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    METHOD FOR THE PRODUCTION OF SECURITY ELEMENTS HAVING REGISTERED LAYERS OF DESIGNS
    1.
    发明申请
    METHOD FOR THE PRODUCTION OF SECURITY ELEMENTS HAVING REGISTERED LAYERS OF DESIGNS 有权
    生产注册层设计的安全元件的方法

    公开(公告)号：US20110115212A1

    公开(公告)日：2011-05-19

    申请号：US13055515

    申请日：2009-08-04

    申请人： Winfried Hoffmuller ,  Patrick Renner ,  Manfred Heim ,  Theodor Burchard

    发明人： Winfried Hoffmuller ,  Patrick Renner ,  Manfred Heim ,  Theodor Burchard

    IPC分类号： B44F1/12 ,  B44C1/00 ,  B44C1/17 ,  B32B37/02 ,  B32B37/14 ,  B32B38/10 ,  B42D15/10

    CPC分类号： B42D25/43 ,  B32B2425/00 ,  B42D25/29 ,  B42D25/324 ,  B42D25/328 ,  B42D25/445 ,  B42D25/47 ,  B42D2033/18 ,  B42D2035/16 ,  B42D2035/36 ,  Y10T156/17

    摘要： The present invention relates to a method for producing a security element (1), to a security element (1) obtainable by the method according to the invention, to transfer materials having the security elements according to the invention, and to objects of value secured with the security elements according to the invention. The security element (1) according to the invention has two functional layers (12, 22) which are bonded together by means of a resist layer (30). The resist layer (30) has a pattern which is employed to generate a congruent pattern in the first functional layer (12). Then the pattern of the resist layer (30), and thus also of the first functional layer (12), is exactly reproduced in the second functional layer (22). This is achieved by bonding the second functional layer (22) in the form of the pattern of the resist layer (30). The non-bonded areas of the second functional layer (22) are removed, thereby forming negative writing.

    摘要翻译： 本发明涉及一种用于生产安全元件（1）的方法，通过根据本发明的方法可获得的安全元件（1），用于将具有根据本发明的安全元件的材料转移到具有价值的物体上 与根据本发明的安全元件。 根据本发明的安全元件（1）具有通过抗蚀剂层（30）结合在一起的两个功能层（12,22）。 抗蚀剂层（30）具有用于在第一功能层（12）中产生全等图案的图案。 那么抗蚀剂层（30）的图案也因此也是第一功能层（12）的图案在第二功能层（22）中精确地再现。 这通过以抗蚀剂层（30）的图案的形式接合第二功能层（22）来实现。 除去第二功能层（22）的非接合区域，从而形成负写入。

    Method for the production of security elements having registered layers of designs
    2.
    发明授权
    Method for the production of security elements having registered layers of designs 有权
    用于生产具有注册设计层的安全元件的方法

    公开(公告)号：US09248689B2

    公开(公告)日：2016-02-02

    申请号：US13055515

    申请日：2009-08-04

    申请人： Winfried Hoffmuller ,  Patrick Renner ,  Manfred Heim ,  Theodor Burchard

    发明人： Winfried Hoffmuller ,  Patrick Renner ,  Manfred Heim ,  Theodor Burchard

    IPC分类号： B42D25/43 ,  B42D25/324 ,  B42D25/445 ,  B42D25/29 ,  B42D25/328 ,  B42D25/47

    CPC分类号： B42D25/43 ,  B32B2425/00 ,  B42D25/29 ,  B42D25/324 ,  B42D25/328 ,  B42D25/445 ,  B42D25/47 ,  B42D2033/18 ,  B42D2035/16 ,  B42D2035/36 ,  Y10T156/17

    摘要： The present invention relates to a method for producing a security element (1), to a security element (1) obtainable by the method according to the invention, to transfer materials having the security elements according to the invention, and to objects of value secured with the security elements according to the invention. The security element (1) according to the invention has two functional layers (12, 22) which are bonded together by means of a resist layer (30). The resist layer (30) has a pattern which is employed to generate a congruent pattern in the first functional layer (12). Then the pattern of the resist layer (30), and thus also of the first functional layer (12), is exactly reproduced in the second functional layer (22). This is achieved by bonding the second functional layer (22) in the form of the pattern of the resist layer (30). The non-bonded areas of the second functional layer (22) are removed, thereby forming negative writing.

    摘要翻译： 本发明涉及一种用于生产安全元件（1）的方法，通过根据本发明的方法可获得的安全元件（1），用于将具有根据本发明的安全元件的材料转移到具有价值的物体上 与根据本发明的安全元件。 根据本发明的安全元件（1）具有通过抗蚀剂层（30）结合在一起的两个功能层（12,22）。 抗蚀剂层（30）具有用于在第一功能层（12）中产生全等图案的图案。 那么抗蚀剂层（30）的图案也因此也是第一功能层（12）的图案在第二功能层（22）中精确地再现。 这通过以抗蚀剂层（30）的图案的形式接合第二功能层（22）来实现。 除去第二功能层（22）的非接合区域，从而形成负写入。

    Method for producing a microstructure on a carrier
    7.
    发明授权
    Method for producing a microstructure on a carrier 有权
    在载体上生产微结构的方法

    公开(公告)号：US08964296B2

    公开(公告)日：2015-02-24

    申请号：US13696479

    申请日：2011-05-05

    申请人： Winfried Hoffmuller ,  Theodor Burchard ,  Michael Rahm ,  Josef Schinabeck ,  Manfred Heim ,  Andreas Rauch ,  Christian Fuhse

    发明人： Winfried Hoffmuller ,  Theodor Burchard ,  Michael Rahm ,  Josef Schinabeck ,  Manfred Heim ,  Andreas Rauch ,  Christian Fuhse

    IPC分类号： G02B27/10

    CPC分类号： B32B38/10 ,  B42D25/21 ,  B42D25/29 ,  B42D25/324 ,  B42D25/328 ,  B42D25/342 ,  B42D25/425 ,  B42D25/47 ,  B42D2035/44 ,  B44C1/1737

    摘要： A method for producing a microstructure on a carrier by: (a) manufacturing a donor foil by forming an embossed structure with elevations and depressions in a first foil material and applying a transfer layer to the embossed structure, (b) manufacturing an acceptor foil by applying an adhesive layer to a second foil material, (c) laminating the donor foil and the acceptor foil by means of the adhesive layer, the transfer layer on the elevations of the embossed structure bonding to the adhesive layer, and (d) transferring the bonded regions of the transfer layer to the acceptor foil by separating the donor foil and the acceptor foil from each other, thereby forming in the acceptor foil a first microstructure from the transferred regions of the transfer layer, and/or forming in the donor foil a second microstructure complementary to the first microstructure.

    摘要翻译： 一种通过以下步骤制造载体上的显微组织的方法：（a）通过在第一箔材料中形成具有凸起和凹陷的压花结构并在压花结构上施加转印层来制造供体箔，（b）通过 将粘合剂层施加到第二箔材料上，（c）通过粘合剂层层叠施主箔和受主箔，将压印结构的高度上的转印层粘合到粘合剂层上，以及（d） 通过将施主箔和受主箔彼此分离，从而在受主箔中形成来自转移层的转移区域的第一微结构和/或在供体箔a中形成的转移层的接合区域 第二微结构与第一微结构互补。

    METHOD FOR PRODUCING A MICROSTRUCTURE ON A CARRIER
    8.
    发明申请
    METHOD FOR PRODUCING A MICROSTRUCTURE ON A CARRIER 有权
    在载体上生产微结构的方法

    公开(公告)号：US20130063826A1

    公开(公告)日：2013-03-14

    申请号：US13696479

    申请日：2011-05-05

    申请人： Winfried Hoffmuller ,  Theodor Burchard ,  Michael Rahm ,  Josef Schinabeck ,  Manfred Heim ,  Andreas Rauch ,  Christian Fuhse

    发明人： Winfried Hoffmuller ,  Theodor Burchard ,  Michael Rahm ,  Josef Schinabeck ,  Manfred Heim ,  Andreas Rauch ,  Christian Fuhse

    IPC分类号： B32B38/10 ,  B42D15/00

    CPC分类号： B32B38/10 ,  B42D25/21 ,  B42D25/29 ,  B42D25/324 ,  B42D25/328 ,  B42D25/342 ,  B42D25/425 ,  B42D25/47 ,  B42D2035/44 ,  B44C1/1737

    摘要： A method for producing a microstructure on a carrier by: (a) manufacturing a donor foil by forming an embossed structure with elevations and depressions in a first foil material and applying a transfer layer to the embossed structure, (b) manufacturing an acceptor foil by applying an adhesive layer to a second foil material, (c) laminating the donor foil and the acceptor foil by means of the adhesive layer, the transfer layer on the elevations of the embossed structure bonding to the adhesive layer, and (d) transferring the bonded regions of the transfer layer to the acceptor foil by separating the donor foil and the acceptor foil from each other, thereby forming in the acceptor foil a first microstructure from the transferred regions of the transfer layer, and/or forming in the donor foil a second microstructure complementary to the first microstructure.

    摘要翻译： 一种通过以下步骤制造载体上的显微组织的方法：（a）通过在第一箔材料中形成具有凸起和凹陷的压花结构并在压花结构上施加转印层来制造供体箔，（b）通过 将粘合剂层施加到第二箔材料上，（c）通过粘合剂层层叠施主箔和受主箔，将压印结构的高度上的转印层粘合到粘合剂层上，以及（d） 通过将施主箔和受主箔彼此分离，从而在受主箔中形成来自转移层的转移区域的第一微结构和/或在供体箔a中形成的转移层的接合区域 第二微结构与第一微结构互补。

    METHOD FOR THE PRODUCTION OF SECURITY ELEMENTS HAVING MUTUALLY REGISTERED DESIGNS
    10.
    发明申请
    METHOD FOR THE PRODUCTION OF SECURITY ELEMENTS HAVING MUTUALLY REGISTERED DESIGNS 有权
    用于生产具有注册设计的安全元件的方法

    公开(公告)号：US20110127762A1

    公开(公告)日：2011-06-02

    申请号：US13055508

    申请日：2009-08-04

    申请人： Winfried Hoffmuller ,  Patrick Renner ,  Manfred Heim

    发明人： Winfried Hoffmuller ,  Patrick Renner ,  Manfred Heim

    IPC分类号： B42D15/00 ,  B32B38/10 ,  B32B38/06 ,  B32B37/02

    CPC分类号： B42D25/47 ,  B42D25/21 ,  B42D25/324 ,  B42D25/328 ,  B42D25/351 ,  B42D25/355 ,  B42D25/373 ,  B42D25/425 ,  B42D25/445 ,  B42D25/455 ,  B42D2035/08 ,  B42D2035/24 ,  B44C1/1704 ,  Y10T156/1039

    摘要： The present invention relates to a method for producing a security element (1), to a security element (1) obtainable by the method according to the invention, to transfer materials having the security elements according to the invention, and to objects of value secured by the security elements according to the invention. The security element (1) according to the invention has at least two functional layers (12, 22), whereby each functional layer forms a motif and the motifs are either congruent, or one motif represents a photographic negative of the other motif. In the method according to the invention, the motif of one functional layer (12) is transferred into the other functional layer (22) with the help of an adhesive layer (30). In so doing, there is reproduced in the adhesive layer an exact image of the motif of the first functional layer, and said image of the motif in the adhesive layer is in turn employed for reproducing an exact image of said motif or of its photographic negative in the second functional layer. The transfer of the motif from one functional layer into the other is achieved by the adhesive having areas of varying adhesive strength, induced by irradiation through the first functional layer, and bonding to the second functional layer only in the strongly adhesive areas. The non-bonded areas of the functional layer are removed.

    摘要翻译： 本发明涉及一种用于生产安全元件（1）的方法，通过根据本发明的方法可获得的安全元件（1），用于将具有根据本发明的安全元件的材料转移到具有价值的物体上 通过根据本发明的安全元件。 根据本发明的安全元件（1）具有至少两个功能层（12,22），由此每个功能层形成图案，并且图案是一致的，或者一个图案表示另一图案的照相底片。 在根据本发明的方法中，借助于粘合剂层（30）将一个功能层（12）的图案转移到另一功能层（22）中。 在这样做时，在粘合剂层中再现了第一功能层的图案的精确图像，并且粘合剂层中的图案的图像又被用于再现所述图案的精确图像或其照相底片 在第二功能层。 通过具有通过第一功能层的照射诱导的具有变化的粘合强度的区域的粘合剂和仅在强粘合区域中与第二功能层接合来实现将图案从一个功能层转移到另一个功能层中的粘合剂。 除去功能层的非粘合区域。