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1.发明授权Stripping liquor composition for removing photoresists comprising hydrogen peroxide 失效剥离含有过氧化氢的光致抗蚀剂的液体组合物
公开(公告)号：US4169068A
公开(公告)日：1979-09-25
申请号：US824652
申请日：1977-08-15
CPC分类号： C11D3/43 , C11D3/3947 , C23G5/02 , G03F7/423
摘要： A stripping liquor composition consisting essentially of (A) at least one compound selected from among sulfonic acids, acid esters of sulfuric acid, and acid esters of phosphoric acid, (B) hydrogen peroxide, and (C) at least one of organic solvents, with or without the addition of (D) at least one of polyhydric alcohols.
摘要翻译： 基本上由（A）至少一种选自磺酸，硫酸的酸性酯和磷酸的酸酯，（B）过氧化氢和（C）至少一种有机溶剂的化合物组成的汽提液组合物， 有或没有添加（D）至少一种多元醇。
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公开(公告)号：US4275142A
公开(公告)日：1981-06-23
申请号：US19878
申请日：1979-03-12
CPC分类号： G03F7/033 , Y10S522/901
摘要： A photosensitive resin composition comprising (I) a copolymer containing (A) 10 to 95 mol % of a conjugated diolefinic hydrocarbon, (B) 5 to 90 mol % of an .alpha.,.beta.-ethylenically unsaturated carboxylic acid and (C) 0 to 85 mol % of a monoolefinically unsaturated compound, (II) a photosensitizer and/or a photosensitive crosslinking agent, and, if necessary, (III) a photopolymerizable unsaturated monomer. Said copolymer may have been reacted with an inorganic alkali, an alkali salt or an amine compound in a proportion of 0.05 to 1.0 equivalent per equivalent of the carboxyl group of the .alpha.,.beta.-ethylenically unsaturated carboxylic acid in said copolymer. This photosensitive resin composition is excellent in storage stability, quick in photosetting upon exposure to actinic light rays including ultraviolet rays, that is, high in sensitivity, capable of development with water or a dilute aqueous alkaline solution and possesses satisfactory rubber elasticity, and a printing plate formed from the composition is excellent in water resistance though the composition is developable with an aqueous developing solution, so that the composition can be used for a flexographic printing plate, to which an aqueous flexographic printing ink can be applied. Said composition can also be used for a pohote-resist which is high in sensitivity, developable with water or a dilute alkaline solution and excellent in resolving power.
摘要翻译： 一种感光性树脂组合物，其包含（I）含有（A）10〜95摩尔％的共轭二烯烃的共聚物，（B）5〜90摩尔％的α，β-烯键式不饱和羧酸和（C）0〜85 摩尔％的单烯属不饱和化合物，（II）光敏剂和/或感光交联剂，如果需要，（III）可光聚合的不饱和单体。 所述共聚物可以与无机碱，碱金属盐或胺化合物以相当于所述共聚物中α，β-烯键式不饱和羧酸的羧基的0.05至1.0当量的比例反应。 该感光性树脂组合物的保存稳定性优异，曝光于包含紫外线的光化射线即使感光度高，能够用水或稀碱水溶液显影并且具有令人满意的橡胶弹性， 由组合物形成的板材具有优异的耐水性，尽管组合物可用水性显影液显影，使得该组合物可用于柔性版印刷版，可将柔性版印刷油墨用于该柔版印刷油墨。 所述组合物也可用于灵敏度高，可用水或稀碱性溶液显影并具有优异的分辨能力的柔软抗蚀剂。
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公开(公告)号：US4294908A
公开(公告)日：1981-10-13
申请号：US136477
申请日：1980-04-02
IPC分类号： G03F7/039 , C08F8/00 , C08F8/34 , C08F290/00 , C08F299/00 , G03C1/00 , G03F7/008 , G03F7/012 , G03F7/038 , H05K3/00 , G03C1/68
CPC分类号： G03F7/0384 , G03F7/0125 , G03F7/0388
摘要： A photoresist composition comprising a cyclized product obtained by contacting a conjugated diene polymer or copolymer having unsaturations in the main chain or side chains with a fluorine-containing substituted sulfonic acid compound represented by the formula:CF.sub.n H.sub.3-n SO.sub.3 R or CF.sub.n H.sub.3-n SO.sub.2 Xwherein R is hydrogen, alkyl or CF.sub.n H.sub.3-n SO.sub.2, X is halogen, and n is 1, 2 or 3, in an inert solvent, and a photosensitive crosslinking agent soluble in an organic solvent. The resist pattern obtained from said composition has excellent heat resistance. Also, when a silicon oxide film having said resist pattern is etched, the number of pinholes formed is very small.
摘要翻译： 一种光致抗蚀剂组合物，其包含通过使主链或侧链中具有不饱和键的共轭二烯聚合物或共聚物与式CFRH 3-nSO 3 R或CF n H 3-n SO 2 X表示的含氟取代磺酸化合物接触而获得的环化产物，其中R为氢 ，烷基或CF n H 3-n SO 2，X为卤素，n为1,2或3，以及可溶于有机溶剂的光敏交联剂。 由所述组合物获得的抗蚀剂图案具有优异的耐热性。 此外，当蚀刻具有所述抗蚀剂图案的氧化硅膜时，形成的针孔的数量非常小。
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公开(公告)号：US4349619A
公开(公告)日：1982-09-14
申请号：US185771
申请日：1980-09-10
CPC分类号： G03F7/091 , Y10S430/128 , Y10S522/901
摘要： By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene polymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution and only a small number of pinholes can be obtained even when a base board having a surface of a high reflectance is used.
摘要翻译： 通过将由以下通式表示的化合物加入到包含共轭二烯聚合物或共聚物的环化产物和常规光致抗蚀剂组合物的常规光致抗蚀剂组合物中：
ArNNNHAr'， 或 即使当使用具有高反射率的表面的基板时，也可以获得可溶于有机溶剂的光交联剂，即使具有高分辨率的图像并且仅具有少量针孔。 -
5.发明授权
公开(公告)号：US4623609A
公开(公告)日：1986-11-18
申请号：US735715
申请日：1985-05-20
摘要： An ionizing radiation sensitive resist consisting essentially of a polymer having a recurring unit represented by the following formula: ##STR1## wherein X is a hydrogen atom, a methyl group, or a halogen atom and R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5, which may be identical or different, are hydrogen atoms, halogen atoms, alkyl groups having 1 to 3 carbon atoms, alkoxy groups having 1 to 3 carbon atoms, haloalkyl groups having 1 to 3 carbon atoms or haloalkoxy groups having 1 to 3 carbon atoms, at least a part of the X groups present in said polymer being a halogen atom, at least a part of the Y.sup.1 and Y.sup.2 group present in said polymer being a halogen atom, and at least a part of the R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 groups present in said polymer being a haloalkyl or haloalkoxy group having 1 to 3 carbon atoms. Said ionizing radiation sensitive resist is suitable as a negative type resist. This resist is used in the form of an organic solvent solution to form a coating film on a substrate and the desired parts of this coating film are irradiated with an ionizing radiation, whereby patterns are formed.
摘要翻译： 基本上由具有由下式表示的重复单元的聚合物组成的电离辐射敏感抗蚀剂：其中X是氢原子，甲基或卤素原子，R1，R2，R3，R4和R5，其中 可以相同或不同，是氢原子，卤素原子，具有1至3个碳原子的烷基，具有1至3个碳原子的烷氧基，具有1至3个碳原子的卤代烷基或具有1至3个碳原子的卤代烷氧基，在 所述聚合物中存在的X基团的至少一部分为卤素原子，所述聚合物中存在的Y1和Y2基团的至少一部分为卤素原子，R 1，R 2，R 3，R 4和 所述聚合物中存在的R 5基团是具有1至3个碳原子的卤代烷基或卤代烷氧基。 所述电离辐射敏感抗蚀剂适合作为负型抗蚀剂。 该抗蚀剂以有机溶剂溶液的形式使用，以在基材上形成涂膜，用电离辐射照射该涂膜的所需部分，形成图案。
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公开(公告)号：US4407927A
公开(公告)日：1983-10-04
申请号：US384480
申请日：1982-06-03
IPC分类号： G03C1/00 , C08K5/18 , G03C1/83 , G03F7/004 , G03F7/09 , G03C5/00 , G03C1/58 , G03C1/68 , G03C1/84
CPC分类号： G03F7/091 , C08K5/18 , G03C1/83 , Y10S430/127 , Y10S430/128 , Y10S522/901
摘要： By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene homopolymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution can be obtained even when a base board having a surface of a high reflectance is used, with a high reproducibility and without being affected by prebaking conditions.
摘要翻译： 通过将由以下通式表示的化合物：
或 加入到包含共轭二烯均聚物或共聚物的环化产物和可溶于有机溶剂的光交联剂的常规光致抗蚀剂组合物中，具有高 即使使用具有高反射率的基板的基板，也可以获得高分辨率，重现性高，不受预烘条件的影响。 -
公开(公告)号：US4384037A
公开(公告)日：1983-05-17
申请号：US239339
申请日：1981-03-02
IPC分类号： G03C1/72 , C08K5/27 , C08K5/28 , C08K5/315 , C08L1/00 , C08L9/00 , C08L27/00 , C08L33/00 , C08L33/02 , C08L33/04 , G03F7/023 , G03C1/54
CPC分类号： G03F7/0233 , C08K5/27 , C08K5/28 , C08K5/315 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A photosensitive resin composition comprising a 1,2-quanonediazide compound and a copolymer consisting essentially of (A) a conjugated diolefinic compound, (B) a monoolefinically unsaturated compound and (C) an .alpha.,.beta.-ethylenically unsaturated carboxylic acid. Said composition can provide a positive type resist which is difficult to break and excellent in adhesion to a substrate.
摘要翻译： 一种包含1,2-二叠氮化物化合物和基本上由（A）共轭二烯化合物，（B）单烯属不饱和化合物和（C）α，β-烯属不饱和羧酸组成的共聚物的光敏树脂组合物。 所述组合物可以提供难以破碎的正型抗蚀剂，并且对基材的粘附性优异。
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8.发明授权Positive type photosensitive resin composition with at least two o-quinone diazides 失效具有至少两种邻醌二叠氮基的正型感光性树脂组合物
公开(公告)号：US4499171A
公开(公告)日：1985-02-12
申请号：US484312
申请日：1983-04-12
CPC分类号： G03F7/022
摘要： A positive type photosensitive resin composition comprising an alkali-soluble novolac resin and (A) a compound represented by the following general formula (I) and a compound represented by the following general formula (II) or (B) a compound represented by the following general formula (III) and a compound represented by the following general formula (IV), wherein the molar ratio of the compound represented by the general formula (I) to the compound represented by the general formula (II) is 6/4-9/1 or the molar ratio of the compound represented by the general formula (III) to the compound represented by the general formula (IV) is 1/9-9/1 and the total amount of the component (A) or (B) is 5-100 parts by weight per 100 parts by weight of the alkali-soluble novolac resin: ##STR1## wherein R.sub.1, R.sub.5, R.sub.8 and R.sub.10, which may be identical or different, represent alkyl groups, aryl groups or aralkyl groups; and R.sub.2, R.sub.3, R.sub.4, R.sub.6, R.sub.7, R.sub.9, R.sub.11 and R.sub.12, which may be identical or different, represent 1,2-naphthoquinonediazide-4-sulfonyl groups, 1,2-naphthoquinonediazide-5-sulfonyl groups or 1,2-benzoquinonediazide-4-sulfonyl groups. Said positive type photosensitive resin composition is excellent in both sensitivity and yield of residual film thickness.
摘要翻译： 包含碱溶性酚醛清漆树脂和（A）由以下通式（I）表示的化合物和由以下通式（II）或（B）表示的化合物的正型型光敏树脂组合物：由下列通式 通式（III）表示的化合物和下述通式（IV）表示的化合物，其中，所述通式（I）表示的化合物与通式（II）表示的化合物的摩尔比为6 / 4-9 /或通式（III）表示的化合物与通式（IV）表示的化合物的摩尔比为1 / 9-9 / 1，成分（A）或（B）的总量 （I）其中R 1，R 5，R 8（ⅰ）其中R 1，R 5，R 8， 和R 10可以相同或不同，表示烷基，芳基或芳烷基; 可以相同或不同的R 2，R 3，R 4，R 6，R 7，R 9，R 11和R 12表示1,2-萘醌二叠氮化物-4-磺酰基，1,2-萘醌二叠氮化物-5-磺酰基或1,2 - 苯并醌二叠氮化物-4-磺酰基。 所述正型感光性树脂组合物的残留膜厚度的灵敏度和收率均优异。
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9.发明授权Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer 失效环化丁二烯聚合物和其他感光层的单层膜层压体
公开(公告)号：US4330612A
公开(公告)日：1982-05-18
申请号：US169464
申请日：1980-07-16
CPC分类号： G03F7/033 , H05K3/0079 , Y10S522/901 , Y10T428/24967 , Y10T428/31931
摘要： A photosensitive resin film consisting of a monolayer film of a composition comprising (a) a cyclized product of butadiene polymer, (b) at least one member selected from the group consisting of a photo-crosslinking agent, a photo-sensitizer and a photo-polymerization initiator, and (c) a storage stabilizer, and if necessary, a dye and/or a pigment, or a laminate structure photosensitive resin film prepared by laminating to the above photosensitive resin film a composition comprising (d) 100 parts by weight of a polymer or copolymer of monoolefinically unsaturated compound, (e) 5 to 100 parts by weight of a polyfunctional, photo-polymerizable, unsaturated compound having at least two photo-polymerizable double bonds in the molecule, (f) at least one member selected from the group consisting of a photo-crosslinking agent, a photo-sensitizer and a photo-polymerization initiator, and (g) a storage stabilizer, and if necessary, a dye and/or a pigment. Said photosensitive resin film can be intimately contacted with a negative film, and therefore, a sharp image can be obtained by exposing the resulting laminate to light through the negative film and then developing it. Said photo-sensitive resin film can also be laminated to a solid surface without entrapping any air even if the solid surface has irregularities. When the film has been exposed to light and developed, there is obtained a film excellent in heat resistance.
摘要翻译： 一种感光性树脂膜，其由以下组成的单层膜构成，所述组合物包含（a）丁二烯聚合物的环化产物，（b）选自光交联剂，光敏剂和光敏剂的至少一种， 聚合引发剂，和（c）保存稳定剂，如果需要，可以将染料和/或颜料，或通过层压到上述感光性树脂膜上制备的层压结构感光性树脂膜，组合物包含（d）100重量份 单烯属不饱和化合物的聚合物或共聚物，（e）5〜100重量份在分子中具有至少2个光聚合性双键的多官能，光聚合性不饱和化合物，（f）至少一种选自 由光交联剂，光敏剂和光聚合引发剂组成的组，和（g）储存稳定剂，如果需要，可以使用染料和/或颜料。 所述感光性树脂膜可以与负片紧密接触，因此通过将所得到的层压体曝光通过负片膜然后显影，可以获得清晰的图像。 即使固体表面具有不规则性，所述光敏树脂膜也可以层压在固体表面上，而不会夹带任何空气。 当该膜已曝光并显影时，得到耐热性优异的膜。
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公开(公告)号：US06457340B1
公开(公告)日：2002-10-01
申请号：US09051797
申请日：1998-04-23
申请人： Toshiaki Kanemitsu , Kunihiro Harada , Naoki Fujii
发明人： Toshiaki Kanemitsu , Kunihiro Harada , Naoki Fujii
IPC分类号： B21D2206
CPC分类号： B21D53/26 , B21D53/261
摘要： In a sheet metal member having a boss which is obtained by the method of the present invention, a cylindrical portion is formed at an outer peripheral edge, thereby allowing the member to be used as a pulley for a flat belt, a V belt or a poly-V belt. According to the present invention, when the boss is to be formed, the positional accuracies of portions other than the boss with respect to the boss are improved. The present invention includes: a boring step of opening a circular hole in a circular blank; a curving step of shaping the circular blank into a projected shape; and a bending step of restricting a radially outward spread of an outer peripheral edge portion of the circular blank which has undergone the curving step, and bending an inclined portion between the outer peripheral edge portion of the circular blank and the circular hole into a recessed shape, thereby forming the case-like boss. After the boring step and the curving step are conducted in an arbitrary order or the boring and curving steps are simultaneously conducted, the bending step is conducted while the circular hole is positioned to a reference position by a projection of a mold.
摘要翻译： 在具有通过本发明的方法获得的凸台的钣金构件中，在外周边缘处形成圆筒部，从而允许该构件用作平带，V带或 多V带。 根据本发明，当要形成凸台时，凸起部以外的部分相对于凸台的位置精度提高。 本发明包括：在圆形坯料中打开圆形孔的钻孔步骤; 将圆形坯料成形为投影形状的弯曲步骤; 以及弯曲步骤，限制已经经历弯曲步骤的圆形坯料的外周边缘部分的径向向外扩展，并且将圆形坯料的外周缘部分与圆形孔之间的倾斜部分弯曲成凹形 ，从而形成壳状凸起。 在镗削步骤和弯曲步骤以任意次序进行或者同时进行镗削和弯曲步骤之后，通过模具的突出部将圆形孔定位到基准位置时进行弯曲步骤。
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