公开(公告)号：US20050206880A1

公开(公告)日：2005-09-22

申请号：US11080407

申请日：2005-03-16

申请人： Youzou Fukugawa ,  Toshiyuki Yoshihara ,  Mario Nakamori ,  Yuji Shinano

发明人： Youzou Fukugawa ,  Toshiyuki Yoshihara ,  Mario Nakamori ,  Yuji Shinano

IPC分类号： G03F7/20 ,  G01B9/00 ,  G02B7/00 ,  G02B27/00 ,  H01L21/027

CPC分类号： G03F7/706 ,  G02B7/005 ,  G02B27/0068 ,  G03F7/70258

摘要： An optical apparatus including an image forming optical system having a movable optical element, and a driving mechanism which moves the optical element is disclosed. The apparatus comprises a first block which obtains a linear evaluation value by normalizing, by a first tolerance, an aberration expressed by a linear function of a position of the movable optical element out of aberrations of the optical system, and a quadratic evaluation value by normalizing, by a second tolerance, an aberration expressed by a quadratic function of the position out of the aberrations of the optical system, a second block which obtains a minimum value of a dummy variable by linear programming using an upper limit value of the linear evaluation value as the dummy variable, and a third block which determines a position of the optical element to be moved by the driving mechanism so as to minimize a weighted sum of the quadratic evaluation values with respect to a plurality of image heights by using, as the upper limit value of the linear evaluation value, a value prepared by adding a relaxation amount to the minimum value of the dummy variable that is obtained by the second block. The third block minimizes the weighted sum of the quadratic evaluation values by adjusting the weights assigned to the quadratic evaluation values and the relaxation amount.

摘要翻译： 公开了一种包括具有可移动光学元件的成像光学系统和移动光学元件的驱动机构的光学装置。 该装置包括第一块，其通过以第一公差标准化由光学系统的像差中的可移动光学元件的位置的线性函数所表示的像差，以及通过归一化归一化二次评估值来获得线性评估值 通过第二公差，由光学系统的像差之外的位置的二次函数表示的像差，通过使用线性评估值的上限值通过线性规划获得虚拟变量的最小值的第二块 作为虚拟变量，以及第三块，其确定由驱动机构移动的光学元件的位置，以便通过使用作为上部的图像来最小化相对于多个图像高度的二次评估值的加权和 线性评估值的极限值，通过将松弛量与由该se获得的虚拟变量的最小值相加而制备的值 cond block。 第三块通过调整分配给二次评价值的权重和松弛量来最小化二次评价值的加权和。

公开(公告)号：US20070115458A1

公开(公告)日：2007-05-24

申请号：US11627125

申请日：2007-01-25

申请人： Youzou Fukagawa ,  Toshiyuki Yoshihara ,  Mario Nakamori ,  Yuji Shinano

发明人： Youzou Fukagawa ,  Toshiyuki Yoshihara ,  Mario Nakamori ,  Yuji Shinano

IPC分类号： G01B9/00

CPC分类号： G03F7/706 ,  G02B7/005 ,  G02B27/0068 ,  G03F7/70258

摘要： An optical apparatus including an image forming optical system having a movable optical element, and a driving mechanism which moves the optical element is disclosed. The apparatus comprises a first block which obtains a linear evaluation value by normalizing, by a first tolerance, an aberration expressed by a linear function of a position of the movable optical element out of aberrations of the optical system, and a quadratic evaluation value by normalizing, by a second tolerance, an aberration expressed by a quadratic function of the position out of the aberrations of the optical system, a second block which obtains a minimum value of a dummy variable by linear programming using an upper limit value of the linear evaluation value as the dummy variable, and a third block which determines a position of the optical element to be moved by the driving mechanism so as to minimize a weighted sum of the quadratic evaluation values with respect to a plurality of image heights by using, as the upper limit value of the linear evaluation value, a value prepared by adding a relaxation amount to the minimum value of the dummy variable that is obtained by the second block. The third block minimizes the weighted sum of the quadratic evaluation values by adjusting the weights assigned to the quadratic evaluation values and the relaxation amount.

摘要翻译： 公开了一种包括具有可移动光学元件的成像光学系统和移动光学元件的驱动机构的光学装置。 该装置包括第一块，其通过以第一公差标准化由光学系统的像差中的可移动光学元件的位置的线性函数所表示的像差，以及通过归一化归一化二次评估值来获得线性评估值 通过第二公差，由光学系统的像差之外的位置的二次函数表示的像差，通过使用线性评估值的上限值通过线性规划获得虚拟变量的最小值的第二块 作为虚拟变量，以及第三块，其确定由驱动机构移动的光学元件的位置，以便通过使用作为上部的图像来最小化相对于多个图像高度的二次评估值的加权和 线性评估值的极限值，通过将松弛量与由该se获得的虚拟变量的最小值相加而制备的值 cond block。 第三块通过调整分配给二次评价值的权重和松弛量来最小化二次评价值的加权和。

公开(公告)号：US07301615B2

公开(公告)日：2007-11-27

申请号：US11627125

申请日：2007-01-25

申请人： Youzou Fukagawa ,  Toshiyuki Yoshihara ,  Mario Nakamori ,  Yuji Shinano

发明人： Youzou Fukagawa ,  Toshiyuki Yoshihara ,  Mario Nakamori ,  Yuji Shinano

IPC分类号： G01B9/00

CPC分类号： G03F7/706 ,  G02B7/005 ,  G02B27/0068 ,  G03F7/70258

摘要： An optical apparatus which includes an image forming optical system having a movable optical element, and a driving mechanism configured to move the optical element. The apparatus includes a first block which measures a wavefront aberration of the optical system. A second block obtains a linear evaluation value of an aberration expressed by a linear function of a position of the movable optical element out of aberrations of the optical system, and a quadratic evaluation value of a square of a root mean square of the wavefront aberration measured by the first block expressed by a quadratic function of the position. A third block uses a dummy variable as an upper limit value of the linear evaluation value and obtains a minimum value of the dummy variable by a linear programming. A fourth block determines a position of the optical element to be moved by the driving mechanism.

摘要翻译： 一种光学装置，包括具有可移动光学元件的成像光学系统和被配置为移动光学元件的驱动机构。 该装置包括测量光学系统的波前像差的第一块。 第二块获得由光学系统的像差中的可移动光学元件的位置的线性函数所表示的像差的线性评估值，并且测量波前像差的均方根的平方值的二次评估值 通过由位置的二次函数表示的第一块。 第三块使用虚拟变量作为线性评估值的上限值，并通过线性规划获得虚拟变量的最小值。 第四块确定由驱动机构移动的光学元件的位置。

公开(公告)号：US07230692B2

公开(公告)日：2007-06-12

申请号：US11080407

申请日：2005-03-16

申请人： Youzou Fukagawa ,  Toshiyuki Yoshihara ,  Mario Nakamori ,  Yuji Shinano

发明人： Youzou Fukagawa ,  Toshiyuki Yoshihara ,  Mario Nakamori ,  Yuji Shinano

IPC分类号： G01B9/00

CPC分类号： G03F7/706 ,  G02B7/005 ,  G02B27/0068 ,  G03F7/70258

摘要： An optical apparatus including an image forming optical system having a movable optical element, and a driving mechanism. A first block obtains a linear evaluation value by normalizing, by a first tolerance, an aberration expressed by a linear function of a position of the movable optical element and normalizing, by a second tolerance, an aberration expressed by a quadratic function of the position out of the aberrations of the optical system. A second block obtains a minimum value of a dummy variable by linear programming. A third block determines a position of the optical element to be moved by the driving mechanism using a value prepared by adding a relaxation amount to the minimum value obtained by the second block and minimizes the weighted sum of the quadratic evaluation values by adjusting the weights assigned to the quadratic evaluation values and a relaxation amount.

摘要翻译： 一种包括具有可移动光学元件的成像光学系统和驱动机构的光学装置。 第一块通过以第一公差标准化由可移动光学元件的位置的线性函数表示的像差并且归一化第二公差来获得线性评估值，由位置输出的二次函数表示的像差 的光学系统的像差。 第二个块通过线性规划获得虚拟变量的最小值。 第三块通过使用通过将松弛量添加到由第二块获得的最小值来准备的值来确定由驱动机构移动的光学元件的位置，并且通过调整分配的权重来最小化二次评估值的加权和 到二次评价值和松弛量。

公开(公告)号：US08102503B2

公开(公告)日：2012-01-24

申请号：US12251780

申请日：2008-10-15

申请人： Toshiyuki Yoshihara ,  Yuji Shinano

发明人： Toshiyuki Yoshihara ,  Yuji Shinano

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/68 ,  G03B27/74

CPC分类号： G03F7/70258

摘要： The present invention provides an exposure apparatus comprising a projection optical system including an optical element of which at least one of a position, orientation, and shape can be regulated, a regulator configured to regulate the at least one of the position, orientation, and shape of the optical element, and a controller configured to calculate, using quadratic programming, a regulation amount of the optical element that minimizes a value of an objective function expressed by a first dummy variable serving as an upper limit of a linear optical characteristic value of the projection optical system, and a second dummy variable serving as an upper limit of a quadratic optical characteristic value of the projection optical system, and to control the regulator based on the calculated regulation amount.

摘要翻译： 本发明提供一种曝光装置，包括投影光学系统，该投影光学系统包括能够调节位置，取向和形状中的至少一个的光学元件，被配置为调节位置，取向和形状中的至少一个的调节器 以及控制器，被配置为使用二次规划来计算最小化由作为所述光学元件的线性光学特性值的上限的第一虚拟变量表示的目标函数的值的调节量 投影光学系统和作为投影光学系统的二次光学特性值的上限的第二虚拟变量，并且基于计算出的调节量来控制调节器。

公开(公告)号：US20090103065A1

公开(公告)日：2009-04-23

申请号：US12251780

申请日：2008-10-15

申请人： Toshiyuki Yoshihara ,  Yuji Shinano

发明人： Toshiyuki Yoshihara ,  Yuji Shinano

IPC分类号： G03F7/20

CPC分类号： G03F7/70258

摘要： The present invention provides an exposure apparatus comprising a projection optical system including an optical element of which at least one of a position, orientation, and shape can be regulated, a regulator configured to regulate the at least one of the position, orientation, and shape of the optical element, and a controller configured to calculate, using quadratic programming, a regulation amount of the optical element that minimizes a value of an objective function expressed by a first dummy variable serving as an upper limit of a linear optical characteristic value of the projection optical system, and a second dummy variable serving as an upper limit of a quadratic optical characteristic value of the projection optical system, and to control the regulator based on the calculated regulation amount.

摘要翻译： 本发明提供一种曝光装置，包括投影光学系统，该投影光学系统包括能够调节位置，取向和形状中的至少一个的光学元件，被配置为调节位置，取向和形状中的至少一个的调节器 以及控制器，被配置为使用二次规划来计算最小化由作为所述光学元件的线性光学特性值的上限的第一虚拟变量所表示的目标函数的值的光学元件的调节量 投影光学系统和作为投影光学系统的二次光学特性值的上限的第二虚拟变量，并且基于计算出的调节量来控制调节器。

公开(公告)号：US20060056038A1

公开(公告)日：2006-03-16

申请号：US11268697

申请日：2005-11-08

申请人： Toshiyuki Yoshihara

发明人： Toshiyuki Yoshihara

IPC分类号： G02B3/00

CPC分类号： G03F7/70483 ,  G02B5/3083 ,  G02B27/0025 ,  G03F7/70308 ,  G03F7/706

摘要： A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate, in which an optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.

摘要翻译： 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力，或者在两个正交方向的一个方向上具有折射能，而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间，光学元件的光轴相对于投影光学系统的光轴倾斜。

公开(公告)号：US06987621B2

公开(公告)日：2006-01-17

申请号：US10936797

申请日：2004-09-09

申请人： Toshiyuki Yoshihara

发明人： Toshiyuki Yoshihara

IPC分类号： G02B3/00 ,  G02B9/00 ,  G02B13/08

CPC分类号： G03F7/70483 ,  G02B5/3083 ,  G02B27/0025 ,  G03F7/70308 ,  G03F7/706

摘要： A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate. An optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.

摘要翻译： 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力，或者在两个正交方向的一个方向上具有折射能，而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间。 光学元件的光轴相对于投影光学系统的光轴倾斜。

公开(公告)号：US5068762A

公开(公告)日：1991-11-26

申请号：US438045

申请日：1989-11-20

申请人： Toshiyuki Yoshihara

发明人： Toshiyuki Yoshihara

IPC分类号： G03G5/00 ,  G03G15/00 ,  G03G15/02

CPC分类号： G03G15/75 ,  G03G15/0216 ,  G03G5/00 ,  G03G5/005 ,  Y10S430/102

摘要： An electrophotographic device has an electrophotographic photosensitive member and a blade for charging arranged in contact with the photosensitive member, the photosensitive member being charged by application of a voltage on the blade for charging, wherein the ten point surface average roughness Rz of the photosensitive member is 0.3 .mu.m to 5.0 .mu.m.

摘要翻译： 电摄影装置具有电子照相感光构件和与感光构件接触的用于充电的叶片，感光构件通过在用于充电的叶片上施加电压而被充电，其中感光构件的十点表面平均粗糙度Rz为 0.3亩至5.0亩。

公开(公告)号：US4932860A

公开(公告)日：1990-06-12

申请号：US254708

申请日：1988-10-07

申请人： Toshiyuki Yoshihara ,  Masaaki Hiro ,  Yoichi Kawamorita ,  Masaru Nakagawa ,  Fumio Sumino ,  Noboru Kashimura ,  Masafumi Hisamura ,  Tomohiro Kimura

发明人： Toshiyuki Yoshihara ,  Masaaki Hiro ,  Yoichi Kawamorita ,  Masaru Nakagawa ,  Fumio Sumino ,  Noboru Kashimura ,  Masafumi Hisamura ,  Tomohiro Kimura

IPC分类号： G03G5/05

CPC分类号： G03G5/0517

摘要： An electrophotographic photosensitive member comprises a photosensitive layer containing an organic photoconductor provided on an electroconductive substrate, wherein said photosensitive layer contains a compound represented by the formula (1) shown below in an amount ranging from 0.1 to 10% by weight based on the total weight of the photosensitive layer added;Formula: ##STR1## wherein R represents ##STR2## X.sub.1, X.sub.2 and X.sub.3 each represent hydrogen atom or methyl group, X.sub.4 represents ##STR3## X.sub.5 represents hydrogen atom, an alkyl group or an alkenyl group.

摘要翻译： 电子照相感光构件包括含有设置在导电性基体上的有机感光体的感光层，其中，所述感光层含有下述式（1）表示的化合物，其量为0.1〜10重量％，基于总重量 的光敏层加入; 式（1）其中R表示X1，X2和X3各自表示氢原子或甲基，X4表示X5表示氢原子，烷基或烯基。