公开(公告)号：US5795215A

公开(公告)日：1998-08-18

申请号：US667221

申请日：1996-06-19

申请人： William L. Guthrie ,  Tsungnan Cheng ,  Sen-Hou Ko ,  Harry Q. Lee ,  Michael T. Sherwood ,  Norm Shendon

发明人： William L. Guthrie ,  Tsungnan Cheng ,  Sen-Hou Ko ,  Harry Q. Lee ,  Michael T. Sherwood ,  Norm Shendon

IPC分类号： B24B5/00

CPC分类号： B24B5/00

摘要： A process using a retaining ring assembly of a carrier head to precompress a polishing pad to reduce or minimize the edge effect in a chemical mechanical polishing process.

摘要翻译： 使用载体头的保持环组件来预压缩抛光垫以减少或最小化化学机械抛光工艺中的边缘效应的方法。

公开(公告)号：US5681215A

公开(公告)日：1997-10-28

申请号：US549651

申请日：1995-10-27

申请人： Michael T. Sherwood ,  Harry Q. Lee ,  Norm Shendon ,  Semyon Spektor

发明人： Michael T. Sherwood ,  Harry Q. Lee ,  Norm Shendon ,  Semyon Spektor

IPC分类号： B24B37/30 ,  B24B37/32 ,  H01L21/304 ,  B24B5/02 ,  B24B29/02

CPC分类号： B24B37/30 ,  B24B37/32

摘要： A carrier uses multiple bellows to form two pressure chambers between the housing and carrier base and retaining ring assembly. By pressurizing the first chamber, an even load can be applied across the substrate. By pressurizing the second chamber, the retaining ring can pressed against the polishing pad. The bellows allow the carrier base to pivot with respect to the housing, but the downward force is evenly applied to the substrate through the first pressure chamber. Torque is transferred from the carrier housing to the carrier base through the bellows.

摘要翻译： 载体使用多个波纹管在壳体和载体基座和保持环组件之间形成两个压力室。 通过对第一腔室进行加压，可以跨衬底施加均匀的负载。 通过对第二腔室进行加压，保持环可压靠抛光垫。 波纹管允许载体基座相对于壳体枢转，但是向下的力通过第一压力室均匀地施加到基板。 扭矩通过波纹管从载体壳体转移到载体基座。

公开(公告)号：US06019670A

公开(公告)日：2000-02-01

申请号：US814436

申请日：1997-03-10

申请人： Tsungnan Cheng ,  Shou-Chen Kao ,  Michael T. Sherwood

发明人： Tsungnan Cheng ,  Shou-Chen Kao ,  Michael T. Sherwood

IPC分类号： B24B37/32 ,  B24B53/007 ,  B24B53/017 ,  B24B7/00

CPC分类号： B24B37/32 ,  B24B53/017

摘要： A chemical mechanical polishing apparatus including a carrier head having an integral conditioning member is described. The conditioning member includes a conditioning surface that may selectively be moved into contact with a polishing surface of a polishing pad. The conditioning member may be connected to a surface of the carrier's retaining ring assembly. As a result, the polishing surface may be conditioned either continuously or intermittently when a substrate is loaded in the carrier for polishing.

摘要翻译： 描述了包括具有整体调节部件的载体头的化学机械抛光装置。 调理部件包括可选择性地移动成与抛光垫的抛光表面接触的调节表面。 调理构件可以连接到承载件的保持环组件的表面。 结果，当将基板装载在用于抛光的载体中时，抛光表面可以连续地或间歇地调节。

公开(公告)号：USRE44491E1

公开(公告)日：2013-09-10

申请号：US11400763

申请日：2006-04-06

申请人： Norman Shendon ,  Michael T. Sherwood ,  Harry Q. Lee

发明人： Norman Shendon ,  Michael T. Sherwood ,  Harry Q. Lee

IPC分类号： B24B7/22

CPC分类号： B24B37/30 ,  B24B37/32

摘要： A chemical mechanical head includes a retaining ring to maintain a substrate beneath the mounting surface during polishing. The retaining ring has a lower portion with a bottom surface for contacting a polishing pad during polishing and made of a first material, such as plastic, and an upper portion made of a second, different material, such as metal.