Deposited film forming process
    1.
    发明授权
    Deposited film forming process 有权
    沉积成膜工艺

    公开(公告)号:US06335281B1

    公开(公告)日:2002-01-01

    申请号:US09334176

    申请日:1999-06-16

    IPC分类号: H01L2144

    摘要: In a deposited film forming process or apparatus, a deposited film is formed on a film-forming substrate by reduced-pressure vapor phase growth. The film-forming substrate is set on an auxiliary substrate and an auxiliary-substrate cap member is set at the upper part thereof. A maximum temperature difference between temperature at the upper end of the film-forming substrate and the temperature at the lower end of the auxiliary-substrate cap member provided on the film-forming substrate at its upper part is so controlled as to be not greater than a prescribed value so that a film deposited on the auxiliary-substrate cap member is improved in adhesion. Any deposits of films on the part other than the film-forming substrate can be prevented from coming off and scattering on the film-forming substrate so that deposited films having uniform film thickness and film quality can steadily be formed and also faulty images can occur less frequently. It is also possible to achieve improvements of various properties of films formed, film forming rate, reproducibility, and productivity so that yield can dramatically be improved in mass production.

    摘要翻译: 在沉积膜形成工艺或装置中,通过减压气相生长在成膜基板上形成沉积膜。 成膜基板设置在辅助基板上,辅助基板盖部件设置在其上部。 成膜基板的上端的温度与设置在成膜基板上部的辅助基板盖部件的下端的温度之间的最大温度差被控制为不大于 规定值,使得沉积在辅助基板盖构件上的膜提高了粘附性。 可以防止膜形成基板以外的部分的沉积物在成膜基板上脱落并散射,从而可以稳定地形成膜厚度和膜质量均匀的沉积膜,并且可以发生较少的图像 经常。 也可以实现成膜的各种性能,成膜速度,再现性和生产率的改善,从而大量提高产量。

    Method and apparatus for producing electrophotographic photosensitive member
    3.
    发明授权
    Method and apparatus for producing electrophotographic photosensitive member 有权
    用于制造电子照相感光构件的方法和装置

    公开(公告)号:US06406554B1

    公开(公告)日:2002-06-18

    申请号:US09605759

    申请日:2000-06-28

    IPC分类号: B08B908

    摘要: The present invention provides a method of producing an electrophotographic photosensitive member capable of obtaining high-quality uniform images without image defects and nonuniformity in image density. The method of producing an electrophotographic photosensitive member includes a step forming a functional film on a substrate, and a washing step of spraying water on the substrate surface from concentrically arranged nozzle groups positioned in a twisted relationship before the step of forming the functional film.

    摘要翻译: 本发明提供一种制造电子照相感光构件的方法,该方法能够获得高质量均匀的图像,而没有图像缺陷和图像密度不均匀。 制造电子照相感光构件的方法包括在基板上形成功能膜的步骤,以及在形成功能膜的步骤之前,从位于扭曲关系的同心布置的喷嘴组在基板表面上喷射水的洗涤步骤。

    Method of manufacturing electrophotographic photosensitive member
    4.
    发明授权
    Method of manufacturing electrophotographic photosensitive member 失效
    制造电子照相感光构件的方法

    公开(公告)号:US6156472A

    公开(公告)日:2000-12-05

    申请号:US186421

    申请日:1998-11-05

    IPC分类号: G03G5/082 G03G5/10

    CPC分类号: G03G5/08214 G03G5/102

    摘要: To provide an electrophotographic photosensitive member manufacturing method capable of preventing a substrate from corroding in working of the substrate and obtaining a high-quality image free from image defects and image density unevenness, the method of manufacturing an electrophotographic photosensitive member comprises the step of forming a functional film made of an amorphous material on the surface of an aluminum substrate by reduced-pressure vapor deposition, wherein the surface of the substrate is cleaned with the water containing an inhibitor as a specific component before the step of forming an electrophotographic photosensitive member.

    摘要翻译: 为了提供能够防止基板在基板加工中腐蚀并获得没有图像缺陷和图像浓度不均匀性的高质量图像的电子照相感光构件制造方法,电子照相感光构件的制造方法包括以下步骤: 通过减压气相沉积在铝基板的表面上由非晶材料制成的功能膜,其中在形成电子照相感光构件的步骤之前,用含有抑制剂的水作为特定成分清洗基板的表面。

    Electrophotographic process and apparatus
    7.
    发明授权
    Electrophotographic process and apparatus 失效
    电子照相法和仪器

    公开(公告)号:US06686109B2

    公开(公告)日:2004-02-03

    申请号:US10106440

    申请日:2002-03-27

    IPC分类号: G03G1322

    摘要: In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more and a film thickness and a specific resistance value of the surface protective layer are respectively Ds (&mgr;m) and Rs (&OHgr;·cm) which fulfill the following conditions: 1.0×109≦Rs≦1.0×1013 Ds≦−0.136Ln(Rs)+(−0.004×PS+6).

    摘要翻译: 在使用具有表面保护层并进行反向显影和用清洁刮板清洁的非晶硅感光构件的电子照相方法中,感光构件的表面移动速度PS(mm / sec)为320mm / sec以上, 表面保护层的膜厚和电阻值分别为Ds(mum)和Rs(Ω·cm),满足以下条件:

    Method of manufacturing an electrophotographic photosensitive member including multiple liquid cleaning steps and machining step
    8.
    发明授权
    Method of manufacturing an electrophotographic photosensitive member including multiple liquid cleaning steps and machining step 失效
    制造电子照相感光构件的方法,包括多个液体清洗步骤和加工步骤

    公开(公告)号:US06557569B2

    公开(公告)日:2003-05-06

    申请号:US09871612

    申请日:2001-06-04

    IPC分类号: B08B102

    摘要: A method of manufacturing an electrophotographic photosensitive member includes the steps of: cleaning a substrate of the electrophotographic photosensitive member by cleaning step using a vessel and machining the substrate. The cleaning step includes a first overflowing step and a second overflowing step. In the first overflowing step, the liquid is allowed to be overflowed from a vessel while the substrate of the electrophotographic photosensitive member is immersed in the liquid contained in the vessel. In the second overflowing step, the liquid is allowed to overflow from a vessel while the substrate of the electrophotographic photosensitive member is pulled up in the liquid contained in the vessel. A flow rate Q2 of the overflowing liquid of the second overflowing step is higher than a flow rate Q1 of the overflowing liquid of the first overflowing step. The machining step forms a film of a photosensitive substance on the substrate.

    摘要翻译: 一种制造电子照相感光构件的方法包括以下步骤:通过使用容器的清洁步骤清洁电子照相感光构件的基底并加工基底。 清洗步骤包括第一溢流步骤和第二溢流步骤。 在第一溢流步骤中,允许液体从容器溢出,同时将电子照相感光构件的基底浸入容纳在容器中的液体中。 在第二溢流步骤中,允许液体从容器溢出,同时将电子照相感光构件的基底在包含在容器中的液体中拉起。 第二溢流工序的溢流液的流量Q2高于第一溢流工序的溢流液的流量Q1。 加工步骤在基板上形成感光性物质的膜。