公开(公告)号：US20080047576A1

公开(公告)日：2008-02-28

申请号：US11844241

申请日：2007-08-23

申请人： Young-Ok KIM ,  Chang-Ki HONG ,  Kun-Tack LEE ,  In-Gi KIM ,  Woo-Gwan SHIM ,  Jeong-Nam HAN ,  Kang-Youn LEE

发明人： Young-Ok KIM ,  Chang-Ki HONG ,  Kun-Tack LEE ,  In-Gi KIM ,  Woo-Gwan SHIM ,  Jeong-Nam HAN ,  Kang-Youn LEE

IPC分类号： B08B3/12 ,  B08B3/10

CPC分类号： H01L21/67057 ,  H01L21/67034

摘要： In a single-substrate type apparatus for processing a substrate, the apparatus includes a chamber, a bottom panel, a solution supplying part and a substrate holder. The chamber has an upper portion and a lower portion. The bottom panel is detachably connected to the lower portion. The solution supplying part is connected to the bottom panel to supply a processing solution to the substrate in the chamber. The substrate holder provides the substrate into the chamber, the substrate holder holding both side portions of the substrate such that the substrate is vertically arranged.

摘要翻译： 在用于处理基板的单基板型装置中，该装置包括室，底板，溶液供应部和基板保持件。 腔室具有上部和下部。 底板可拆卸地连接到下部。 溶液供应部分连接到底板，以将处理溶液供应到室中的基板。 衬底保持器将衬底提供到腔室中，衬底保持器保持衬底的两侧部分，使得衬底垂直布置。

公开(公告)号：US20160315019A1

公开(公告)日：2016-10-27

申请号：US15084536

申请日：2016-03-30

申请人： Jung-Min OH ,  Mi-Hyun PARK ,  Hyo-San LEE ,  Ji-Hoon JEONG ,  Yong-Sun KO ,  In-Gi KIM ,  Na-Rim KIM ,  Sang-Tae KIM ,  Seong-Min KIM ,  Kyong-Ho LEE

发明人： Jung-Min OH ,  Mi-Hyun PARK ,  Hyo-San LEE ,  Ji-Hoon JEONG ,  Yong-Sun KO ,  In-Gi KIM ,  Na-Rim KIM ,  Sang-Tae KIM ,  Seong-Min KIM ,  Kyong-Ho LEE

IPC分类号： H01L21/8238 ,  H01L21/027 ,  H01L21/8234 ,  H01L29/16 ,  H01L21/311 ,  H01L21/02 ,  H01L21/3105 ,  G03F7/42 ,  H01L21/266

CPC分类号： G03F7/426 ,  G03F7/039 ,  G03F7/42 ,  G03F7/422 ,  G03F7/425 ,  H01L21/266 ,  H01L21/31133 ,  H01L21/823814 ,  H01L21/823828 ,  H01L29/16

摘要： A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.

摘要翻译： 基于组合物的总重量，用于除去光致抗蚀剂的组合物，其包含约0.5重量％至约10重量％的烷基铵氟化物盐; 基于组合物的总重量的约1重量％至约20重量％的量的有机磺酸; 和基于组合物总重量的约70重量％至约98.5重量％的内酯类溶剂。