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公开(公告)号：US5483311A
公开(公告)日：1996-01-09
申请号：US249988
申请日：1994-05-27
CPC分类号： G03F7/70883 , G03F7/70241 , G03F7/70333 , G03F7/70358 , G03F7/7055 , G03F7/70725 , G03F7/70858
摘要： In a projection exposure apparatus wherein a stage is moved in the direction of optic axis when a mask formed with a predetermined pattern is projected by a shutter onto a photosensitive substrate placed on the stage through a projection optical system, the operations of control means for the shutter and control means for the stage are interlocked with each other on the basis of the operational characteristic of the shutter and the operational characteristics (particularly the speed characteristic) of the stage so that the distribution of the existence probability with respect to movement of the photosensitive substrate from the opening operation starting point of time till the closing operation completing point of time of the shutter, with respect to the direction of the optic axis, may assume substantially equal maximum values at at least two locations in the direction of the optic axis.
摘要翻译： 在投影曝光装置中，当通过投影光学系统将形成有预定图案的掩模通过快门投影到放置在平台上的感光基板上时，台沿光轴方向移动的投影曝光装置中， 基于快门的操作特性和舞台的操作特性（特别是速度特性），舞台的快门和控制装置彼此互锁，使得相对于感光体的移动的存在概率的分布 基板从打开操作开始时间到关闭操作完成时间点相对于光轴的方向可以在光轴方向上的至少两个位置处呈现基本相等的最大值。
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公开(公告)号：US5343270A
公开(公告)日：1994-08-30
申请号：US986630
申请日：1992-12-07
CPC分类号： G03F7/70883 , G03F7/70241 , G03F7/70333 , G03F7/70358 , G03F7/7055 , G03F7/70725 , G03F7/70858
摘要： In a projection exposure apparatus wherein a stage is moved in the direction of optic axis when a mask formed with a predetermined pattern is projected by a shutter onto a photosensitive substrate placed on the stage through a projection optical system, the operations of control means for the shutter and control means for the stage are interlocked with each other on the basis of the operational characteristic of the shutter and the operational characteristics (particularly the speed characteristic) of the stage so that the distribution of the existence probability with respect to movement of the photosensitive substrate from the opening operation starting point of time till the closing operation completing point of time of the shutter, with respect to the direction of the optic axis, may assume substantially equal maximum values at at least two locations in the direction of the optic axis.
摘要翻译： 在投影曝光装置中，当通过投影光学系统将形成有预定图案的掩模通过快门投影到放置在平台上的感光基板上时，台沿光轴方向移动的投影曝光装置中， 基于快门的操作特性和舞台的操作特性（特别是速度特性），舞台的快门和控制装置彼此互锁，使得相对于感光体的移动的存在概率的分布 基板从打开操作开始时间到关闭操作完成时间点相对于光轴的方向可以在光轴方向上的至少两个位置处呈现基本相等的最大值。
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公开(公告)号：US06356343B1
公开(公告)日：2002-03-12
申请号：US09366565
申请日：1999-08-04
申请人： Naomasa Shiraishi , Nobutaka Magome
发明人： Naomasa Shiraishi , Nobutaka Magome
IPC分类号： G03B2742
摘要： A mark for position detection formed on a substrate has a first pattern disposed near the center of the mark and having periodicity in a Y-axis direction, and second patterns respectively disposed near both sides of the first pattern in an X-axis direction and each having periodicity in the X-axis direction. The position of the first pattern is detected by aligning the detection center of a detecting optical system, that is, the minimal aberration point of the detecting optical system, with the center of the first pattern. The positions of the second patterns are detected at respective points symmetric with respect to the minimal aberration point, and the detected values for the positions of the second patterns are averaged. An apparatus for detecting the mark for position detection detects the first and second patterns by image processing when the mark is in a stationary state.
摘要翻译： 在基板上形成的用于位置检测的标记具有设置在标记中心附近并具有Y轴方向的周期性的第一图案，以及分别设置在X轴方向上的第一图案的两侧附近的第二图案， 具有X轴方向的周期性。 通过将检测光学系统的检测中心即检测光学系统的最小像差点与第一图案的中心对准来检测第一图案的位置。 在相对于最小像差点对称的各个点处检测第二图案的位置，并且对第二图案的位置的检测值进行平均。 用于检测位置检测标记的装置在标记处于静止状态时通过图像处理检测第一和第二图案。
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公开(公告)号：US5504596A
公开(公告)日：1996-04-02
申请号：US169055
申请日：1993-12-20
申请人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
发明人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
CPC分类号： G03F7/70558 , G03F7/70625 , G03H1/00
摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.
摘要翻译： 使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。 全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。 图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。 在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。 测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。 根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。
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公开(公告)号：US06538740B1
公开(公告)日：2003-03-25
申请号：US09635339
申请日：2000-08-09
申请人： Naomasa Shiraishi , Nobutaka Magome
发明人： Naomasa Shiraishi , Nobutaka Magome
IPC分类号： G01B1100
CPC分类号： G03F9/7088 , G03F7/70591 , G03F7/706 , G03F7/70633 , G03F9/70 , G03F9/7076 , G03F9/7084
摘要： An adjusting method capable of accurately forming a mark for measuring optical characteristics of an optical system, such as an alignment sensor of an exposure system to be used in manufacturing semiconductor devices or the like and correcting an aberration or the like of the optical system with a high precision. A first mark (DM1) having a recess pattern (31a) with a width a provided at a pitch P in a measuring direction and a second mark (DM2) having a recess pattern (32a) with a width c provided at a pitch P have been formed in the vicinity of each other on a wafer (11) for adjustment, and the duty ratio (=a/P) of the recess pattern (31a) of the first mark and the duty ratio (=c/P) of the recess pattern (32a) of the second mark are different. The distance of the images of the two marks (DM1, DM2) is measured, an error in this measured value with respect to a designed value is determined, and the detecting optical system is adjusted in such a way as to reduce this error.
摘要翻译： 一种能够精确地形成用于测量光学系统的光学特性的标记的调整方法，例如用于制造半导体器件等的曝光系统的对准传感器，并且用光学系统的像差等来校正光学系统的像差等 高精准度。 具有在测量方向上以间距P设置的宽度为a的凹槽图案（31a）和具有以节距P设置的具有宽度c的凹陷图案（32a）的第二标记（DM2）的第一标记（DM1） 在用于调节的晶片（11）上彼此附近形成第一标记的凹部图案（31a）的占空比（= a / P）和第一标记的占空比（= c / P） 第二标记的凹部图案（32a）不同。 测量两个标记（DM1，DM2）的图像的距离，确定该测量值相对于设计值的误差，并且以减少该误差的方式调整检测光学系统。
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6.发明授权
公开(公告)号：US06078380A
公开(公告)日：2000-06-20
申请号：US338535
申请日：1999-06-23
CPC分类号： G03F7/70091 , G03B27/68 , G03F7/70108 , G03F7/7025
摘要： In a projection exposure apparatus and method, the intensity distribution of illumination light for detecting an imaging characteristic of a projection optical system is set substantially equal to the intensity distribution of exposure illumination light. The intensity distribution of a secondary light source in an exposure illumination optical system is changed in accordance with a pattern of a mask. Magnification and aberration of the projection optical system are adjusted in accordance with the changed intensity distribution of the secondary light source. A substrate stage is moved along an optical axis of the projection optical system to compensate movement of the image plane of the projection optical system caused by a change in the intensity distribution of the secondary light source. An exposure operation is interrupted when a light amount distribution is changed. Exposure control is also responsive to thermal accumulation in the projection optical system.
摘要翻译： 在投影曝光装置和方法中，用于检测投影光学系统的成像特性的照明光的强度分布被设定为基本上等于曝光照明光的强度分布。 曝光照明光学系统中的次级光源的强度分布根据掩模的图案而改变。 根据二次光源的强度分布变化来调整投影光学系统的放大率和像差。 衬底台沿着投影光学系统的光轴移动以补偿由二次光源的强度分布的变化引起的投影光学系统的像平面的移动。 当光量分布改变时，曝光操作中断。 曝光控制也对投影光学系统中的热积累有反应。
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7.发明授权Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques 失效用于使用全息技术将掩模图案再现到基板的光敏表面上的曝光装置
公开(公告)号：US5528390A
公开(公告)日：1996-06-18
申请号：US461105
申请日：1995-06-05
申请人： Akihiro Goto , Takashi Genma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Toshio Matsuura , Hiroshi Shirasu , Masami Ebi
发明人： Akihiro Goto , Takashi Genma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Toshio Matsuura , Hiroshi Shirasu , Masami Ebi
CPC分类号： G03F7/70058 , G03H1/0005 , G03H1/0408 , G03H2001/0094 , G03H2001/0491 , G03H2260/12
摘要： An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques. The apparatus comprises support means for holding a hologram recording plate at a predetermined position both during recording operation and reconstructing operation, a first illuminating optical system for introducing a light beam from a coherent light source to a mask and irradiating a subject beam produced from the mask into the recording plate, a second illuminating optical system for irradiating the light beam from the coherent light source as a reference beam into the recording plate, a carrier apparatus for disposing during reconstructing operation a substrate at the position of the mask in place of the mask, a third illuminating optical system for irradiating a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate, and a controller for selectively controlling the first, second and third illuminating optical systems to put an at least selected one of them into an operative condition so as to irradiate a fixing light beam into the recording plate in order to fix the hologram.
摘要翻译： 一种用于使用全息技术将掩模图案再现到基板的光敏表面上的曝光装置。 该装置包括用于在记录操作和重建操作期间将全息图记录板保持在预定位置的支撑装置，用于将来自相干光源的光束引入到掩模并照射由掩模产生的被摄体光束的第一照明光学系统 将用于将来自相干光源的光束作为参考光束照射到记录板中的第二照明光学系统，用于在重建操作期间在掩模的位置处置换基板以代替掩模的载体设备 第三照明光学系统，用于将具有参考光束的共轭光束照射到通过记录操作形成全息图的记录板中，以在基板的光敏表面上形成全息图像，并且 控制器，用于选择性地控制第一，第二和第三照明光学系统， 其中最少选择的一个进入操作状态，以便将固定光束照射到记录板中以固定全息图。
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8.发明授权公开(公告)号：US06677088B2
公开(公告)日：2004-01-13
申请号：US10195425
申请日：2002-07-16
申请人： Nobutaka Magome , Naomasa Shiraishi
发明人： Nobutaka Magome , Naomasa Shiraishi
IPC分类号： G03F900
CPC分类号： G03F1/78 , G03F7/70333 , G03F7/70475 , H01J2237/31764
摘要： A photomask producing method according to the present invention segments a parent pattern which is an &agr;-magnification of an original pattern which is a &bgr;-magnification of a circuit pattern into &agr; lengthwise and breadthwise, thereby forming parent patterns on data. The parent patterns are written on a substrate at equal magnification by using an electron beam lithography system, thereby producing master reticles. Reduced images of the parent patterns of the master reticles are transferred on a substrate while performing screen linking, thereby producing working reticle. This photomask producing method can form an original pattern with a high precision and in a short period of time.
摘要翻译： 根据本发明的光掩模制造方法将作为电路图案的β倍率的原始图案的α倍率的母图案分割成长度方向和宽度方向的α，从而在数据上形成母体图案。 母体图案通过使用电子束光刻系统以等倍放大的方式写在衬底上，从而产生主掩模。 在执行屏幕连接的同时，将母版印迹的母体图案的图像转印到基板上，由此产生作业掩模版。 这种光掩模生产方法可以在高精度和短时间内形成原始图案。
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公开(公告)号：US06284416B1
公开(公告)日：2001-09-04
申请号：US09631961
申请日：2000-08-03
IPC分类号： G03F900
CPC分类号： G03F1/32 , G03F1/26 , G03F1/29 , G03F7/70433
摘要： A photo mask for lithography process form a high contrast image. The photo mask includes a light transparent portion and a light shielding portion, at least a part of which has a multilayer construction, wherein an the edge portion of the shielding portion has a different light transmissivity than a central portion surrounded by the edge portion.
摘要翻译： 用于光刻工艺的光罩形成高对比度图像。 光掩模包括透光部分和遮光部分，其至少一部分具有多层结构，其中屏蔽部分的边缘部分具有与由边缘部分包围的中心部分不同的透光率。
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10.发明授权Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns 失效具有布置在其投影光学系统中的滤光器的投影曝光设备和用于保护电路图案的方法
公开(公告)号：US6118516A
公开(公告)日：2000-09-12
申请号：US826063
申请日：1997-03-24
CPC分类号： G03F7/70125 , G03F7/70308 , G03F7/70333 , G03F9/70 , G03F9/7015 , G03F9/7076
摘要： A projection exposure apparatus which can perform superior observation or projection of a selected mark when the mark is observed or projected through a projection optical system in which a pupil filter is set. The projection exposure apparatus which projects a pattern on a mask through a projection optical system onto a photosensitive substrate held on a substrate stage movable in a plane perpendicular to the optical axis of the projection optical system and which has a pupil filter (optical correction plate) placed on or near the pupil plane of the projection optical system, a reference mark formed on the substrate stage in a scale factor according to the shape of the pupil filter, illuminating means for illuminating the reference mark with illumination light, and light-receiving means for receiving the illumination light having emerged from the reference mark and thereafter having passed the projection optical system.
摘要翻译： 一种投影曝光装置，当通过设置瞳孔滤光片的投影光学系统观察或投影标记时，可以对所选标记进行优异的观察或投影。 投影曝光装置，其通过投影光学系统将掩模上的图案投影到保持在基板台上的感光基板上，该感光基板可在与投影光学系统的光轴垂直的平面中移动，并具有瞳孔滤光器（光学校正板） 放置在投影光学系统的光瞳平面上或附近，以基于瞳孔滤光器的形状的比例因子形成在基板台上的基准标记，用照明光照射基准标记的照明装置，以及光接收装置 用于接收从基准标记出来的照明光，然后通过投影光学系统。
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