional learning of the learning data is necessary, or selecting and adjusting image characteristic quantities and estimation engine based on the reliability.
摘要翻译： 提供了一种用于估计横截面形状或用于监测待测量的半导体器件图案的制造工艺参数的方法。 在该方法中，为了能够对待测图案的截面形状或制造工艺参数进行基于SEM的管理，图案的截面形状或工艺参数与SEM图像特征量之间的关联对于 估计图案的截面形状或工艺参数被保存为学习数据，然后将从图案的SEM图像计算出的图像特征量与学习数据进行对照以估计横截面形状或 监视模式的进程参数。 基于图像特征量的分布，通过计算三种可靠性（图像特征量的可靠性，估计引擎的可靠性，估计引擎的可靠性和估计结果的可靠性），可以实现高精度和可靠性的估计。 计算的可靠性是否需要学习数据的附加学习，或者基于可靠性来选择和调整图像特征量和估计引擎。
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