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公开(公告)号:US20150344824A1
公开(公告)日:2015-12-03
申请号:US14809650
申请日:2015-07-27
Applicant: Xeros Limited
Inventor: Stephen Martin BURKINSHAW , Stephen Derek JENKINS , Alan John WADDON
CPC classification number: C11D3/48 , A01N31/16 , A01N59/16 , C11D3/12 , C11D3/128 , C11D3/37 , C11D3/3715 , C11D3/3719 , C11D3/3726 , C11D3/3749 , C11D11/0011 , C11D11/0017 , A01N2300/00 , A01N25/10 , A01N25/34
Abstract: The invention provides a method and formulation for cleaning a soiled substrate, the method comprising the treatment of the moistened substrate with a formulation comprising a multiplicity of polymeric particles, wherein the polymeric particles comprise at least one antimicrobial agent. Preferably, the substrate is wetted so as to achieve a substrate to water ratio of between 1:0.1 to 1:5 w/w. Optionally, the formulation additionally comprises at least one additional cleaning agent, and in this embodiment, it is preferred that the polymeric particles are mixed with the at least one additional cleaning agent. Preferably, the additional cleaning material comprises a surfactant, which most preferably has detergent properties. Most preferably, the substrate comprises a textile fibre. Typically, the polymeric particles comprise particles of polyester or nylon, most preferably in the form of beads. The results obtained are very line with those observed when carrying out conventional aqueous cleaning processes and the method provides the significant advantage that the use of antimicrobial agents in or on the polymer bead greatly improves the overall hygiene in the washing machine by preventing mould and bacterial growth on the polymer particle surfaces, particularly at low temperatures.
Abstract translation: 本发明提供了一种用于清洁污染的基质的方法和制剂,该方法包括用包含多种聚合物颗粒的制剂处理湿润的底物,其中聚合物颗粒包含至少一种抗微生物剂。 优选地,将基底润湿以达到1:0.1至1:5 w / w的基底与水的比例。 任选地,制剂另外包含至少一种另外的清洁剂,并且在该实施方案中,优选将聚合物颗粒与至少一种另外的清洁剂混合。 优选地,附加清洁材料包括表面活性剂,其最优选具有洗涤剂性质。 最优选地,基底包括纺织纤维。 通常,聚合物颗粒包括聚酯或尼龙的颗粒,最优选以珠粒的形式。 获得的结果与进行常规水性清洁方法时观察到的结果非常一致,并且该方法提供了显着的优点,即在聚合物珠粒中或聚合物珠粒上使用抗微生物剂通过防止霉菌和细菌生长大大地改善了洗衣机中的整体卫生 在聚合物颗粒表面上,特别是在低温下。
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公开(公告)号:US20150128358A1
公开(公告)日:2015-05-14
申请号:US14537314
申请日:2014-11-10
Applicant: Xeros Limited
Inventor: Simon Paul WELLS , Michael SAWFORD , Wayne Robert SZYMCZYK , Elizabeth Jean ABERCROMBIE , Stephen Derek JENKINS
CPC classification number: D06F35/005 , D06F33/02 , D06F35/006 , D06F39/026 , D06F39/088
Abstract: A method for cleaning at least one soiled substrate in a rotatably mounted cylindrical drum of a cleaning apparatus with a multiplicity of solid particles comprising the steps of: a) agitating said at least one soiled substrate in said drum with wash liquor and said multiplicity of solid particles for a first cleaning cycle wherein said wash liquor comprises at least one cleaning agent; b) draining said wash liquor from said cleaning apparatus; and c) introducing an aqueous non-detergent medium into said cleaning apparatus and agitating said at least one soiled substrate with said multiplicity of solid particles in said drum for a second cleaning cycle. The invention further discloses a method for cleaning at least one soiled substrate in a rotatably mounted drum of a cleaning apparatus, the method comprising rotating the drum such that said at least one soiled substrate moves about a generally circular path and introducing a multiplicity of solid particles into the drum as said drum rotates wherein said multiplicity of solid particles are introduced through an annulus defined by the generally circular path. Apparatus configured for carrying out the methods are also disclosed.
Abstract translation: 一种用于清洁具有多种固体颗粒的清洁装置的可旋转安装的圆柱形滚筒中的至少一个污染的基底的方法,包括以下步骤:a)用洗涤液和所述多个固体搅拌所述滚筒中的所述至少一个污染的基底 用于第一清洁循环的颗粒,其中所述洗涤液包含至少一种清洁剂; b)从所述清洁设备中排出所述洗涤液; 和c)将水性非洗涤剂介质引入所述清洁设备中,并且在所述滚筒中用所述多个固体颗粒搅拌所述至少一个污染的基底用于第二清洁循环。 本发明还公开了一种用于清洁清洁装置的可旋转地安装的滚筒中的至少一个污染的基底的方法,所述方法包括使所述滚筒旋转,使得所述至少一个污染的基底围绕大致圆形路径移动并且引入多个固体颗粒 当所述滚筒旋转时,所述滚筒进入滚筒,其中所述多个固体颗粒通过由通常圆形路径限定的环带引入。 还公开了用于执行方法的装置。
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公开(公告)号:US20230323416A1
公开(公告)日:2023-10-12
申请号:US18023229
申请日:2021-08-25
Applicant: Xeros Limited
Inventor: Lars Frederik Paul SERVIN , Richard Elliot PALMER-LILLEY , Elizabeth Jean ABERCROMBIE , Stephen Derek JENKINS
CPC classification number: C12P19/04 , C12P19/02 , C12M45/02 , C12M21/18 , C12N9/2437 , C12Y302/01004
Abstract: A process and apparatus for the enzymatic degradation of a cellulosic substrate is disclosed. The process comprises agitating a composition with milling particles, wherein the milling particles are or comprise a lignocellulosic material and wherein the composition comprises: a. the cellulosic substrate; b. a cellulase enzyme; and c. a liquid medium.
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公开(公告)号:US20180216049A1
公开(公告)日:2018-08-02
申请号:US15748234
申请日:2016-07-28
Applicant: Xeros Limited
Inventor: Robert Andrew BIRD , Stephen Derek JENKINS , Philipp KLOKE , Simon KNIESEL , Shyam SATHYANARAYANA , Martina SCHOEMER
CPC classification number: C11D11/0017 , C11D1/22 , C11D3/0021 , C11D3/14 , C11D3/3707 , C11D3/3719 , D06B3/30 , D06F35/00
Abstract: A method for cleaning a substrate which is or comprises a textile, the method comprising agitating the substrate and a cleaning composition comprising: i. cleaning particles comprising a thermoplastic polyamide and a hydrophilic material at least part of which is located inside the cleaning particle, said cleaning particles having an average particle size of from 1 to 100 mm; and ii. a liquid medium. An apparatus suitable for performing said method comprising a rotatable cleaning chamber and a particle storage tank containing the cleaning particles. Use of the cleaning particles for cleaning a substrate which is or comprises a textile.
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公开(公告)号:US20180057777A1
公开(公告)日:2018-03-01
申请号:US15789147
申请日:2017-10-20
Applicant: Xeros Limited
Inventor: Alan John WADDON , Robert Andrew BIRD , Stephen Derek JENKINS
IPC: C11D17/06 , C11D11/00 , C11D3/37 , C11D3/00 , C11D3/22 , C11D3/48 , D06F35/00 , C11D17/04 , C11D17/00
CPC classification number: C11D17/06 , C11D3/0021 , C11D3/0036 , C11D3/227 , C11D3/37 , C11D3/3753 , C11D3/3776 , C11D3/48 , C11D11/0017 , C11D11/0023 , C11D17/0017 , C11D17/04 , D06F35/00
Abstract: The invention provides a formulation and method for the treatment of a substrate, the method comprising the treatment of the substrate with the formulation, the formulation comprising a multiplicity of solid cleaning particles and a multiplicity of dosing particles, wherein the dosing particles comprise at least one host material and at least one releasable material, wherein the host material comprises at least one partially or completely water soluble polymeric material and the at least one releasable material comprises at least one cleaning or post-cleaning agent or other treatment additive for the treatment of the substrate. The method and formulation are advantageously applied to the cleaning of textile fabrics.
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