Laser Direct Imaging Apparatus
    1.
    发明申请
    Laser Direct Imaging Apparatus 有权
    激光直接成像设备

    公开(公告)号:US20090080047A1

    公开(公告)日:2009-03-26

    申请号:US12191684

    申请日:2008-08-14

    IPC分类号: G02B26/10

    CPC分类号: G03F7/2006 G03F7/70383

    摘要: A laser direct imaging apparatus which can expose photosensitive materials having various sensitivities and which can correct an imaging position in accordance with deformation of a workpiece. In the laser direct imaging apparatus, the workpiece is moved in a sub-scanning direction while a cylindrical lens is used to converge a laser beam, which has been modulated based on raster data, in the sub-scanning direction and deflect the laser beam toward a main scanning direction so as to image a desired pattern on the workpiece. The cylindrical axis of the cylindrical lens is designed to be able to rotate horizontally and to be able to change an angle with respect to the main scanning direction.

    摘要翻译: 一种激光直接成像装置,其可以暴露具有各种灵敏度并且可以根据工件的变形校正成像位置的感光材料。 在激光直接成像装置中,工件在副扫描方向上移动,同时使用柱面透镜在副扫描方向上将基于光栅数据调制的激光束会聚在一起,并将激光束朝向 主扫描方向,以便对工件上的期望图案进行成像。 柱面透镜的圆柱轴被设计成能够水平旋转并且能够相对于主扫描方向改变角度。

    PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS
    2.
    发明申请
    PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS 审中-公开
    图案曝光方法和图案曝光装置

    公开(公告)号:US20080213705A1

    公开(公告)日:2008-09-04

    申请号:US12098089

    申请日:2008-04-04

    IPC分类号: B41J2/45 G03F7/00

    摘要: A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.

    摘要翻译: 图案曝光方法和图案曝光装置,其中通过廉价的装置提高生产量并且没有低的运行成本。 从多个半导体激光器分别发射的多个激光束的输出面分别布置在两个方向上。 方向之一是与多面镜的扫描方向相同的方向,而另一方向是与多面镜的扫描方向交叉的方向。 在这种情况下,使排列在与多面镜的扫描方向交叉的方向上的输出面的阵列间距等于曝光图案的分辨率。 在这种情况下,每个激光器的波长可以不超过410nm。