PROTECTING HARD BIAS MAGNETS DURING A CMP PROCESS USING A SACRIFICIAL LAYER
    1.
    发明申请
    PROTECTING HARD BIAS MAGNETS DURING A CMP PROCESS USING A SACRIFICIAL LAYER 有权
    在CMP工艺中使用真空层保护硬偏置磁体

    公开(公告)号:US20090169732A1

    公开(公告)日:2009-07-02

    申请号:US11965648

    申请日:2007-12-27

    IPC分类号: B05D5/12 G11B5/39

    摘要: Read elements and associated methods of fabrication are disclosed. During fabrication of the read element, and more particularly, the fabrication of the hard bias magnets, a non-magnetic sacrificial layer is deposited on top of the hard bias material. When a CMP process is subsequently performed, the sacrificial layer is polished instead of the hard bias material. The thicknesses of the hard bias magnets are not affected by the CMP process, but are rather defined by the deposition process of the hard bias material. As a result, the variations in the CMP process will not negatively affect the magnetic properties of the hard bias magnets so that they are able to provide substantially uniform effective magnetic fields to bias the free layer of the magnetoresistance (MR) sensor of the read element.

    摘要翻译: 公开了读取元件和相关联的制造方法。 在读取元件的制造期间,更具体地说,硬质偏置磁体的制造中,非磁性牺牲层沉积在硬偏置材料的顶部上。 当随后执行CMP处理时,牺牲层被抛光而不是硬偏置材料。 硬偏置磁体的厚度不受CMP工艺的影响,而是由硬偏压材料的沉积过程限定。 结果,CMP工艺的变化不会对硬偏磁体的磁性能产生负面影响,使得它们能够提供基本上均匀的有效磁场,以偏置读取元件的磁阻(MR)传感器的自由层 。

    METHODS FOR FABRICATING A MAGNETIC SENSOR HEAD USING A CMP DEFINED HARD BIAS AND A TOTALLY FLAT READER GAP
    2.
    发明申请
    METHODS FOR FABRICATING A MAGNETIC SENSOR HEAD USING A CMP DEFINED HARD BIAS AND A TOTALLY FLAT READER GAP 审中-公开
    使用CMP定义的硬度偏差和平面读取器GAP来制造磁性传感器头的方法

    公开(公告)号:US20080155810A1

    公开(公告)日:2008-07-03

    申请号:US11616717

    申请日:2006-12-27

    IPC分类号: G11B5/127

    摘要: Methods for fabricating magnetic sensor heads using a CMP defined hard bias to fabricate a magnetic sensor head reader with a flat reader gap. The method comprises defining a read sensor of the magnetic sensor head. The method further comprises depositing an insulator layer on the read sensor. The method further comprises performing a chemical mechanical polishing (CMP) process down to a protective layer on the read sensor deposited while defining the read sensor to remove an overfill portion of the hard bias layer above the protective layer and to remove a sensor pattern masking layer above the protective layer.

    摘要翻译: 使用CMP限定的硬偏置来制造磁传感器头的方法来制造具有平的读取器间隙的磁传感器头读取器。 该方法包括定义磁传感器头的读取传感器。 该方法还包括在读取传感器上沉积绝缘体层。 该方法还包括在定义读取传感器以去除保护层上方的硬偏置层的过度填充部分并且去除传感器图案掩模层的情况下,将沉积的读取传感器上的保护层进行化学机械抛光(CMP)处理 保护层上方。

    Protecting hard bias magnets during a CMP process using a sacrificial layer
    3.
    发明授权
    Protecting hard bias magnets during a CMP process using a sacrificial layer 有权
    在使用牺牲层的CMP工艺期间保护硬偏磁体

    公开(公告)号:US08749925B2

    公开(公告)日:2014-06-10

    申请号:US11965648

    申请日:2007-12-27

    IPC分类号: G11B5/33

    摘要: Read elements and associated methods of fabrication are disclosed. During fabrication of the read element, and more particularly, the fabrication of the hard bias magnets, a non-magnetic sacrificial layer is deposited on top of the hard bias material. When a CMP process is subsequently performed, the sacrificial layer is polished instead of the hard bias material. The thicknesses of the hard bias magnets are not affected by the CMP process, but are rather defined by the deposition process of the hard bias material. As a result, the variations in the CMP process will not negatively affect the magnetic properties of the hard bias magnets so that they are able to provide substantially uniform effective magnetic fields to bias the free layer of the magnetoresistance (MR) sensor of the read element.

    摘要翻译: 公开了读取元件和相关联的制造方法。 在读取元件的制造期间,更具体地说,硬质偏置磁体的制造中,非磁性牺牲层沉积在硬偏置材料的顶部上。 当随后执行CMP处理时,牺牲层被抛光而不是硬偏置材料。 硬偏置磁体的厚度不受CMP工艺的影响,而是由硬偏压材料的沉积过程限定。 结果,CMP工艺的变化不会对硬偏磁体的磁性能产生负面影响,使得它们能够提供基本上均匀的有效磁场,以偏置读取元件的磁阻(MR)传感器的自由层 。