Single crystal heat treatment method
    3.
    发明申请
    Single crystal heat treatment method 有权
    单晶热处理方法

    公开(公告)号:US20060266277A1

    公开(公告)日:2006-11-30

    申请号:US11374436

    申请日:2006-03-14

    CPC分类号: C30B31/08 C30B29/34

    摘要: A single crystal heat treatment method having a step of heating a single crystal of a specific cerium-doped silicate compound in an oxygen-poor atmosphere at a temperature T1 (units: ° C.) that satisfies the conditions represented by formula (3) below 800≦T1

    摘要翻译: 一种单晶热处理方法,其特征在于,在不饱和的氧气氛中,在温度T 1℃(单位:℃)下加热特定的铈掺杂的硅酸盐化合物的单晶, 由式(3)表示的条件<?in-line-formula description =“In-line Formulas”end =“lead”?> 800 <= T <1 <(T < (3)<?in-line-formula description =“In-line Formulas”end =“tail”?>(其中T m1(单位:°C))表示 单晶的熔点)。

    Single crystal heat treatment method

    公开(公告)号:US07531036B2

    公开(公告)日:2009-05-12

    申请号:US11374435

    申请日:2006-03-14

    IPC分类号: C30B15/14 C30B21/06

    摘要: The present invention provides a single crystal heat treatment method, having a step of heating a single crystal of a cerium-doped silicate compound represented by any of general formulas (1) to (4) below in an oxygen-containing atmosphere Y2−(x+y)LnxCeySiO5  (1) (wherein Ln represents at least one elemental species selected from a group consisting of elements belonging to the rare earth elements, x represents a numerical value from 0 to 2, and y represents a numerical value greater than 0 but less than or equal to 0.2) Gd2−(z+w)LnzCewSiO5  (2) (wherein Ln represents at least one elemental species selected from a group consisting of elements belonging to the rare earth elements, z represents a numerical value greater than 0 but less than or equal to 2, and w represents a numerical value greater than 0 but less than or equal to 0.2) Gd2-(p+q)LnpCeqSiO5  (3) (wherein Ln represents at least one elemental species selected from a group consisting of Dy, Ho, Er, Tm, Yb, Lu, Y and Sc, which are rare earth elements having an ionic radius smaller than Tb, p represents a numerical value greater than 0 but less than or equal to 2, and q represents a numerical value greater than 0 but less than or equal to 0.2) Gd2−(r+s)LurCesSiO5  (4) (wherein r represents a numerical value greater than 0 but less than or equal to 2, and s represents a numerical value greater than 0 but less than or equal to 0.2).

    Single crystal heat treatment method

    公开(公告)号:US20060266276A1

    公开(公告)日:2006-11-30

    申请号:US11374435

    申请日:2006-03-14

    摘要: The present invention provides a single crystal heat treatment method, having a step of heating a single crystal of a cerium-doped silicate compound represented by any of general formulas (1) to (4) below in an oxygen-containing atmosphere Y2-(x+y)LnxCeySiO5  (1) (wherein Ln represents at least one elemental species selected from a group consisting of elements belonging to the rare earth elements, x represents a numerical value from 0 to 2, and y represents a numerical value greater than 0 but less than or equal to 0.2) Gd2-(z+w)LnzCewSiO5  (2) (wherein Ln represents at least one elemental species selected from a group consisting of elements belonging to the rare earth elements, z represents a numerical value greater than 0 but less than or equal to 2, and w represents a numerical value greater than 0 but less than or equal to 0.2) Gd2-(p+q)LnpCeqSiO5  (3) (wherein Ln represents at least one elemental species selected from a group consisting of Dy, Ho, Er, Tm, Yb, Lu, Y and Sc, which are rare earth elements having an ionic radius smaller than Tb, p represents a numerical value greater than 0 but less than or equal to 2, and q represents a numerical value greater than 0 but less than or equal to 0.2) Gd2-(r+s)LurCesSiO5  (4) (wherein r represents a numerical value greater than 0 but less than or equal to 2, and s represents a numerical value greater than 0 but less than or equal to 0.2).