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    Apparatus and process for delivering an abrasive suspension for the mechanical polishing of a substrate
    2.
    发明授权
    Apparatus and process for delivering an abrasive suspension for the mechanical polishing of a substrate 有权
    用于输送用于基材的机械抛光的研磨悬浮液的装置和方法

    公开(公告)号：US6125876A

    公开(公告)日：2000-10-03

    申请号：US223497

    申请日：1998-12-29

    申请人： Thierry Laederich ,  Georges Guarneri ,  Herve Dulphy

    发明人： Thierry Laederich ,  Georges Guarneri ,  Herve Dulphy

    IPC分类号： B24B57/00 ,  B24B37/04 ,  B24B57/02 ,  E03B11/00

    CPC分类号： B24B57/02 ,  B24B37/04 ,  Y10T137/4673 ,  Y10T137/469 ,  Y10T137/4807

    摘要： An apparatus for delivering abrasive suspensions includes a reservoir containing an abrasive suspension, a loop for delivering the abrasive suspension to a point of use, the loop being connected to the reservoir, a pumping arrangement for circulating the abrasive suspension in the loop and for ensuring its return into the reservoir, the loop and the reservoir being arranged for recovering the abrasive suspension after circulation in the loop at a recovery point of the reservoir, and a control system for controlling the pumping arrangement so as to maintain a continuous circulation of the suspension.

    摘要翻译： 用于递送磨料悬浮液的装置包括含有研磨悬浮液的储存器，用于将研磨悬浮液输送到使用点的回路，所述回路连接到储存器，泵送装置，用于使研磨悬浮液在循环中循环并确保其 返回到储存器中，循环和储存器被布置用于在储存器的回收点处循环回收磨料悬浮液，以及用于控制泵送装置以控制悬浮液的连续循环的控制系统。

    System for diluting ultrapure chemicals which is intended for the microelectronics industry
    3.
    发明授权
    System for diluting ultrapure chemicals which is intended for the microelectronics industry 失效
    稀释用于微电子工业的超纯化学品系统

    公开(公告)号：US6146008A

    公开(公告)日：2000-11-14

    申请号：US57606

    申请日：1998-04-09

    申请人： Thierry Laederich ,  Herve Dulphy ,  Georges Guarneri

    发明人： Thierry Laederich ,  Herve Dulphy ,  Georges Guarneri

    IPC分类号： B01F3/08 ,  B01F15/04 ,  B01J19/00 ,  G05D11/02 ,  G05D11/13 ,  G05D21/00 ,  G05D21/02 ,  H01L21/304 ,  B01F15/02

    CPC分类号： G05D21/02 ,  B01J19/0006 ,  G05D11/138 ,  B01J2219/00186 ,  Y10T137/0329

    摘要： System for diluting an ultrapure concentrated chemical including: (i) a first tank which contains the chemical in concentrated form having a predetermined purity P, (ii) a supply of ultrapure water of purity at least equal to P, (iii) a second tank for mixing the concentrated chemical with the ultrapure water to obtain a solution of diluted chemical whose purity is at least equal to P, (iv) a structure for adjusting the titre of the solution of diluted, chemical to a desired final concentration. The structure for adjusting the titre includes (a) a structure for measuring the titre of the dilute solution after mixing a predetermined quantity of ultrapure water with concentrated chemical of purity P so as to obtain a mixture with a concentration of chemical which is greater than the desired final concentration of the diluted chemical, (b) a structure for adding an additional quantity of ultrapure water to the mixture to obtain a second further diluted mixture, this additional quantity being at most equal to a theoretical quantity necessary for obtaining the desired titre, and (c) a structure for stirring the second further diluted mixture for a time such that the diluted chemical is recirculated on itself at least approximately three times so as to ensure that the diluted chemical is well homogenized and that the titre is substantially constant over the entire volume of the diluted chemical, and (d) a structure for checking the titre of the solution of diluted chemical; and (v) a third tank for storing the chemical.

    摘要翻译： 用于稀释超纯浓缩化学品的系统，包括：（i）含有浓缩形式的具有预定纯度P的化学品的第一罐，（ii）提供至少等于P的纯度的超纯水，（iii）第二罐 用于将浓缩化学品与超纯水混合以获得纯度至少等于P的稀释化学品溶液，（iv）用于将稀释的化学溶液的滴定度调节至所需最终浓度的结构。 用于调整滴定度的结构包括（a）在将预定量的超纯水与浓缩的纯度为P的浓缩化学品混合后，测量稀释溶液的滴定度的结构，以获得化学浓度大于 稀释化学品的所需最终浓度，（b）用于向混合物中加入额外量的超纯水以获得第二另外稀释的混合物的结构，该附加量最多等于获得所需滴定度所需的理论量， 和（c）用于将第二进一步稀释的混合物搅拌一段时间的结构，使得稀释的化学品在其自身上再循环至少约三次，以确保稀释的化学品均匀，并且滴定度基本上恒定 稀释化学品的全部体积，（d）用于检查稀释化学品溶液滴定度的结构; 和（v）用于储存化学品的第三罐。