公开(公告)号：US20070217114A1

公开(公告)日：2007-09-20

申请号：US11668568

申请日：2007-01-30

申请人： Yasuharu Sasaki ,  Takehiro Ueda ,  Yusuke Nakagawa ,  Nobuyuki Nagayama ,  Taketoshi OKajo ,  Mamoru Kosakai

发明人： Yasuharu Sasaki ,  Takehiro Ueda ,  Yusuke Nakagawa ,  Nobuyuki Nagayama ,  Taketoshi OKajo ,  Mamoru Kosakai

IPC分类号： H01H47/00

CPC分类号： H01L21/6831 ,  C23C14/505 ,  C23C16/4581 ,  C23C16/4586 ,  H01L21/6875

摘要： The invention provides an electrostatic chuck capable of widening a temperature range when the temperature of a flat substrate is controlled and reducing a variation in thermal conductivity between the electrostatic chuck and the flat substrate over time. According to an aspect of the invention, an electrostatic chuck includes: a body that has an internal electrode for attracting a flat substrate by an electrostatic force provided therein; a plurality of protrusions that are formed on one surface of the body, serving as an electrostatic attraction surface; and one or more minute projections that are provided on each of top surfaces of some or all of the plurality of protrusions. In the electrostatic chuck, a region of the top surface of each of the minute projections on which the flat substrate is loaded is referred to as a mounting surface, and the total area of the mounting surfaces of the minute projections is equal to or larger than 0.01% and equal to or smaller than 2% of the area of the electrostatic attraction surface.

摘要翻译： 本发明提供了一种能够在平坦基板的温度被控制时能够扩大温度范围并且随着时间的推移减小静电卡盘和平坦基板之间的导热性变化的静电卡盘。 根据本发明的一个方面，静电卡盘包括：主体，其具有用于通过设置在其中的静电力来吸引平坦的基板的内部电极; 多个突起，其形成在所述主体的一个表面上，用作静电吸引表面; 以及设置在多个突起中的一些或全部的每个顶表面上的一个或多个微小突起。 在静电卡盘中，将安装有平坦基板的每个微小突起的上表面的区域称为安装面，微小突起的安装面的总面积等于或大于 0.01％且等于或小于静电吸引表面积的2％。

公开(公告)号：US20080098833A1

公开(公告)日：2008-05-01

申请号：US11925158

申请日：2007-10-26

申请人： Yasuharu Sasaki ,  Takehiro Ueda ,  Taketoshi Okajo ,  Kaoru Oohashi

发明人： Yasuharu Sasaki ,  Takehiro Ueda ,  Taketoshi Okajo ,  Kaoru Oohashi

IPC分类号： G01R31/02 ,  H01L21/683

CPC分类号： H01L21/67248 ,  H01L21/6831 ,  H01L21/68757

摘要： An apparatus evaluates a substrate mounting device adapted to hold a target substrate placed on a mounting surface and to control a temperature of the target substrate. The apparatus includes an evacuatable airtightly sealed chamber accommodating therein the substrate mounting device, a heat source, arranged in a facing relationship with the mounting surface, for irradiating infrared light. The apparatus further includes an evaluation-purpose substrate adapted to be mounted on the mounting surface in place of the target substrate, the evaluation-purpose substrate being made of an infrared light absorbing material, and having a unit for measuring temperatures at plural sites on a surface and/or inside of the substrate.

摘要翻译： 一种装置评价适于保持放置在安装表面上的目标基板并控制目标基板的温度的基板安装装置。 该装置包括可抽出的气密密封室，其容纳基板安装装置，以与安装表面相对的关系布置的用于照射红外光的热源。 该装置还包括适于安装在安装表面上以代替目标基板的评估用基板，评估用基板由红外光吸收材料制成，并且具有用于测量在多个位置上的温度的单元 表面和/或内部。

公开(公告)号：US07582491B2

公开(公告)日：2009-09-01

申请号：US11925190

申请日：2007-10-26

申请人： Yasuharu Sasaki ,  Taketoshi Okajo

发明人： Yasuharu Sasaki ,  Taketoshi Okajo

IPC分类号： H01L21/66

CPC分类号： H01L21/67248 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/6831

摘要： A method for diagnosing temporal deterioration of temperature controlling performance of an electrostatic chuck includes the steps of performing vacuum processing on the substrate wherein the substrate is adsorbed by the electrostatic chuck while a temperature control gas for controlling a temperature of the substrate is supplied between the substrate and the electrostatic chuck, and exposing, during the above step, a substrate absorbed by the electrostatic chuck to an atmosphere generated by using a processing recipe for diagnosis, detecting a temperature of the substrate. A pressure of the temperature control gas is controlled such that the detected temperature becomes a specific temperature, and the controlled pressure is stored in a storage unit. The method further includes a step of diagnosing the deterioration of the temperature controlling performance of the electrostatic chuck based on the pressure of the temperature control gas stored in the storage unit.

摘要翻译： 用于诊断静电卡盘的温度控制性能的时间劣化的方法包括以下步骤：在衬底上进行真空处理，其中衬底被静电吸盘吸附，而用于控制衬底温度的温度控制气体被提供在衬底 和静电卡盘，并且在上述步骤期间，将由静电卡盘吸收的基板暴露于通过使用用于诊断的处理配方产生的气氛，检测基板的温度。 控制温度控制气体的压力，使得检测到的温度成为特定温度，并将受控压力存储在存储单元中。 该方法还包括基于存储在存储单元中的温度控制气体的压力来诊断静电卡盘的温度控制性能的劣化的步骤。

公开(公告)号：US08573836B2

公开(公告)日：2013-11-05

申请号：US11925158

申请日：2007-10-26

申请人： Yasuharu Sasaki ,  Takehiro Ueda ,  Taketoshi Okajo ,  Kaoru Oohashi

发明人： Yasuharu Sasaki ,  Takehiro Ueda ,  Taketoshi Okajo ,  Kaoru Oohashi

IPC分类号： G01N17/00 ,  H01L21/00

CPC分类号： H01L21/67248 ,  H01L21/6831 ,  H01L21/68757

摘要： An apparatus evaluates a substrate mounting device adapted to hold a target substrate placed on a mounting surface and to control a temperature of the target substrate. The apparatus includes an evacuatable airtightly sealed chamber accommodating therein the substrate mounting device, a heat source, arranged in a facing relationship with the mounting surface, for irradiating infrared light. The apparatus further includes an evaluation-purpose substrate adapted to be mounted on the mounting surface in place of the target substrate, the evaluation-purpose substrate being made of an infrared light absorbing material, and having a unit for measuring temperatures at plural sites on a surface and/or inside of the substrate.

摘要翻译： 一种装置评价适于保持放置在安装表面上的目标基板并控制目标基板的温度的基板安装装置。 该装置包括可抽出的气密密封室，其容纳基板安装装置，以与安装表面相对的关系布置的用于照射红外光的热源。 该装置还包括适于安装在安装表面上以代替目标基板的评估用基板，评估用基板由红外光吸收材料制成，并且具有用于测量在多个位置上的温度的单元 表面和/或内部。

公开(公告)号：US07646581B2

公开(公告)日：2010-01-12

申请号：US11668568

申请日：2007-01-30

申请人： Yasuharu Sasaki ,  Takehiro Ueda ,  Yusuke Nakagawa ,  Nobuyuki Nagayama ,  Taketoshi Okajo ,  Mamoru Kosakai

发明人： Yasuharu Sasaki ,  Takehiro Ueda ,  Yusuke Nakagawa ,  Nobuyuki Nagayama ,  Taketoshi Okajo ,  Mamoru Kosakai

IPC分类号： H01L21/683

CPC分类号： H01L21/6831 ,  C23C14/505 ,  C23C16/4581 ,  C23C16/4586 ,  H01L21/6875

摘要： An electrostatic chuck capable of widening a temperature range and reducing a variation in thermal conductivity between the electrostatic chuck and the flat substrate over time is provided. The chuck includes: a body that has an internal electrode for attracting a flat substrate by an electrostatic force provided therein, a plurality of protrusions formed on one surface of the body serving as an electrostatic attraction surface, and projections provided on the top surfaces of some or all of the plurality of protrusions. In the electrostatic chuck, a region of the top surface of each of the minute projections on which the flat substrate is loaded is referred to as a mounting surface, and the total area of the mounting surfaces of the minute projections is equal to or larger than 0.01% and equal to or smaller than 2% of the area of the electrostatic attraction surface.

摘要翻译： 提供了能够随时间扩大温度范围并减少静电卡盘与平板之间的导热性变化的静电卡盘。 卡盘包括：具有用于通过设置在其中的静电力吸引平坦基板的内部电极的主体，形成在作为静电吸引表面的主体的一个表面上的多个突起，以及设置在一些 或所有多个突起。 在静电卡盘中，将安装有平坦基板的每个微小突起的上表面的区域称为安装面，微小突起的安装面的总面积等于或大于 0.01％且等于或小于静电吸引表面积的2％。

公开(公告)号：US20080212640A1

公开(公告)日：2008-09-04

申请号：US12020317

申请日：2008-01-25

申请人： Yasuharu Sasaki ,  Takehiro Ueda ,  Taketoshi Okajo

发明人： Yasuharu Sasaki ,  Takehiro Ueda ,  Taketoshi Okajo

IPC分类号： G01K13/02

CPC分类号： G01K15/00 ,  G01K15/007 ,  H01L21/67109

摘要： A testing apparatus for a temperature monitoring substrate includes a heat flow generating unit for generating a heat flow in the temperature monitoring substrate in a depthwise direction of the temperature sensors, wherein the temperature sensors are buried in the depthwise direction. Further, a testing method for a temperature monitoring substrate includes generating a heat flow in the temperature monitoring substrate in a depthwise direction, wherein the temperature sensors are buried in the depthwise direction; processing a temperature of the substrate measured by the temperature sensor under the heat flow by a prescribed method; and determining whether or not an error occurs in the temperature sensor.

摘要翻译： 用于温度监测基板的测试装置包括：热量产生单元，用于在温度传感器的深度方向上产生温度监测基板中的热流，其中温度传感器沿深度方向埋设。 此外，温度监测基板的测试方法包括在温度监视基板中在深度方向上产生热流，其中温度传感器沿深度方向埋设; 通过规定的方法处理在热流下由温度传感器测量的基板的温度; 以及确定温度传感器中是否发生错误。

公开(公告)号：US09017786B2

公开(公告)日：2015-04-28

申请号：US13572044

申请日：2012-08-10

申请人： Ken Yoshioka ,  Syuichi Takahashi ,  Yasuharu Sasaki

发明人： Ken Yoshioka ,  Syuichi Takahashi ,  Yasuharu Sasaki

IPC分类号： H01L21/687 ,  H01L21/683 ,  H01L21/67

CPC分类号： H01L21/6831 ,  H01L21/67132 ,  Y10T29/49746 ,  Y10T428/219 ,  Y10T428/24777 ,  Y10T428/24843 ,  Y10T428/249982 ,  Y10T428/249985

摘要： In a repairing method for an electrostatic chuck device in which at least an adhesive layer and an attracting layer are provided on a metal base, a side surface of an eroded adhesive layer is wound with a string-like adhesive and thermal compression is performed thereafter. A repairing apparatus for an electrostatic chuck device, which is used in the repairing method, includes a rotatable table for rotating the electrostatic chuck device and a bobbin for supplying the adhesive to the adhesive layer.

摘要翻译： 在金属基体上至少设有粘合剂层和吸附层的静电卡盘装置的修理方法中，用线状粘合剂卷绕被侵蚀的粘合剂层的侧面，此后进行热压缩。 用于修复方法的静电卡盘装置的修理装置包括用于旋转静电卡盘装置的旋转工作台和用于将粘合剂供给到粘合剂层的筒管。

公开(公告)号：US08950469B2

公开(公告)日：2015-02-10

申请号：US12902225

申请日：2010-10-12

申请人： Yasuharu Sasaki ,  Ryo Nonaka ,  Nobuyuki Nagayama

发明人： Yasuharu Sasaki ,  Ryo Nonaka ,  Nobuyuki Nagayama

IPC分类号： B31F1/00 ,  B44C1/175 ,  B29C65/00 ,  H01L21/67

CPC分类号： H01L21/67248 ,  H01L21/67109

摘要： A temperature control system includes a heat transfer medium supply configured to supply a first heat transfer medium of a first temperature into a heat transfer medium path; at least one heat transfer medium storage provided between the heat transfer medium path and the heat transfer medium supply and configured to store a second heat transfer medium of a second temperature higher than the first temperature; a heat transfer medium supply control device provided between the heat transfer medium supply and the heat transfer medium path and between the heat transfer medium storage and the heat transfer medium path and configured to stop a supply of the first heat transfer medium into the heat transfer medium path from the heat transfer medium supply and to supply the second heat transfer medium into the heat transfer medium path from the heat transfer medium storage when a heating unit generates heat.

摘要翻译： 温度控制系统包括：传热介质供给，其构造成将第一温度的第一传热介质供给到传热介质路径中; 设置在传热介质路径和传热介质之间的至少一个传热介质存储器供应并构造成存储第二温度高于第一温度的第二传热介质; 传热介质供给控制装置，设置在所述传热介质供给与所述传热介质路径之间，以及所述传热介质储存部和所述传热介质路径之间，并且被配置为停止向所述传热介质供给所述第一传热介质 并且当加热单元产生热量时，从传热介质储存器将第二传热介质供应到传热介质路径中。

公开(公告)号：US08252132B2

公开(公告)日：2012-08-28

申请号：US12686759

申请日：2010-01-13

申请人： Ken Yoshioka ,  Syuichi Takahashi ,  Yasuharu Sasaki

发明人： Ken Yoshioka ,  Syuichi Takahashi ,  Yasuharu Sasaki

IPC分类号： B32B37/00

CPC分类号： H01L21/6831 ,  H01L21/67132 ,  Y10T29/49746 ,  Y10T428/219 ,  Y10T428/24777 ,  Y10T428/24843 ,  Y10T428/249982 ,  Y10T428/249985

摘要： In a repairing method for an electrostatic chuck device in which at least an adhesive layer and an attracting layer are provided on a metal base, a side surface of an eroded adhesive layer is wound with a string-like adhesive and thermal compression is performed thereafter. A repairing apparatus for an electrostatic chuck device, which is used in the repairing method, includes a rotatable table for rotating the electrostatic chuck device and a bobbin for supplying the adhesive to the adhesive layer.

摘要翻译： 在金属基体上至少设有粘合剂层和吸附层的静电卡盘装置的修理方法中，用线状粘合剂卷绕被侵蚀的粘合剂层的侧面，此后进行热压缩。 用于修复方法的静电卡盘装置的修理装置包括用于旋转静电卡盘装置的旋转工作台和用于将粘合剂供给到粘合剂层的筒管。

公开(公告)号：US20110079367A1

公开(公告)日：2011-04-07

申请号：US12894598

申请日：2010-09-30

申请人： Yasuharu Sasaki

发明人： Yasuharu Sasaki

IPC分类号： F25B29/00

CPC分类号： H01L21/67109

摘要： There is provided a temperature control method for a substrate mounting table capable of increasing a temperature of a substrate rapidly and reducing a loss of thermal energy. In a susceptor 12 including therein a heater 14, a coolant path 15 and a coolant reservoir 16 and holding thereon a wafer W on which a plasma etching process is performed, a coolant flows through the inside of the coolant path 15 and the coolant reservoir 16, and a flow of the coolant is stopped in the coolant reservoir 16 when the heater 14 generates heat.

摘要翻译： 提供了能够快速提高基板的温度并减少热能损失的基板安装台的温度控制方法。 在其中包括加热器14，冷却剂通道15和冷却剂储存器16并且保持在其上执行等离子体蚀刻工艺的晶片W的基座12中，冷却剂流过冷却剂通道15和冷却剂储存器16的内部 并且当加热器14产生热量时，冷却剂的流动停止在冷却剂储存器16中。