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公开(公告)号：US5483311A
公开(公告)日：1996-01-09
申请号：US249988
申请日：1994-05-27
CPC分类号： G03F7/70883 , G03F7/70241 , G03F7/70333 , G03F7/70358 , G03F7/7055 , G03F7/70725 , G03F7/70858
摘要： In a projection exposure apparatus wherein a stage is moved in the direction of optic axis when a mask formed with a predetermined pattern is projected by a shutter onto a photosensitive substrate placed on the stage through a projection optical system, the operations of control means for the shutter and control means for the stage are interlocked with each other on the basis of the operational characteristic of the shutter and the operational characteristics (particularly the speed characteristic) of the stage so that the distribution of the existence probability with respect to movement of the photosensitive substrate from the opening operation starting point of time till the closing operation completing point of time of the shutter, with respect to the direction of the optic axis, may assume substantially equal maximum values at at least two locations in the direction of the optic axis.
摘要翻译： 在投影曝光装置中，当通过投影光学系统将形成有预定图案的掩模通过快门投影到放置在平台上的感光基板上时，台沿光轴方向移动的投影曝光装置中， 基于快门的操作特性和舞台的操作特性（特别是速度特性），舞台的快门和控制装置彼此互锁，使得相对于感光体的移动的存在概率的分布 基板从打开操作开始时间到关闭操作完成时间点相对于光轴的方向可以在光轴方向上的至少两个位置处呈现基本相等的最大值。
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公开(公告)号：US5343270A
公开(公告)日：1994-08-30
申请号：US986630
申请日：1992-12-07
CPC分类号： G03F7/70883 , G03F7/70241 , G03F7/70333 , G03F7/70358 , G03F7/7055 , G03F7/70725 , G03F7/70858
摘要： In a projection exposure apparatus wherein a stage is moved in the direction of optic axis when a mask formed with a predetermined pattern is projected by a shutter onto a photosensitive substrate placed on the stage through a projection optical system, the operations of control means for the shutter and control means for the stage are interlocked with each other on the basis of the operational characteristic of the shutter and the operational characteristics (particularly the speed characteristic) of the stage so that the distribution of the existence probability with respect to movement of the photosensitive substrate from the opening operation starting point of time till the closing operation completing point of time of the shutter, with respect to the direction of the optic axis, may assume substantially equal maximum values at at least two locations in the direction of the optic axis.
摘要翻译： 在投影曝光装置中，当通过投影光学系统将形成有预定图案的掩模通过快门投影到放置在平台上的感光基板上时，台沿光轴方向移动的投影曝光装置中， 基于快门的操作特性和舞台的操作特性（特别是速度特性），舞台的快门和控制装置彼此互锁，使得相对于感光体的移动的存在概率的分布 基板从打开操作开始时间到关闭操作完成时间点相对于光轴的方向可以在光轴方向上的至少两个位置处呈现基本相等的最大值。
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3.发明授权Encoder that optically detects positional information of a moving body from different optical paths lengths 有权从不同的光路长度光学地检测移动体的位置信息的编码器公开(公告)号：US08710425B2
公开(公告)日：2014-04-29
申请号：US13090659
申请日：2011-04-20
IPC分类号： G01D5/34
CPC分类号： G01D5/38 , G01D5/34746
摘要： An encoder emits modulated light from a light source section and lets a first light and a second light separated from the modulated light interfere with each other in a moving grating. In the encoder, the light emitted from the light source section is electrically modulated, and the first light and the second light have different light path lengths.
摘要翻译： 编码器发射来自光源部分的调制光，并使得与调制光分离的第一光和第二光在移动光栅中相互干扰。 在编码器中，从光源部发射的光被电调制，第一光和第二光具有不同的光路长度。
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4.发明授权Position measuring system and position measuring method, Movable body apparatus, movable body drive method, exposure apparatus and exposure method, pattern forming apparatus, and device manufacturing method 有权位置测量系统和位置测量方法，移动体装置，移动体驱动方法，曝光装置和曝光方法，图案形成装置和装置制造方法公开(公告)号：US08208128B2
公开(公告)日：2012-06-26
申请号：US12366934
申请日：2009-02-06
申请人： Susumu Makinouchi
发明人： Susumu Makinouchi
CPC分类号： G01D5/34746 , G01D5/38 , G03F7/70725 , G03F7/70775 , G03F7/7085
摘要： A mirror block on which moving gratings are arranged is fixed to the lower surface of a stage. Fixed gratings are placed on the upper surface of a stage platform that is opposed to the lower surface of the stage. A Y encoder that measures Y positional information of the stage is configured including the moving gratings and the fixed gratings. Similarly, an X encoder that measures X positional information of the stage is configured including the moving gratings and the fixed grating.
摘要翻译： 安置有移动光栅的镜块固定在舞台的下表面。 固定光栅放置在与平台的下表面相对的平台平台的上表面上。 测量台的Y位置信息的Y编码器被配置为包括移动光栅和固定光栅。 类似地，测量台阶X的位置信息的X编码器被配置成包括移动光栅和固定光栅。
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公开(公告)号：US07601947B2
公开(公告)日：2009-10-13
申请号：US11798255
申请日：2007-05-11
申请人： Susumu Makinouchi , Toru Imai , Akihiro Watanabe
发明人： Susumu Makinouchi , Toru Imai , Akihiro Watanabe
IPC分类号： G01B9/02
CPC分类号： G01D5/38
摘要： When an incident light is obliquely incident on an index scale, the optical path length of light A becomes longer than the optical path length of light B and an optical path length difference occurs, which causes a phase difference in both of the diffracted lights incident on a photodetection element. According to the phase difference, intensity of a photoelectric detection signal output from the photodetection element changes. That is, due to a periodic change in the incident angle of the incident light, the phase difference between light A and light B is modulated, and the interference signal becomes greatly modulated.
摘要翻译： 当入射光倾斜地入射到指数刻度上时，光A的光程长度比光B的光路长度长，并且产生光程长度差，导致两个衍射光入射的相位差 光电检测元件。 根据相位差，从光检测元件输出的光电检测信号的强度变化。 也就是说，由于入射光的入射角度的周期性变化，光A和光B之间的相位差被调制，并且干扰信号变得很大地被调制。
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6.发明申请公开(公告)号：US20070236854A1
公开(公告)日：2007-10-11
申请号：US11279296
申请日：2006-04-11
申请人： Martin Lee , Bausan Yuan , Susumu Makinouchi
发明人： Martin Lee , Bausan Yuan , Susumu Makinouchi
IPC分类号： H01H47/00
CPC分类号： G03F7/709 , G03F7/70716
摘要： Methods and apparatus for supporting the weight of a first stage of a stage apparatus using magnets are disclosed. According to one aspect of the present invention, and apparatus includes a first structure, a second structure, and an anti-gravity device. The anti-gravity device has a first magnet and a piston arrangement that includes a second magnet. The first magnet is coupled to the first structure, and the piston arrangement is movably interfaced with the second structure through an air bearing. The first magnet and the piston arrangement cooperate to support the first structure over the second structure relative to a vertical axis.
摘要翻译： 公开了一种用于支撑使用磁体的平台装置的第一级的重量的方法和装置。 根据本发明的一个方面，并且装置包括第一结构，第二结构和反重力装置。 反重力装置具有包括第二磁体的第一磁体和活塞装置。 第一磁体联接到第一结构，并且活塞装置通过空气轴承与第二结构可移动地接合。 第一磁体和活塞装置配合以相对于垂直轴线支撑第二结构的第一结构。
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7.发明申请Feedforward control with reduced learning time for lithographic system to improve throughput and accuracy 审中-公开前馈控制，减少光刻系统的学习时间，提高产量和精度公开(公告)号：US20050231706A1
公开(公告)日：2005-10-20
申请号：US10825022
申请日：2004-04-14
CPC分类号： G03F7/70725
摘要： Embodiments of the present invention are directed to a control system and method for controlling the trajectory and alignment of one or more stages by incorporating a grouping method in the control methodology. In one embodiment, a method of controlling movement of one or more stages of a precision assembly to process a substrate having a plurality of process regions comprises dividing the substrate into blocks according to one or more preset criteria, each block of the substrate including one or more process regions; generating learning data for one or more representative process regions for each block of the substrate; and using the generated learning data of the one or more representative process regions of each block to control movement of the one or more stages to process the block of one or more process regions of the substrate.
摘要翻译： 本发明的实施例涉及一种用于通过在控制方法中并入分组方法来控制一个或多个阶段的轨迹和对准的控制系统和方法。 在一个实施例中，一种控制精密组件的一个或多个阶段的运动以处理具有多个工艺区域的衬底的方法包括根据一个或多个预设标准将衬底划分成块，衬底的每个块包括一个或多个 更多的工艺区域; 为所述基板的每个块生成用于一个或多个代表性处理区域的学习数据; 以及使用所生成的每个块的一个或多个代表性处理区域的学习数据来控制所述一个或多个阶段的移动以处理所述衬底的一个或多个处理区域的块。
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公开(公告)号：US5907392A
公开(公告)日：1999-05-25
申请号：US682992
申请日：1996-07-18
申请人： Susumu Makinouchi
发明人： Susumu Makinouchi
CPC分类号： G03F7/70358 , G03B27/42 , G03F7/70725 , G03F7/70775
摘要： A scanning type exposure apparatus includes a mask stage position-measuring unite a substrate stage position-measuring unit, an arithmetic processing unit, and a control unit. The arithmetic processing unit multiplies results of measurement (WX, WY, W.theta.) by the substrate position-measuring unit by a conversion vector including components containing a magnification of a projection optical system and an angle of rotation between a mask and a substrate to determine a target vector quantity (RX*, RY*, R.theta.*) of a mask stage. An error vector is determined by subtracting, from the target vector quantity, results of measurement (RX, RY, R.theta.) by the mask stage position-measuring unit. The controller controls the mask stage so that the error vector becomes zero. The exposure apparatus includes correcting sections for correcting time lags in measurement by the respective position-measuring units. The arithmetic processing unit uses corrected positional information. The mask stage can accurately follow a substrate stage.
摘要翻译： 扫描型曝光装置包括掩模台位置测量，联合基板台位置测量单元，运算处理单元和控制单元。 算术处理单元通过包括投影光学系统的放大率和掩模与基板之间的旋转角度的分量的转换矢量将测量结果（WX，WY，Wθ）相乘，以确定 掩模台的目标矢量（RX *，RY *，Rθ*）。 通过从掩模台位置测量单元从目标矢量量中减去测量结果（RX，RY，Rθ）来确定误差向量。 控制器控制掩模级，使得误差向量变为零。 曝光装置包括用于通过各个位置测量单元来校正测量中的时间滞后的校正部分。 算术处理单元使用校正的位置信息。 掩模阶段可以准确地跟随衬底阶段。
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公开(公告)号：US4801977A
公开(公告)日：1989-01-31
申请号：US198688
申请日：1988-05-24
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70858 , G03F7/70883
摘要： A projection optical apparatus comprises a projection optical system for projecting the image of an object onto a substrate, data collecting means for obtaining data regarding a factor which causes a variation in the optical characteristic of the projection optical system, adjusting means for adjusting the relation between the substrate and the image of the object relative to the variation in the optical characteristic of the projection optical system, means for determining the amount of adjustment by the adjusting means in accordance with a model formula using a predetermined parameter on the basis of the data obtained by the data collecting means, means for independently measuring the variation in the optical characteristic of the projection optical system, and means for correcting the parameter of the model formula on the basis of the result measured by the measuring means.
摘要翻译： 投影光学装置包括用于将物体的图像投影到基板上的投影光学系统，用于获得关于引起投影光学系统的光学特性变化的因素的数据的数据收集装置，用于调整投影光学系统的光学特性之间的关系的调整装置 基板和物体相对于投影光学系统的光学特性的变化的图像，用于根据获得的数据使用预定参数根据模型公式确定调节装置的调整量的装置 通过数据采集装置，用于独立地测量投影光学系统的光学特性的变化的装置，以及用于基于由测量装置测量的结果来校正模型公式的参数的装置。
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公开(公告)号：US08395110B2
公开(公告)日：2013-03-12
申请号：US12726023
申请日：2010-03-17
申请人： Susumu Makinouchi
发明人： Susumu Makinouchi
IPC分类号： G01D5/34
CPC分类号： G01D5/34707 , G01B7/14 , G01D5/2451
摘要： An encoder apparatus comprises a first scale member with a scale region on which a scale is arranged; a detector that detects light from the scale region; and a retaining member with a retaining surface that is arranged so as to face a surface of the first scale member including the scale region via a predetermined gap, and that retains a liquid at least between the retaining surface and the first scale member.
摘要翻译： 编码器装置包括具有刻度区域的第一标尺部件，刻度尺布置在其上; 检测来自刻度区域的光的检测器; 以及具有保持面的保持构件，其被配置为经由预定间隙面对包括刻度区域的第一刻度尺的表面，并且至少在保持表面和第一刻度构件之间保持液体。
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