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公开(公告)号：US08771918B2
公开(公告)日：2014-07-08
申请号：US13378025
申请日：2010-06-03
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A positive-working lithographic printing plate precursor is disclosed which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer a heat and/or light-sensitive coating including an infrared absorbing agent and a compound including a benzoxazine group.
摘要翻译： 公开了一种正性平版印刷版原版，其包括在具有亲水表面的支持体上，或者设置有亲水层，包含红外吸收剂和包含苯并恶嗪基团的化合物的热和/或感光涂层。
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公开(公告)号：US20120088191A1
公开(公告)日：2012-04-12
申请号：US13378025
申请日：2010-06-03
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A positive-working lithographic printing plate precursor is disclosed which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer a heat and/or light-sensitive coating including an infrared absorbing agent and a compound including a benzoxazine group.
摘要翻译： 公开了一种正性平版印刷版原版，其包括在具有亲水表面的支持体上，或者设置有亲水层，包含红外吸收剂和包含苯并恶嗪基团的化合物的热和/或感光涂层。
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公开(公告)号：US20100112476A1
公开(公告)日：2010-05-06
申请号：US12532227
申请日：2008-04-22
申请人： Johan Loccufier , Philippe Moriamé
发明人： Johan Loccufier , Philippe Moriamé
IPC分类号： G03F7/004
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A lithographic printing plate precursor is disclosed which comprises a support having a hydrophilic surface or which is provided with a hydrophilic layer, and a coating thereon, said coating comprising an IR absorbing agent and a contrast enhancing compound, characterized in that said contrast enhancing compound has the structure of formula (I). The printing plate comprising the contrast enhancing compound improves the thermoresponsivity of the coating and is capable of improving the resistance of the coating in the non-exposed areas against the alkaline developer.
摘要翻译： 公开了一种平版印刷版原版，其包括具有亲水性表面的或具有亲水层的载体及其上的涂层，所述涂层包含IR吸收剂和对比度增强化合物，其特征在于，所述对比度增强化合物具有 式（I）的结构。 包括对比度增强化合物的印版提高了涂层的热反应性，并且能够改善非暴露区域中的涂层对碱性显影剂的抵抗力。
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公开(公告)号：US08978554B2
公开(公告)日：2015-03-17
申请号：US13139964
申请日：2010-01-12
IPC分类号： B41M1/06 , B41C1/10 , G03F7/004 , C08F220/60 , C08F220/56 , C08F220/58
CPC分类号： C08F220/60 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08F220/56 , C08F220/58
摘要： An alkali soluble resin is disclosed comprising a first monomeric unit including at least one sulfonamide group and a second monomeric unit derived from the monomer according to the following structure (I) wherein R1 represents a structural moiety comprising an ethylenically unsaturated polymerizable group; R2, R3 and R4 independently represent hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, alkaryl, aralkyl, aryl or heteroaryl group or, the necessary atoms to form a five to eight membered ring.
摘要翻译： 公开了包含至少一种磺酰胺基团的第一单体单元和根据以下结构（I）衍生自单体的第二单体单元的碱溶性树脂，其中R 1表示包含烯属不饱和可聚合基团的结构部分; R 2，R 3和R 4独立地表示氢，任选取代的烷基，烯基，炔基，烷芳基，芳烷基，芳基或杂芳基，或形成五至八元环的必要原子。
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公开(公告)号：US20110247516A1
公开(公告)日：2011-10-13
申请号：US13139964
申请日：2010-01-12
IPC分类号： G03F7/20 , C08F222/38 , G03F7/004 , C08F228/02
CPC分类号： C08F220/60 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08F220/56 , C08F220/58
摘要： An alkali soluble resin is disclosed comprising a first monomeric unit including at least one sulfonamide group and a second monomeric unit derived from the monomer according to the following structure (I) wherein R1 represents a structural moiety comprising an ethylenically unsaturated polymerisable group; R2, R3 and R4 independently represent hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, alkaryl, aralkyl, aryl or heteroaryl group or, the necessary atoms to form a five to eight membered ring.
摘要翻译： 公开了一种碱溶性树脂，其包含包含至少一种磺酰胺基团的第一单体单元和根据以下结构（I）衍生自所述单体的第二单体单元，其中R 1表示包含烯属不饱和可聚合基团的结构部分; R 2，R 3和R 4独立地表示氢，任选取代的烷基，烯基，炔基，烷芳基，芳烷基，芳基或杂芳基，或形成五至八元环的必要原子。
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